Plasma etching of nano-scale feature in Silicon : application to ultimate CMOS gates and quantum nanowires

Authors :: Cunge, G.
Foucher, J.
Vallier, L.
Joubert, O.
Laboratoire des technologies de la microélectronique (LTM)
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)
Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)
Clot, Marielle
Source :: ISPC, 15th International Symposium on Plasma Chemistry, ISPC, 15th International Symposium on Plasma Chemistry, 2001, Orléans, France
Publication Year :: 2001
Publisher :: HAL CCSD, 2001.
Abstract: International audience

Language :: English
Database :: OpenAIRE
Journal :: ISPC, 15th International Symposium on Plasma Chemistry, ISPC, 15th International Symposium on Plasma Chemistry, 2001, Orléans, France
Accession number :: edsair.dedup.wf.001..f58a953b86b068696759d52e4b6686ef

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