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Owing to their wide direct bandgap tunability, III-nitride (III-N) compound semiconductors have been proven instrumental in the development of blue light-emitting diodes that led to the so-called solid-state lighting revolution and blue laser diodes that are used for optical data storage. Beyond such conventional optoelectronic devices, in this review, we explore the progress made in the past 15 years with this low refractive index material family for the realization of microdisks as well as 2D and 1D photonic crystal (PhC) membrane cavities. Critical aspects related to their design and fabrication are first highlighted. Then, the optical properties of passive PhC structures designed for near-infrared such as their quality factor and their mode volume are addressed. Additional challenges dealing with fabrication pertaining to structures designed for shorter wavelengths, namely the visible to ultraviolet spectral range, are also critically reviewed and analyzed. Various applications ranging from second and third harmonic generation to microlasers and nanolasers are then discussed. Finally, forthcoming challenges and novel fields of application of III-N photonic cavities are commented.

Microcavity polaritons are strongly interacting hybrid light–matter quasiparticles, which are promising for the development of novel light sources and active photonic devices. Here, we report polariton lasing in the UV spectral range in microring resonators based on GaN/AlGaN slab waveguides, with experiments carried out from 4 K up to room temperature. Stimulated polariton relaxation into multiple ring resonator modes is observed, which exhibit threshold-like dependence of the emission intensity with pulse energy. The strong exciton-photon coupling regime is confirmed by the significant reduction of the free spectral range with energy and the blueshift of the exciton–like modes with increasing pulse energy. Importantly, the exciton emission shows no broadening with power, further confirming that lasing is observed at electron–hole densities well below the Mott transition. Overall, our work paves the way toward the development of novel UV devices based on the high-speed slab waveguide polariton geometry operating up to room temperature with the potential to be integrated into complex photonic circuits.

Crystallographic point defects (PDs) can dramatically decrease the efficiency of optoelectronic semiconductor devices, many of which are based on quantum well (QW) heterostructures. However, spatially resolving individual non-radiative PDs buried in such QWs has so far not been demonstrated. Here, using high-resolution cathodoluminescence (CL) and a specific sample design, we spatially resolve, image, and analyse non-radiative PDs in InGaN/GaN QWs. We identify two different types of PD by their contrasting behaviour with temperature, and measure their densities from $10^{14}$ cm$^{-3}$ to as high as $10^{16}$ cm$^{-3}$. Our CL images clearly illustrate the interplay between PDs and carrier dynamics in the well: increasing PD concentration severely limits carrier diffusion lengths, while a higher carrier density suppresses the non-radiative behaviour of PDs. The results in this study are readily interpreted directly from CL images, and represent a significant advancement in nanoscale PD analysis., Main text: 8 pages, 6 figures. Supplementary: 11 pages, 8 figures

Ultrafast nonlinear photonics enables a host of applications in advanced on-chip spectroscopy and information processing. These rely on a strong intensity dependent (nonlinear) refractive index capable of modulating optical pulses on sub-picosecond timescales and on length scales suitable for integrated photonics. Currently there is no platform that can provide this for the UV spectral range where broadband spectra generated by nonlinear modulation can pave the way to new on-chip ultrafast (bio-) chemical spectroscopy devices. We demonstrate the giant nonlinearity of UV hybrid light-matter states (exciton-polaritons) up to room temperature in an AlInGaN waveguide. We experimentally measure ultrafast nonlinear spectral broadening of UV pulses in a compact 100 μm long device and deduce a nonlinearity 1000 times that in common UV nonlinear materials and comparable to non-UV polariton devices. Our demonstration promises to underpin a new generation of integrated UV nonlinear light sources for advanced spectroscopy and measurement., Nonlinearity enhancement in different materials is relevant for many scientific applications. Here the authors demonstrate pulse modulation in the UV regime due to polariton-based nonlinearity in an AlInGaN waveguide structure, including at room temperature.

The success story of blue light-emitting diodes over the past decade is underpinned by the high internal quantum efficiency (IQE) of the InGaN/GaN quantum wells (QWs) within the active region. Yet this extraordinary IQE can only be achieved by adding an indium-containing layer before the QWs—the “underlayer” (UL). In this work, we evidence that any indium-containing III-nitride layer acts to incorporate surface defects; the UL hence acts as a getter for surface defects to avoid their incorporation into the QWs as IQE-reducing point defects (PDs). We directly observe the reduction in PD-density caused by increasing the UL thickness.

We study the impact of non-radiative defects on Auger recombination in c-plane InGaN/GaN single quantum wells (SQWs) in the efficiency droop regime using high injection time-resolved photoluminescence. The defect density in the active layer is tuned by varying the thickness of an InAlN underlayer. When the defect density is increased, apart from Shockley–Read–Hall (SRH) and standard Auger recombination, introducing an extra defect-assisted Auger process is required to reconcile the discrepancy observed between the usual ABC model and experimental data. We derive a linear dependence between the SRH coefficient and the bimolecular defect-assisted Auger coefficient, which suggests that the generated defects can act as scattering centers responsible for indirect Auger processes. Our results further suggest that the defect-assisted Auger recombination is expected to be all the more critical in green to red III-nitride light-emitting diodes due to their reduced radiative rate.

