Plasma etching of nano-scale feature in Silicon : application to ultimate CMOS gates and quantum nanowires

MLA

Cunge, G., et al. Plasma Etching of Nano-Scale Feature in Silicon : Application to Ultimate CMOS Gates and Quantum Nanowires. Jan. 2001. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.dedup.wf.001..f58a953b86b068696759d52e4b6686ef&authtype=sso&custid=ns315887.

APA

Cunge, G., Foucher, J., Vallier, L., & Joubert, O. (2001). Plasma etching of nano-scale feature in Silicon : application to ultimate CMOS gates and quantum nanowires.

Chicago

Cunge, G., J. Foucher, L. Vallier, and O. Joubert. 2001. “Plasma Etching of Nano-Scale Feature in Silicon : Application to Ultimate CMOS Gates and Quantum Nanowires,” January. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.dedup.wf.001..f58a953b86b068696759d52e4b6686ef&authtype=sso&custid=ns315887.