Back to Search
Start Over
Mask optimization approach for wafer LCDU improvement in ArF lithography
- Source :
- Proceedings of SPIE; November 2023, Vol. 12751 Issue: 1 p127511H-127511H-7, 1147607p
- Publication Year :
- 2023
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 12751
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs64769144
- Full Text :
- https://doi.org/10.1117/12.2688551