International audience; c-plane GaN/AlN quantum dots (QDs) are promising zero-dimensional quantum nanostructures that exhibit single photon emission properties up to room temperature and even above. In this context, it is of prime interest to gain a deeper insight into the recombination dynamics of photogenerated electron-hole pairs captured by such dots. Hence, in this work, we study the time-resolved photoluminescence (PL) properties in the low injection regime and at cryogenic temperatures of c-plane GaN/AlN QD ensembles emitting above the bulk GaN bandgap in order to properly understand the nature of the recombination channels behind the observed non-exponential decay time profiles. Such decays reveal the existence of a relaxation channel competing with the radiative recombination one. It is thus observed that for the former process the dynamics is independent of the dot height, which is attributed to a reversible nonradiative transfer that could be mediated by a spin-flip process to a dark-level state. The radiative recombination process is recognizable thanks to the characteristic dependence of its lifetime with the emission energy, which is well accounted for by the built-in electric field inherent to quantum nanostructures grown along the c-axis and the variations in the lateral confinement at play in such QDs. Those conclusions are drawn from the analysis of the time-evolution of the PL spectra by means of a simple analytical model that enables to exclude any screening of the built-in electric field.

We present a methodology to quantify polarization and electron affinity changes at interfaces by combining scanning tunneling spectroscopy, off-axis electron holography in transmission electron microscopy (TEM), and self-consistent calculations of the electrostatic potential and electron phase change. We use a precisely known grown-in doping structure to calibrate the surface potential of the TEM lamella and thereby achieve a quantitative analysis of electron phase changes measured by off-axis electron holography. Using this calibration, we deduce quantitatively polarization and electron affinity changes for ${\mathrm{Al}}_{\text{0.06}}{\mathrm{Ga}}_{\text{0.94}}\mathrm{N}/\mathrm{GaN}$ and ${\mathrm{In}}_{\text{0.05}}{\mathrm{Ga}}_{\text{0.95}}\mathrm{N}/{\mathrm{Al}}_{\text{0.06}}{\mathrm{Ga}}_{\text{0.94}}\mathrm{N}$ interfaces. The latter interface reveals, as expected, biaxial relaxation as well as polarization and electron affinity changes. However, at the ${\mathrm{Al}}_{\text{0.06}}{\mathrm{Ga}}_{\text{0.94}}\mathrm{N}/\mathrm{GaN}$ interface anomalous lattice relaxations and vanishing polarization and electron affinity changes occur, whose underlying physical origin is anticipated to be total energy minimization by the minimization of Coulomb interactions between the polarization-induced interface charges.

International audience; Polariton lasers are mostly based on planar cavities. Here, we focus on an alternative configuration with slab waveguide modes strongly coupled to excitons confined in GaN/AlGaN quantum wells. We study experimentally and theoretically polariton relaxation at temperatures ranging from 4 to 200 K. We observe a good robustness of the lower polariton population peak energy position against temperature changes due to a balance between the shift of the exciton energy and the change in the normal mode splitting, a promising feature for future applications such as lasers and amplifiers where a small temperature drift in the emission wavelength is a desired asset. Finally, at T = 4 K we observe the signature of polariton nonlinearities occurring in the continuous wave regime that are assigned to an optical parametric oscillation process.

Exploring the limits of spontaneous emission coupling is not only one of the central goals in the development of nanolasers, it is also highly relevant regarding future large-scale photonic integration requiring energy-efficient coherent light sources with a small footprint. Recent studies in this field have triggered a vivid debate on how to prove and interpret lasing in the high-β regime. We investigate close-to-ideal spontaneous emission coupling in GaN nanobeam lasers grown on silicon. Such nanobeam cavities allow for efficient funneling of spontaneous emission from the quantum well gain material into the laser mode. By performing a comprehensive optical and quantum-optical characterization, supported by microscopic modeling of the nanolasers, we identify high-β lasing at room temperature and show a lasing transition in the absence of a threshold nonlinearity at 156 K. This peculiar characteristic is explained in terms of a temperature and excitation power-dependent interplay between zero-dimensional and two-dimensional gain contributions., Here the authors present temperature dependent studies of GaN nanobeam lasers grown on a silicon substrate and demonstrate high-βlasing at room temperature. Comprehensive optical and quantum-optical characterization, complemented by microscopic modeling, of the nanolasers allow identification of lasing behavior.

Since the early 1960s, alloys are commonly grouped into two classes that feature either bound states in the band gap (I) or additional, nondiscrete band states (II). Consequently, one can observe either excitons bound to isoelectronic impurities or the typical band edge emission of a semiconductor that shifts and broadens with rising isoelectronic doping concentration. Microscopic parameters for class I alloys can directly be extracted from photoluminescence (PL) spectra, whereas any conclusions drawn for class II alloys usually remain limited to macroscopic assertions. Nonetheless, we present a spectroscopic study on exciton localization in a mixed-crystal alloy (class II) that allows us to access microscopic alloy parameters. In order to illustrate our approach, we study bulk InxGa1-xN epilayers at the onset of alloying (0

