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The development of effective buffer layer has required years of work in order to obtain relaxed SiGe substrates [1]. However, main drawback of this approach relies on the presence of embedded and numerous dislocations which can be detrimental for optimal applications. Recently, a surprising relaxation phenomenon has been observed on specific Silicon-Germanium On Insulator (SGOI) structures [4-5]. It has been observed that when the sample is heated, slippage is observed at the SGOI/Buried Oxide (BOX) interface. The phenomenon is not clearly understood. However, several explanations have been raised. It can be explained by the mechanical properties by Ge-O bonds which are weaker than the Si-O bonds at the SGOI/BOX interface causing the slip. [2] Also, the Ge atoms in the last crystalline layer at the BOX interface decreases the quantity of Si atoms inducing less bonds between the Si atoms of SGOI and the BOX. We suggest to take advantage of this phenomenon to obtain fully relaxed SGOI layers without dislocations. This new approach would allow to create high performance relaxed SGOI layers in industrial conditions with 300 mm wafers. This innovation is relevant for several applications, such as optical applications and the formation of base substrate to generate tensile Si epitaxy layer. It has to be noticed that any Ge concentration until pure GeOI structure is possible. Figure 1 shows the different process steps to obtain relaxed SGOI layer explained below. SiGe epitaxy (fig.1-a) is performed on an 300mm SOI wafer by Rapid Thermal Chemical Vapor Deposition (RT-CVD). Germane (GeH4) and Dichlorosilane (DCS) are used as precursor gases to obtain a 20nm thick fully strained Si0.8Ge0.2 layer. Upstream work is performed to improve the uniformity of the SiGe layer (thickness and composition) within the 300mm wafer. Indeed, they are key parameters impacting Ge concentration within wafer uniformity obtained after condensation.[3] Then, condensation is performed (fig.1-b) using thermal oxidation in a 300mm industrial furnace under N2/O2 atmosphere at 1000°C during several hours. Condensation is tuned to obtain the desired Ge concentration in the SGOI structure. Condensation allows to transform a SiGe/Si/BOX structure into SiGe/BOX structure called SGOI. Two mechanisms are involved in the condensation. The first mechanism is the Si-selective oxidation in the SiGe layer allowing Ge atoms to accumulate at the oxidation interface. The second mechanism is the Ge diffusion in the structure which allows SiGe inter-diffusion. The Ge atoms are maintained and homogenized in depth of the SGOI layer during the interdiffusion mechanism thanks to the BOX acting as a diffusion barrier. [2] During this work, the layer composition, the thickness as well as the stress were characterized by ellipsometry, XRR, XRD and SIMS. In addition, the surface was analyzed by AFM to detect any crystal defects. In this study, we propose to investigate the relaxation of SGOI layer with a concentration of Ge=50% because such structure shows no defects after condensation [2]. Thereafter, it will be possible to carry out GeOI in the future. Figure 2 shows SiGe thickness and density measurement by XRR. A thickness variation of 13.67 A and a density variation of 0.22g/cm3 of the SGOI layer after condensation on the whole wafer is obtained. The average density is 4,31g/cm3 with a concentration of %Ge=51% which was our target concentration. Then, the relaxation phenomenon is studied using anneals in the temperature range [700;900] °C during several hours. Indeed, we chose a temperature close to the SiO2 viscosity temperature and a long annealing time allowing to generate a slow slip thus limiting defects. Figure 3 shows a RSM map obtained by XRD of an Si0.5Ge0.5OI layer after annealing at 800°C for 2h. The mapping shows Si substrate as well as the layer relaxed along the (113) and (224) planes at an angle Φ=45°. RSM map allows to calculate the relaxation rate which is 22%. The relaxation on the sample is a success that remains to be improved by annealing time or temperatures to be optimized. This new approach would allow the realization a defect free relaxed SGOI layer under industrial conditions on a 300mm wafer. It would provide a new method for applications such as optical or the growth of tensile Si channels. [1] P.M.Mooney, Materials Science and Engineering, 1996 [2] F.Roze. PhD thesis, 2018 [3] D.Valenducq, PhD thesis, 2021 [4] V.Boureau et al., ECS, 2018 [5] Usuda, Koji, et al., Solid-State Electronics, 2013 Figure 1

