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29 results on '"van den Brink, Martin"'

7. Holistic efficiency optimization: how to help in a downturn

Author

van den Brink, Martin

Subjects
Semiconductor industry, Integrated circuit fabrication, Industrial efficiency -- Reports -- Analysis -- Economic aspects, Semiconductor industry -- Innovations -- Economic aspects -- Analysis -- Reports, Integrated circuit fabrication -- Analysis -- Reports -- Economic aspects
Abstract

The industry is in another cyclical downturn. No one knows the depth or length of this cycle, but one thing is certain--manufacturing efficiency will be important. Since new fab spending […]

Published
2009

24. 2009 Executive Outlook: Survival and Opportunities in 2009.

Author

Johnson, Ardy, Deferm, Ludo, Van den Brink, Martin, Kalk, Franklin, Lindner, Paul, Kienzle, Oliver, Hilton, Mike, Melliar-Smith, Mark, Kiermasz, Adrian, Ko, Howard, Irvine, Geoff, Zafiropoulo, Arthur W., Rhines, Walden C., and Moore, Chris

Subjects
ECONOMIC forecasting, EXECUTIVES, SEMICONDUCTOR industry
Abstract

This article presents executives' economic outlook for the business world, particularly the semiconductor industry, in 2009. Ardy Johnson, vice president of marketing at Rudolph Technologies Inc., stated that well-managed growth and successful acquisitions will become a valuable competitive advantage for semiconductor firms. Ludo Deferm, executive vice president of IMEC, said that companies will continue to seek new markets.

Published
2009

25. SEMICON West 2008 Executive Outlook.

Author

Van den hove, Luc, Post, Richard S., Edwards, Tony, Byers, John P., Argov, Gideon, Lazovsky, David, Spiegelman, Jeffrey, Johnson, Ardy, Rae, Linda C., St. Dennis, Tom, Hilton, Mike, Blackborow, Paul, Ramus, Bill, Hunton, Nigel, Van den Brink, Martin, Gottscho, Richard A., Irvine, Geoff, Hueners, Bruce, Totten, Paul, and Bloemhard, Jeroen

Subjects
SEMICONDUCTOR industry, ENERGY conservation, COST effectiveness, INDUSTRIAL productivity
Abstract

The article presents outlook for the semiconductor industry for 2008 according to various executives. Among them are Luc Van den hove, executive vice president and chief operating officer of IMEC, Richard S. Post, chief executive officer of NEXX Systems Inc. and John P. Byers, president of Asymtek. They describe the importance of energy conservation, cost-effectiveness and high productivity in the industry.

Published
2008

26. SEMICON West 2007 Executive Outlook.

Author

Deferm, Ludo, Van Den Brink, Martin, Prasad, Roy, Moore, Chris, Richerzhagen, Bernold, Moghadam, Farhad, Babiarz, Alec, Polcari, Michael R., Hueners, Bruce W., Guilmart, Jim, Parikh, Mihir, Macneil, John, Taneja, Sanjiv, Namaroff, Mark, Blakey, Phil, Rhoades, Robert L., Rae, Linda, Sawicki, Joe, Scheine, David, and Spiegelman, Jeffrey

Subjects
EXECUTIVES, SEMICONDUCTOR industry, INTEGRATED circuits
Abstract

The article features several executives in the semiconductor industry and their outlook for 2007. IMEC vice president (VP) for business development Ludo Deferm believes that the industry will have an increasing drive from the so-called More-Than-Moore route, while ASML executive VP for marketing and technology Martin van den Brink believes that integrated-circuit manufacturers will continue to pursue design rule shrinks.

Published
2007

27. Lithography Executive Viewpoints.

Author

Deferm, Ludo, Kalk, Franklin, Van den Brink, Martin, and Lofquist, Sven

Subjects
LITHOGRAPHY, PHOTOLITHOGRAPHY, ELECTRON beam lithography, EXECUTIVES
Abstract

Presents views of executives in the field of lithography on the developments in the industry. Degree of extendibility of immersion lithography over different technology generations according to Ludo Deferm of IMEC; Production of the L32/hp45 technology cycle with 193 millimeters water immersion lithography at NA<1.4 by 2010 according to Franklin Kalk of Toppan Photomasks; Use of electron beam systems for process development in the photomask business according to Sven Lofquist of Micronic Laser Systems AB.

Published
2006

29. Litho Roadmap Shows Difficult Terrain (Part 2).

Author

Van Den Brink, Martin

Subjects
*LITHOGRAPHY, *ELECTRON beams
Abstract

Part II. Comments on issues pertaining to lithography technologies. Wavelength on which reflective layers can be produced; Challenges to ultraviolet lithography; Obstacles encountered by electron-beam imaging technology; Cost-to-throughput ratio of e-beam systems.

Published
2000

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