The electrical properties and deep trap spectra were compared for near-UV GaN/InGaN quantum well (QW) structures grown on free-standing GaN substrates. The structures differed by the presence or absence of a thin (110 nm) InGaN layer inserted between the high temperature GaN buffer and the QW region. Capacitance-voltage profiling with monochromatic illumination showed that in the InGaN underlayer (UL), the density of deep traps with optical threshold near 1.5 eV was much higher than in the QW and higher than for structures without InGaN. Irradiation with 5 MeV electrons strongly increased the concentration of these 1.5 eV traps in the QWs, with the increase more pronounced for samples without InGaN ULs. The observations are interpreted using the earlier proposed model explaining the impact of In-containing underlayers by segregation of native defects formed during growth of GaN near the surface and trapping of these surface defects by In atoms of the InGaN UL, thus preventing them from infiltrating the InGaN QW region. Deep level transient spectroscopy (DLTS) also revealed major differences in deep trap spectra in the QWs and underlying layers of the samples with and without InGaN ULs. Specifically, the introduction of the InGaN UL stimulates changing the dominant type of deep traps. Irradiation increases the densities of these traps, with the increase being more pronounced for samples without the InGaN UL. It is argued that light emitting diodes (LEDs) with InGaN UL should demonstrate a higher radiation tolerance than LEDs without InGaN UL. (C) 2020 Elsevier B.V. All rights reserved.

We study the impact of non-radiative defects on Auger recombination in c-plane InGaN/GaN single quantum wells (SQWs) in the efficiency droop regime using high injection time-resolved photoluminescence. The defect density in the SQW is controlled by tuning the thickness of an InAlN underlayer. When the defect density is increased, apart from Shockley-Read-Hall (SRH) and standard Auger recombination, introducing an extra defect-assisted Auger process is required to reconcile the discrepancy observed between the usual ABC model and experimental data. We derive a linear dependence between the SRH coefficient and the bimolecular defect-assisted Auger coefficient, which suggests that the generated defects can act as scattering centers responsible for indirect Auger processes. In particular, in defective SQWs, the defect-assisted Auger recombination rate can exceed the radiative one. Our results further suggest that the defect-assisted Auger recombination is expected to be all the more critical in green to red III-nitride light-emitting diodes due to their reduced radiative rate.

Blue light-emitting diodes based on III-nitride semiconductors are nowadays widely used for solid-state lighting. They exhibit impressive figures of merit like an internal quantum efficiency close to 100%. This value is intriguing when considering the high dislocation density running throughout the InGaN/GaN quantum well (QW) active region. This striking feature is currently ascribed to carrier localization occurring in the InGaN alloy, which hinders their diffusion toward dislocations. However, it was recently reported that another source of defects, disconnected from dislocations, dramatically decreases the radiative efficiency of InGaN/GaN QWs. Those defects, present at the surface, are usually trapped in an InGaN underlayer (UL), which is grown before the QW active region. To get insight into the trapping mechanism, we varied the UL thickness, In content, and materials system (InGaN or InAlN) and studied the photoluminescence decay time at 300 K of a single InGaN/GaN QW. Our data demonstrate that defects are incorporated proportionally to the indium content in the UL. In addition, we show that those defects are created during the high-temperature growth of GaN and that they segregate at the surface even at low-temperature. Eventually, we propose an intrinsic origin for these surface defects. (C) 2018 Author(s).

We demonstrate optically-pumped waveguides grown on freestanding GaN substrate featuring AlInN claddings and GaN/Al0.1Ga0.9N multiple quantum wells exhibiting narrow bandwidth (3.8 nm) optical gain around 370 nm. Due to the high refractive index contrast between the cladding layers and the active region, the confinement factor is as high as 48% and net modal gain values in excess of 80 cm−1 are measured. The results agree well with self-consistent calculations accounting for built-in electric field effects and high carrier density related phenomena. These results open interesting perspectives for the realization of more efficient near-UV lasers and optical amplifiers.

III-nitride surface states are expected to impact high surface-to-volume ratio devices, such as nano- and micro-wire light-emitting diodes, transistors, and photonic integrated circuits. In this work, reversible photoinduced oxygen desorption from III-nitride microdisk resonator surfaces is shown to increase optical attenuation of whispering gallery modes by 100 cm−1 at λ = 450 nm. Comparison of photoinduced oxygen desorption in unintentionally and n+-doped microdisks suggests that the spectral changes originate from the unpinning of the surface Fermi level, likely taking place at etched nonpolar III-nitride sidewalls. An oxygen-rich surface prepared by thermal annealing results in a broadband Q improvement to state-of-the-art values exceeding 1 × 104 at 2.6 eV. Such findings emphasize the importance of optically active surface states and their passivation for future nanoscale III-nitride optoelectronic and photonic devices.

Thin-wall tubes composed of nitride semiconductors (III-N compounds) based on GaN/InAlN multiple quantum wells (MQWs) are fabricated by metalorganic vapor-phase epitaxy in a simple and full III-N approach. The synthesis of such MQW-tubes is based on the growth of N-polar c-axis vertical GaN wires surrounded by a coreshell MQW heterostructure followed by in situ selective etching using controlled H-2/NH3 annealing at 1010 degrees C to remove the inner GaN wire part. After this process, well-defined MQW-based tubes having nonpolar m-plane orientation exhibit UV light near 330 nm up to room temperature, consistent with the emission of GaN/InAlN MQWs. Partially etched tubes reveal a quantum-dotlike signature originating from nanosized GaN residuals present inside the tubes. The possibility to fabricate in a simple way thin-wall III-N tubes composed of an embedded MQW-based active region offering controllable optical emission properties constitutes an important step forward to develop new nitride devices such as emitters, detectors or sensors based on tubelike nanostructures.

