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3. Design of Ga2O3 Modulation Doped Field Effect Transistors

4. Assessment of the (010) $\beta$-Ga$_2$O$_3$ Surface and Substrate Specification

5. Design of Gallium Nitride Resonant Cavity Light Emitting Diodes on Si Substrates

6. All Epitaxial Fabrication of a Nanowire Plasmon Laser Structure

7. Two-Dimensional Electron Gas as a Basis for Low-Loss Hyperbolic Metamaterials

8. Ultra-Thin Absorber based on Phase Change Metamaterial Superlattice

9. Zinc Sulphide Overlayer Two-Dimensional Photonic Crystal for Enhanced Extraction of Light from a Micro Cavity Light-Emitting Diode

10. Polarization and Space Charge Limited Current in III-Nitride Heterostructure Nanowires

11. Nickel Foam as a Substrate for III-nitride Nanowire Growth

12. III-Nitride Nanowire Based Light Emitting Diodes on Carbon Paper

13. Plasmonically-Enhanced Emission from an Inverted GaN Light Emitting Diode

14. Reduced temperature in lateral (AlxGa1−x)2O3/Ga2O3 heterojunction field effect transistor capped with nanocrystalline diamond

16. Investigation of BPD Faulting under Extreme Carrier Injection in Room vs High Temperature Implanted 3.3kV SiC MOSFETs

18. Experimental determination of critical thickness limitations of (010)β -(AlxGa1−x)2O3 heteroepitaxial films

19. Technique for the Dry Transfer of Epitaxial Graphene onto Arbitrary Substrates

20. Reduced temperature in lateral (AlxGa1−x)2O3/Ga2O3 heterojunction field effect transistor capped with nanocrystalline diamond.

22. Experimental determination of critical thickness limitations of (010) β-(AlxGa1−x)2O3 heteroepitaxial films.

23. Preface

25. Activation of implanted Si, Ge, and Sn donors in high-resistivity halide vapor phase epitaxial β-Ga2O3:N with high mobility

36. Activation of implanted Si, Ge, and Sn donors in high-resistivity halide vapor phase epitaxial β-Ga2O3:N with high mobility.

42. Delta-doped β-(AlxGa1−x)2O3/Ga2O3 heterostructure field-effect transistors by ozone molecular beam epitaxy

45. Characterization of β-Ga2O3 homoepitaxial films and MOSFETs grown by MOCVD at high growth rates

46. High growth-rate MOCVD homoepitaxial [beta]-Ga2O3 films and MOSFETs for power electronics applications

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