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Novel method for precise curved EUV mask CD characterization by adopting machine learning

Authors :
Liang, Ted
Kim, Seong-Sue
Lee, Jaeseo
Noh, Inhwan
Sung, Youngsu
Kim, Heebom
Kang, Ji-hoon
Kim, Seunghye
Choi, Jin
Source :
Proceedings of SPIE; November 2023, Vol. 12751 Issue: 1 p127510B-127510B-6, 1147597p
Publication Year :
2023

Details

Language :
English
ISSN :
0277786X
Volume :
12751
Issue :
1
Database :
Supplemental Index
Journal :
Proceedings of SPIE
Publication Type :
Periodical
Accession number :
ejs64769101
Full Text :
https://doi.org/10.1117/12.2687781