The origin of efficiency droop in state-of-the-art quality In GaN/GaN and GaN/AlGaN quantum wells (QWs) grown on various crystal planes is studied by means of time-resolved photoluminescence spectroscopy associated with a precise determination of the QW carrier density. In a first set of experiments, it is shown that a polar InGaN/GaN QW under nonresonant high optical excitation shows clear signatures of Auger loss mechanism and thus behaves quite differently compared to its binary based GaN/AlGaN QW counterpart, where no Auger signature is observed. In order to get rid of the impact of the built-in polarization field and illustrate the dominant role of carrier localization, similar experiments have been conducted on two m-plane In GaN/GaN QWs with similar In composition but a different degree of disorder. We demonstrate that carrier localization strongly enhances the Auger recombination process in nonpolar In GaN/GaN QWs. We also show that this effect may be further amplified by the presence of polarization fields on polar QWs. The relaxation of the k-selection rule during the Auger recombination process, resulting from QW potential disorder, can account for the enhancement of the efficiency droop in In GaN/GaN QWs.

Contrary to the case of III-nitride based visible light-emitting diodes for which the inhomogeneous linewidth broadening characteristic of InGaN-based multiple quantum well (MQW) heterostructures does not appear as a detrimental parameter, such a broadening issue can prevent a microcavity (MC) system entering into the strong light-matter coupling regime (SCR). The impact of excitonic disorder in low indium content (x similar to 0.1) InxGa1-xN/GaN MQW active regions is therefore investigated for the subsequent realization of polariton laser diodes by considering both simulations and optical characterizations. It allows deriving the requirements for such MQWs in terms of absorption, emission linewidth, and Stokes shift. Systematic absorption-like and photoluminescence (PL) spectroscopy experiments are performed on single and multiple In0.1Ga0.9N/GaN quantum wells (QWs). Micro-PL mappings reveal a low temperature PL linewidth of similar to 30 meV, compatible with SCR requirements, for single QWs for which the microscopic origin responsible for this broadening is qualitatively discussed. When stacking several InGaN/GaN QWs, a departure from such a narrow linewidth value and an increase in the Stokes shift are observed. Various possible reasons for this degradation such as inhomogeneous built-in field distribution among the QWs are then identified. An alternative solution for the MC design to achieve the SCR with the InGaN alloy is briefly discussed. (C) 2014 AIP Publishing LLC.

Using cathodoluminescence spectroscopy directly performed in a scanning transmission electron microscope at liquid helium temperatures, the optical and structural properties of a 62 InGaN/GaN multiple quantum well embedded in an AlInN/GaN based microcavity are investigated at the nanometer scale. We are able to spatially resolve a spectral redshift between the individual quantum wells towards the surface. Cathodoluminescence spectral linescans allow directly visualizing the critical layer thickness in the quantum well stack resulting in the onset of plastic relaxation of the strained InGaN/GaN system. (C) 2014 AIP Publishing LLC.

Two types of near-UV light-emitting diodes (LEDs) with an InGaN/GaN single quantum well (QW) differing only in the presence or absence of an underlayer (UL) consisting of an InAlN/GaN superlattice (SL) were examined. The InAlN-based ULs were previously shown to dramatically improve internal quantum efficiency of near-UV LEDs, via a decrease in the density of deep traps responsible for nonradiative recombination in the QW region. The main differences between samples with and without UL were (a) a higher compensation of Mg acceptors in the p-GaN:Mg contact layer of the sample without UL, which correlates with the presence of traps with an activation energy of 0.06 eV in the QW region, (b) the presence of deep electron traps with levels 0.6 eV below the conduction band edge (E-c) (ET1) and at E-c 0.77 eV (ET2) in the n-GaN spacer underneath the QW, and the presence of hole traps (HT1) in the QW, 0.73 eV above the valence band edge in the sample without UL (no traps could be detected in the sample with UL), and (c) a high density of deep traps with optical ionization energy close to 1.5 eV for the LEDs without UL. Irradiation with 5 MeV electrons led to a strong decrease in the electroluminescence (EL) intensity in the LEDs without UL, while for the samples with UL, such irradiation had little effect on the EL signal at high driving current, although the level of driving currents necessary to have a measurable EL signal increased by about an order of magnitude. This is despite the 5 times higher starting EL signal of the sample with UL. Irradiation also led to the appearance in the LEDs with UL of the ET1 and HT1 deep traps, but with concentration much lower than without the UL, and to a considerable increase in the Mg compensation ratio.

We report on the epitaxial growth of high-quality core–shell nonpolar m-plane GaN/InAlN multiple quantum wells (MQWs) on the sidewall facets of c-oriented hexagonal GaN wires. Pseudomorphic growth without generation of threading dislocations has been established for planar GaN/InAlN (In = 15%) MQWs grown on m-GaN substrates, although m-plane InAlN epilayers cannot be grown perfectly lattice-matched to GaN along the two in-plane directions. Calculations based on elasticity theory indicate that the significant amount of strain oriented along the c-axis is the likely factor favoring the formation of cracks along this direction. For the core–shell wire geometry, such cracks are not observed, leading to high structural quality MQWs. A significant UV emission centered around 3.7 eV at room temperature with a strong polarization perpendicular to the wire axis is observed for those core–shell wires, which is consistent with k·p method calculations, proving the absence of quantum confined Stark effect on nonpolar ...

