57 results on '"Foucher J"'
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2. Lifetime measurements in Ti-52,Ti-54 to study shell evolution toward N=32
3. Lifetime measurements in Ti-52,Ti-54 to study shell evolution toward N=32
4. Lifetime measurements in Ti 52,54 to study shell evolution toward N=32
5. Transcription activator like effectors are involved in the host adaptation of Xanthomonas strains responsible for common bacterial blight of bean
6. Biodiversité dans l'estuaire de la Loire, quels enjeux ?
7. Steatosis, Glycation and Liver Fibrosis in Patients with Diabetes
8. Life at cold seeps: a synthesis of biogeochemical and ecological data from Kazan mud volcano, eastern Mediterranean Sea
9. The CD metrology perspectives and future trends
10. Impact of UV light on photoresist pattern linewidth roughness during gate etch processes
11. Plasma etching processes for future electronic devices
12. Gate Stack Patterning: challenges of the future
13. Plasma impact on 193nm Photoresist LWR
14. Impact of Plasma etching Processes on193nm Photoresists: Etch resistance and Linewidth roughness
15. Seafloor geological studies of active gas chimneys offshore Egypt (central Nile Fan)
16. Plasma etching challenges involved in gate stack patterning for 45 nm technological nodes and beyond
17. The CD-AFM technique as a mean to accelerate advanced process developpement for the 45 nm Node and beyond
18. Towards a better understanding of the mechanisms involved in the HBr cure plasma treatments
19. Plasma impact on ArF resist line ege roughness
20. Full 8' printed wafer 3D resist characterizations by Critical Dimension Atomic Force Microscopy
21. Process for making a gate for a short channel CMOS transistor structure
22. Nanometer scale linewidth control during etching of polysilicon gates in high density plasmas
23. Challenges in plasma etching for Nanoelectronics applications
24. Chemical topography analysis of silicon gates etched in HBr/Cl2/O2 and HBr/Cl2/O2/CF4 high density plasmas
25. Nanometer scale linewidth control during etching of polysilicon gtes in high density plasmas
26. Gate patterning for ultimate CMOS devices
27. Gate patterning for ultimate CMOS device fabrication
28. Resist transformation under high density plasma exposure
29. Silicon gate notching for patterning features with dimensions smaller than the resolution of lithography
30. Plasma etching processes for sub 50 nm Ultra Large Scale Integration technology
31. Resist trimming and silicon gate notching for patterning features with dimensions smaller than the resolution of the lithography
32. Manufacturing viability of the 'notched gate' process for sub-0.1µm technologies
33. Silicon gate etching: critical dimension control, technology and strategy for future CMOS devices
34. Chemical topography analysis using XPS during plasma etching in Si processing
35. Plasma etching of nano-scale feature in Silicon : application to ultimate CMOS gates and quantum nanowires
36. Fundamental limitations in the design of front end and back end plasma etch processes
37. Mass spectrometry as tool for plasma etching charactérization
38. High density plasma etching of Low K Dielectric Materials
39. The mechanisms of anisotropy control in plasma etching processes
40. Gate engineering for sub 50 nm CMOS devices
41. Analysis of the sidewall passivation layer formation mechanisms during plasma etching by Mass Spectrometry and XPS diagnostics
42. Recent warming of deep sea sediments in the Eastern Mediterranean
43. Campagne Seapso 4: Etude morphostructurale de la ride de Valufa dans le bassin de Lau
44. Campagne Pop 1: Processus d'extension dans le bassin arriere arc d'Okinawa
45. GOETHERMAL STRUCTURE OF THE TYRRHENIAN SEA
46. Exploration of ultimate gate patterning technologies: lithography and plasma etching
47. Novel microbial communities of the Haakon Mosby mud volcano and their role as a methane sink
48. Lifetime measurements in Ti 52 , 54 to study shell evolution toward N = 32
49. In situ fluxes and zonation of microbial activity in surface sediments of the Håkon Mosby Mud Volcano
50. Microbial methane oxidation and sulfate reduction at cold seeps of the deep eastern Mediterranean Sea
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