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Lithography Executive Viewpoints.
- Source :
- Semiconductor International; Jun2006, Vol. 29 Issue 7, p42-47, 3p
- Publication Year :
- 2006
-
Abstract
- Presents views of executives in the field of lithography on the developments in the industry. Degree of extendibility of immersion lithography over different technology generations according to Ludo Deferm of IMEC; Production of the L32/hp45 technology cycle with 193 millimeters water immersion lithography at NA<1.4 by 2010 according to Franklin Kalk of Toppan Photomasks; Use of electron beam systems for process development in the photomask business according to Sven Lofquist of Micronic Laser Systems AB.
- Subjects :
- LITHOGRAPHY
PHOTOLITHOGRAPHY
ELECTRON beam lithography
EXECUTIVES
Subjects
Details
- Language :
- English
- ISSN :
- 01633767
- Volume :
- 29
- Issue :
- 7
- Database :
- Supplemental Index
- Journal :
- Semiconductor International
- Publication Type :
- Periodical
- Accession number :
- 21501911