We report a numerical and experimental investigation of fabrication tolerances and outcoupling in optically pumped III-nitride nanolasers operating near lambda = 460 nm, in which feedback is provided by a one-dimensional photonic crystal nanobeam cavity and gain is supplied by a single InGaN/GaN quantum well. Using this platform, we [1] and others [2] previously demonstrated single-mu W lasing thresholds due to the high beta Q-product inherent to the nanobeam geometry (beta is spontaneous emission coupling fraction into desired mode). In this work, we improved the fraction of emission emitted into our microscope's light cone by combining a redesigned photonic crystal cavity (c.f. [3]) with a cross-grating coupler with period approximately twice the photonic crystal lattice constant [4]. The samples were fabricated in epitaxial III-nitride layers grown on (111) silicon substrates using metal organic vapor phase epitaxy. The photonic crystal and output couplers were patterned using a single electron beam lithography exposure and subsequently transferred to the underlying III-nitride layers using dry etching. The nanobeams were then suspended via vapor phase etching of silicon in XeF2 (Figure 1) [5]. Scanning electron microscopy cross-sections revealed high-aspect ratio (>5), sub-70 nanometer diameter holes with near-vertical sidewalls. Fabrication-induced geometry errors were characterized by processing scanning electron micrographs with custom critical dimension software (Figure 2). Using UV micro-photoluminescence spectroscopy at room temperature, we measured the nanobeams' emission intensity, far-field profile, and quality factor. By comparing more than ten nominally identical nanobeams for each geometry with finite-difference time-domain simulations taking into account the geometrical deviations measured during fabrication [8], we characterized the role of fabrication-induced imperfections. Finally, we explored the trade-off between the quality factor and collected signal via lithographic variations of the output coupler grating amplitude. Our results demonstrate the robustness of III-nitrides for short-wavelength photonic crystal applications, such as photonic integrated circuits, optoelectronics, and cavity quantum electrodynamics.

The ternary semiconductor alloy Al0.25Ga0.75N has been analyzed by means of correlated photoluminescence spectroscopy and atom probe tomography (APT). We find that the composition measured by APT is strongly dependent on the surface electric field, leading to erroneous measurements of the alloy composition at high field, due to the different evaporation behaviors of Al and Ga atoms. After showing how a biased measurement of the alloy content leads to inaccurate predictions on the optical properties of the material, we develop a correction procedure which yields consistent transition and localization energies for the alloy photoluminescence. (C) 2016 AIP Publishing LLC.

III-nitride based microcavities (MCs) appear as one of the most promising candidates for the realization of room temperature (RT) polariton laser diodes. The present work focuses on the properties of low In content InGaN/GaN multiple quantum wells (MQWs) in terms of inhomogeneous broadening, exciton localization energy, and plastic strain relaxation. For a small number of such QWs, an inhomogeneous line broadening of 41 meV is reported, which is compatible with strong coupling regime requirements. By contrast when considering an InGaN/GaN MQW set, a high density of defects is reported, which is ascribed to plastic strain relaxation. From the evolution of the inhomogeneous line broadening as a function of the number of QWs probed by microphotoluminescence measurements, it is concluded that for the realization of polariton light-emitting devices the QW number should not go beyond 30 for MC structures grown on FS-GaN substrate relying on InGaN/GaN QWs with an indium content similar to 12-15% and thicknesses of 1.5-2 nm/3 nm for the wells and the barriers, respectively. (C) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

We investigate the excited states of a neutral donor bound exciton (D0X) in bulk GaN by means of high-resolution, polychromatic photoluminescence excitation (PLE) spectroscopy. The optically most prominent donor in our sample is silicon accompanied by only a minor contribution of oxygen—the key for an unambiguous assignment of excited states. Consequently, we can observe a multitude of Si0X-related excitation channels with linewidths down to 200 μeV. Two groups of excitation channels are identified, belonging either to rotational-vibrational or electronic excited states of the hole in the Si0X complex. Such identification is achieved by modeling the excited states based on the equations of motion for a Kratzer potential, taking into account the particularly large anisotropy of effective hole masses in GaN. Furthermore, several ground- and excited states of the exciton-polaritons and the dominant bound exciton are observed in the photoluminescence (PL) and PLE spectra, facilitating an estimate of the associated complex binding energies. Our data clearly show that great care must be taken if only PL spectra of D0X centers in GaN are analyzed. Every PL feature we observe at higher emission energies with regard to the Si0X ground state corresponds to an excited state. Hence, any unambiguous peak identification renders PLE spectra highly valuable, as important spectral features are obscured in common PL spectra. Here, GaN represents a particular case among the wide-bandgap, wurtzite semiconductors, as comparably low localization energies for common D0X centers are usually paired with large emission linewidths and the prominent optical signature of exciton-polaritons, making the sole analysis of PL spectra a challenging task.We investigate the excited states of a neutral donor bound exciton (D0X) in bulk GaN by means of high-resolution, polychromatic photoluminescence excitation (PLE) spectroscopy. The optically most prominent donor in our sample is silicon accompanied by only a minor contribution of oxygen—the key for an unambiguous assignment of excited states. Consequently, we can observe a multitude of Si0X-related excitation channels with linewidths down to 200 μeV. Two groups of excitation channels are identified, belonging either to rotational-vibrational or electronic excited states of the hole in the Si0X complex. Such identification is achieved by modeling the excited states based on the equations of motion for a Kratzer potential, taking into account the particularly large anisotropy of effective hole masses in GaN. Furthermore, several ground- and excited states of the exciton-polaritons and the dominant bound exciton are observed in the photoluminescence (PL) and PLE spectra, facilitating an estimate of the assoc...

