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Deep-UV wafer stepper with through-the-lens wafer to reticle alignment.

Authors :
Wittekoek, Stefan
van den Brink, Martin A.
Linders, Henk F.
Stoeldraijer, Judon M. D.
Martens, J. W.
Ritchie, Douglas R.
Source :
Proceedings of SPIE; Nov1990, Issue 1, p534-547, 14p
Publication Year :
1990

Details

Language :
English
ISSN :
0277786X
Issue :
1
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
65819587
Full Text :
https://doi.org/10.1117/12.20207