131 results on '"Kim, Seong-Sue"'
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2. Multi-beam mask writer MBM-3000 for next generation EUV mask production
3. A simulation-based methodology to analyze the impact of edge-length on curvilinear mask accuracy
4. Dense mask registration fingerprint characterization to better understand and mitigate the metrology to device offset
5. Renewing i-line laser mask writers with reduced power consumption and increased productivity
6. Mask optimization approach for wafer LCDU improvement in ArF lithography
7. A study of applying mask process correction to constant width curvilinear SRAFs
8. Improving overlay performance through enhanced stage positioning accuracy
9. Efficient patterning approaches for non-Manhattan layouts by using variable shaped beam systems
10. A formulation of mask optimization into QUBO model for Ising machines
11. Efficient representation of full mask density maps in advanced mask data preparation flows
12. Development of EUV phase shift mask metrology
13. Machine learning assisted effective OPC verification hotspot capture
14. Innovative applications: extending photomask registration tool for critical dimension measurement to achieve high efficiency
15. A study on the imaging characteristics of phase shift mask for EUV technology with novel material
16. An advanced 2D feature transmitted algorithm for mask defect detection
17. PEC-aware MPC for CD quality improvement
18. Optimizing CD-SEM metrology for anamorphic high-NA EUV photomasks
19. EUV APSM mask prospects and challenges
20. Curvilinear OPC mask synthesis flow
21. Improvements on pattern fidelity at high curvature region of curvilinear mask with a novel method of MPC
22. Integration of e-beam mask writer corrections in MPC applications
23. Towards fast ptychography image reconstruction of EUV masks by deep neural networks
24. EUV mask patterning process to enable opaque SRAFs for bright field EUV mask imaging
25. Realizing EUV photomask defectivity qualification by actinic mask review system
26. EUV reticle defectivity: next steps in the EUV scanner and beyond
27. Use of advanced data modeling to introduce and extend mask tools serving mainstream application
28. New EUV mask blank for N3 technology node and beyond
29. Actinic blank inspection for high-NA EUV lithography
30. Multibeam fracture flow based on multigon format input
31. Displacement Talbot lithography process simulation analysis
32. Providing solutions for replacement of legacy tools with advanced features
33. Factors driving merchant photomask growth and shortages
34. Novel method for precise curved EUV mask CD characterization by adopting machine learning
35. Establishing a nanoimprint lithography ecosystem
36. Ion beam deposition for larger form-factor EUV mask blanks
37. EUV Research at Berkeley Lab: Enabling Technologies and Applications
38. Measurement of thermal conductivities of SiN and TbFeCo films
39. Progress in EUV lithography toward manufacturing
40. How to improve intra-field CDU of contact hole patterns in both X-Y directions with CDC technology
41. High-brightness and compact LPP EUV source for inspection system
42. Identifying new absorber materials for EUV photomasks
43. SEM image contour extraction with deep learning method
44. Research and optimization of electronic charge phenomena on CDSEM imaging of binary photomask
45. Optimized test pattern selection with machine learning method
46. Quantitative study of local MEEF of 2D mask corrected by inverse lithography technology
47. Research of mask photoresist sensitivity for local critical dimension uniformity improvement in ArF lithography
48. Rounded-corner aware OPC for convergency and lithography performance improving
49. Programmable photomask for photolithography systems
50. Leaping into the curvy world with GPU accelerated O(p) computing
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