We report on the current properties of Al1-x InxN (x approximate to 0.18) layers lattice- matched ( LM) to GaN and their specific use to realize nearly strain- free structures for photonic and electronic applications. Following a literature survey of the general properties of AlInN layers, structural and optical properties of thin state- of- the- art AlInN layers LM to GaN are described showing that despite improved structural properties these layers are still characterized by a typical background donor concentration of ( 1 - 5) x 10(18) cm(-3) and a large Stokes shift (similar to 800 meV) between luminescence and absorption edge. The use of these AlInN layers LM to GaN is then exemplified through the properties of GaN/ AlInN multiple quantum wells ( QWs) suitable for near- infrared intersubband applications. A built- in electric field of 3.64MVcm(-1) solely due to spontaneous polarization is deduced from photoluminescence measurements carried out on strain- free single QW heterostructures, a value in good agreement with that deduced from theoretical calculation. Other potentialities regarding optoelectronics are demonstrated through the successful realization of crack- free highly reflective AlInN/ GaN distributed Bragg reflectors ( R > 99%) and high quality factor microcavities ( Q > 2800) likely to be of high interest for short wavelength vertical light emitting devices and fundamental studies on the strong coupling regime between excitons and cavity photons. In this respect, room temperature ( RT) lasing of a LM AlInN/ GaN vertical cavity surface emitting laser under optical pumping is reported. A description of the selective lateral oxidation of AlInN layers for current confinement in nitride- based light emitting devices and the selective chemical etching of oxidized AlInN layers is also given. Finally, the characterization of LM AlInN/ GaN heterojunctions will reveal the potential of such a system for the fabrication of high electron mobility transistors through the report of a high two- dimensional electron gas sheet carrier density ( n(s) similar to 2.6 x 10(13) cm(-2)) combined with a RT mobility mu(e) similar to 1170 cm(2) V-1 s(-1) and a low sheet resistance, R similar to 210 Omega square.

We report a study of self-assembled GaN/AlN quantum dots (QDs) grown by metalorganic vapor phase epitaxy. We have investigated the impact of the AlN template quality on the nucleation of QDs obtained by the so-called Stranski-Krastanov growth mode transition. It is shown that the AlN epilayer deposited on GaN exhibits different relaxation steps. A rather inefficient plastic relaxation first occurs in the early few nanometers. Then, as the growth proceeds cracks are generated to further release the elastic energy. However, Raman spectroscopy indicates that strain relaxation takes place only nearby the cracks. Consequently, a third relaxation process occurs as the AlN layer thickness still increases. It is characterized by V-shape pits at the AlN surface likely originating from opening of threading dislocation terminations. Atomic force microscopy and micro-photoluminescence studies indicate that these topological defects act as preferential nucleation centers competing with the GaN QD formation. (c) 2007 Elsevier B.V. All rights reserved.

By performing time-resolved optical non-degenerate pump-probe experiments, we study the relaxation dynamics of spin-polarized excitons in wurtzite epitaxial GaN and in nitride nanostructures. Those materials are indeed promising candidates for spintronic applications because of their weak spin-orbit coupling and large exciton binding energy (~ 17 meV and ~ 26meV in bulk GaN, respectively). In epilayers, we show that the high density of dislocations increases dramatically the spin relaxation of electrons and holes through the defect assisted Elliott-Yafet mechanism. That makes the exciton dephasing time very short. In high quality GaN/AlGaN quantum wells, both the exciton-spin lifetime S and the exciton dephasing-time T2 were determined via pump-probe spectroscopy using polarized laser pulses and time-resolved four wave-mixing experiments. The evolution of both quantities with temperature shows that spin relaxation occurs in the motional narrowing regime up to 80 K. Above this threshold, the thermal energy becomes large enough for excitons to escape from the QW. Such measurements demonstrate that GaN-based heterostructures can reach a very high degree of control that was previously mostly restricted to conventional III-V semiconductors and more specifically to the arsenide family.

IIIV photonics on silicon is an active and promising research area. Here, we demonstrate room-temperature (RT) lasing in short-wavelength III-nitride photonic crystal nanobeam cavities grown on silicon featuring a single InGaN quantum well (QW). In the low-absorption QW region, high quality factors in excess of 104 are measured, while RT blue lasing under continuous-wave optical pumping is reported in the high-absorption wavelength range, hence the high QW gain region. Lasing characteristics are well accounted for by the large spontaneous emission coupling factor (beta > 0.8) inherent to the nanobeam geometry and the large InGaN QW material gain. Our work illustrates the high potential of III-nitrides on silicon for the realization of low power nanophotonic devices with a reduced footprint that would be of prime interest for fundamental lightmatter interaction studies and a variety of lab-on-a-chip applications including biophotonics.

Lasing is demonstrated in III-nitride photonic crystal nanobeam cavities grown on silicon. Laser characteristics are well accounted for by the large spontaneous emission coupling factor inherent to nanobeams and the InGaN quantum well material gain.

We propose to use lattice-matched AlInN/GaN to replace the Al(Ga)N/GaN material system for III-nitride Bragg reflectors, despite the poor material quality of AlInN reported until very recently. We report an improvement of AlInN material that allowed for successful fabrication of a microcavity light emitting diode, a distributed Bragg reflector with 99.4% reflectivity and microcavities with a quality factor over 800. These results establish state-of-the-art values for III-nitrides, and announce the future importance of AlInN in GaN-based optoelectronics. (c) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

International audience

We present a systematic study of the local hydrogen bonding in hydrogenated polymorphous silicon thin films (pm-Si:H), a heterogeneous material deposited on the edge of crystallinity, by means of Fourier transform infrared spectroscopy. A vibrational mode at similar to2030 cm(-1) is reported and attributed to hydrogen atoms bonded in hydrogen-rich regions present at the interface between ordered regions and the amorphous matrix. This assignment is found to be in good agreement with previous spectroscopic ellipsometry and Raman spectroscopy studies. Combined with stress measurements we draw a picture of the nanostructure of pm-Si:H films, namely a two-domain material exhibiting: (i) large fluctuations of H content, (ii) a high mass density and (iii) the coexistence of highly strained crystalline phases with a relaxed amorphous matrix. Unexplained optoelectronic properties and metastability phenomena can also be accounted for by this picture.

We describe recent continuous wave studies of stimulated polariton scattering in semiconductor microcavities, with emphasis on the variety of new physics which has been observed in the last few years. The ability to manipulate both exciton and photon properties, and how they interact together to form strongly coupled exciton-photon coupled modes, exciton polaritons, leads to a number of novel phenomena, previously unreported in bulk semiconductors or quantum wells. The unusual dispersion of the lower polariton branch, which allows energy and momentum conserving polariton-polariton parametric scattering under resonant excitation, is shown to be a key factor enabling much of the new physics. A classical theoretical treatment of the phenomena which draws parallels between the equivalent pictures of stimulated polariton scattering and those of a triply resonant optical parametric oscillator is discussed. Higher order parametric phenomena and the factors which control the threshold for stimulation are also described. The results obtained under resonant excitation are contrasted with phenomena which occur under conditions of non-resonant excitation. Prospects to achieve 'polariton lasing' under non-resonant excitation are discussed.

When silicon thin films are deposited by plasma enhanced chemical vapor deposition in a plasma regime close to powder formation, a new type of material, consisting of an amorphous matrix in which silicon nanocrystallites are embedded is obtained. This material, named hydrogenated polymorphous silicon (pm-Si: H), exhibits enhanced transport properties with respect to state-of-the-art hydrogenated amorphous silicon (a-Si: H). In order to understand the origin of such improved properties, we investigated structural characterization of pm-Si:H films. High resolution transmission electron microscopy (HRTEM) micrograph, micro-Raman and infrared spectra of the films are presented. The crystallite sizes deduced from the Raman spectra are supported by the HRTEM measurements. The infrared stretching modes of pm-Si:H films present a band at similar to2030 cm(-1) attributed to hydrogen platelets. Two approaches are then given in order to explain the enhanced photoconductivity properties. The first one, qualitative, appeals to low density of states at the Fermi level N(E-F) and low capture cross-section of electrons sigma(c) due to the improved amorphous matrix. The second, more quantitative, suggests that recombination mainly occur at dangling bonds at the surface of the crystallites. Considering the dangling bond density at silicon surface passivated by hydrogen and the description of multiphonon carrier capture, both given in the literature, we derive N(E-F) and sigma(c) values in good agreement with experiments.

Recent work on polariton-polariton scattering in semiconductor microcavities under continuous wave excitation conditions is reviewed. For weak non-resonant laser excitation, a marked bottleneck in the polariton distribution is observed, but which is suppressed by polariton-polariton scattering as the laser intensity is increased. However, the high excitation conditions necessary to observe stimulated emission lead to loss of strong coupling and conventional lasing in the weak coupling regime, By contrast for resonant excitation, polaritons are created directly in the polariton trap formed by the microcavity dispersion curve. Stimulated scattering of the bosonic quasi-particles occurs to the emitting state at the centre of the Brillouin zone, and to a companion state at high wavevector. The stimulation phenomena lead to condensation of the bosonic quasi-particles to two specific regions of k-space, and to the formation of a new state with macroscopic coherence. The prospects to achieve a polariton laser under conditions of non-resonant excitation are discussed. (C) 2002 Elsevier Science B.V. All rights reserved.

The electronic structure of Al1−xInxN(101⎯⎯0) surfaces is investigated by cross-sectional scanning tunneling spectroscopy and density functional theory calculations. The surface exhibits empty Al and/or In-derived dangling bond states, which are calculated to be within the fundamental bulk band gap for In compositions smaller than 60%. The energy of the lowest empty In-derived surface state is extracted from the tunnel spectra for lattice-matched Al1–xInxN with In compositions of x = 0.19 and x = 0.20 to be EC − 1.82 ± 0.41 and EC − 1.80 ± 0.56 eV, respectively, in good agreement with the calculated energies. Under growth conditions, the Fermi level is hence pinned (unpinned) for In compositions smaller (larger) than 60%. The analysis of the tunnel spectra suggests an electron affinity of ∼3.5 eV for nonpolar lattice-matched Al1–xInxN cleavage surfaces, which is large compared to linearly interpolated values of polar AlN and InN (0001) surfaces.

We report on the first time measurement, using four-wave mixing, of the dephasing time of excitons in a high-quality GaN/Al0.05Ga0.95N quantum well. The comparison with the exciton-spin lifetime, determined via pump-probe spectroscopy using polarized laser pulses, shows that spin relaxation occurs in the motional narrowing regime.

Stimulated polariton scattering in semiconductor microcavities is reported. The phenomena arise from the bosonic character of the coupled exciton-photon modes of the system. The ability to manipulate and control the polariton dispersions in microcavities is shown to be a key factor underlying the new observations. The potential of such phenomena to form the basis of a new type of coherent light source ("polariton" lasers) and highly efficient optical parametric oscillators is discussed.

When silicon thin films are deposited by plasma enhanced chemical vapor deposition in a plasma regime close to the formation of powder, a new type of material, called hydrogenated polymorphous silicon (pm-Si:H) is obtained. This material has increased transport properties with respect to device-grade hydrogenated amorphous silicon (a-Si:H). To understand the origin of such improved transport properties, we made electrical measurements from which we deduced that the density of states at the Fermi level N(E-F) and the carrier capture cross-section, sigma(c), in pm-Si:H films are at least 10 times lower and 5 times lower, respectively, than in a-Si:H films. The crystallite sizes deduced from Raman spectra confirm high-resolution transmission electron microscopy measurements. The infrared stretching modes of pm-Si:H films have a band at similar to 2035 cm(-1) which is attributed to hydrogen platelets. The smaller density of states at the Fermi level N(E-F) is explained in terms of improved amorphous matrix as confirmed by optical measurements. We suggest that the low capture cross-section, sigma(c), observed in these films results from a preferential carrier recombination path at grain boundary dangling bonds as predicted by theoretical calculations. (C) 2000 Elsevier Science B.V. All rights reserved.

Hydrogenated polymorphous silicon (pm-Si:H) is a new material obtained by plasma-enhanced chemical vapour deposition by running the plasma close to powder formation. Preliminary studies have revealed the presence of silicon nanocrystallites embedded in an amorphous matrix but only in a limited range of deposition conditions. In this work we have investigated the structural properties of such films by means of spectroscopic optical measurements. The analysis of transmission spectra in the transparent region has shown that pm-Si:H films have indeed a more ordered structure than state-of-the-art hydrogenated amorphous silicon (a-Si:H) films. This has been observed in the whole range of deposition conditions leading to pm-Si:H films. On a final point the implication of structural properties on the excellent optoelectronic properties previously reported in pm-Si:H films is discussed.

When silicon thin films are deposited by plasma enhanced chemical vapour deposition in a plasma regime close to that of the formation of powder, a new type of material, called polymorphous silicon (pm-Si), is obtained. We present here the optoelectronic and stability properties of pm-Si films deposited from a mixture of silane diluted with hydrogen at total gas pressures in the range 800-1600 mTorr. A comparison with the properties of standard hydrogenated amorphous silicon (a-Si:H) is made. While some properties of both materials are similar, many others differ in a striking manner. Characterizations of as-deposited pm-Si films show that the best samples exhibit enhanced transport properties, such as the fact that the quantum efficiency-mobility-lifetime product eta mu tau is increased by a factor of 200-700 compared with that measured on a-Si:H under the same conditions. This correlates with a lower density of deep states. The kinetics of creation of defects, performed under 670 mW cm(-2) white light illumination and at a high temperature (100 degrees C) in order to attain a final steady state, have been studied, pm-Si samples exhibit faster kinetics of creation as well as of annealing of metastable defects than do a-Si:H samples. In their light-soaked state the best pm-Si samples exhibit eta mu tau products of the same order as those measured on device-grade a-Si:H in the annealed state. These enhanced transport properties, new properties and better stability are linked to the peculiar structure of pm-Si, namely ordered silicon nanoparticles embedded in an amorphous matrix.

We report on a clear experimental demonstration of the presence of biexciton recombination in high quality GaN/AlGaN quantum wells, thus opening the way to relevant improvements of the performances of GaN based devices. The samples have been grown by metalorganic vapor phase epitaxy optimizing the deposition conditions to strongly reduce the Al fluctuations in the barriers. This leads to a photoluminescence broadening of only 5 meV at a temperature of 10 K for an Al content in the barriers of 5%. The biexciton binding energy if found to be of the order of 9 meV. The recombination kinetics show that the exciton and biexciton components are not thermalized at low temperature allowing to extract the intrinsic lifetimes of the two components. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)