In this paper, it is shown for the first time that Ge nanocrystals (Ge NCs) obtained via solid-state dewetting of amorphous GOI can be used as the active absorbers embedded in a silicon dioxide matrix of metal–insulator–semiconductor photodetectors (MIS PD). The Ge NCs have been obtained by a combination of Ge deposition by molecular beam epitaxy (MBE) on tunnel thermal silicon oxide and solid-state dewetting processes. The structural and morphology characterizations performed using high-resolution transmission electron microscopy (HRTEM) and scanning electron microscopy (SEM) show that the Ge NCs embedded in SiO2 of MIS PD are monocrystalline, homogeneous and have well-defined shape and high density suitable for optoelectronic applications. The I–V and photocurrent measurements performed on these innovative structures show that the Ge NCs contribute efficiently in the electrical transport by increasing the current density via creating an intermediate conduction step in the MIS structure and enhance the photocurrent via photogeneration of new carriers. We have observed that for the structure with Ge NCs, the photocurrent increases 10 times at reverse bias Vg = − 1 V when it is illuminated. These results indicate that the crystalline Ge NCs obtained via solid-state dewetting can be integrated with optoelectronics and photonics technologies to produce new high-performance optoelectronic devices fully compatible with complementary oxide metal (CMOS) technology.

International audience

International audience; Graphene (Gr) is known to be an excellent barrier preventing atoms and molecules to diffuse through it. This is due to the carbon atom arrangement in a two-dimensional (2D) honeycomb structure with a very small lattice parameter thus forming an electron cloud that prevents atoms and molecules crossing. Nonetheless at high an-nealing temperatures, intercalation of atoms through graphene occurs, opening the path for formation of vertical heterojunctions constituted of two-dimensional layers. In this paper, we report on the ability of silicon atoms to penetrate the graphene network, fully epitaxially grown on a Ni(111) surface, even at room temperature. Our scanning tunneling microscopy (STM) experiments show that the presence of defects like vacancies and disloca-tions in the graphene lattice favor the Si atoms intercalation, thus forming two-dimensional, flat and disordered islands below the Gr layer. Ab-initio molecular dynamics calculations confirm that Gr defects are necessary for Si intercalation at room temperature and show that: i) a hypothetical intercalated silicene layer cannot be stable for more than 8 ps and ii) the corresponding Si atoms completely lose their in-plane order resulting in a random planar distribution and form strong covalent bonds with Ni atoms.

Graphene, consisting of an inert, thermally stable material with an atomically flat, dangling-bond-free surface, is by essence an ideal template layer for van der Waals heteroepitaxy of two-dimensional materials such as silicene. However, depending on the synthesis method and growth parameters, graphene (Gr) substrates could exhibit, on a single sample, various surface structures, thicknesses, defects, and step heights. These structures noticeably affect the growth mode of epitaxial layers, e.g., turning the layer-by-layer growth into the Volmer-Weber growth promoted by defect-assisted nucleation. In this work, the growth of silicon on chemical vapor deposited epitaxial Gr (1 ML Gr/1 ML Gr buffer) on a 6H-SiC(0001) substrate is investigated by a combination of atomic force microscopy (AFM), scanning tunneling microscopy (STM), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and Raman spectroscopy measurements. It is shown that the perfect control of full-scale almost defect-free 1 ML Gr with a single surface structure and the ultraclean conditions for molecular beam epitaxy deposition of silicon represent key prerequisites for ensuring the growth of extended silicene sheets on epitaxial graphene. At low coverages, the deposition of Si produces large silicene sheets (some hundreds of nanometers large) attested by both AFM and SEM observations and the onset of a Raman peak at 560 cm-1, very close to the theoretical value of 570 cm-1 calculated for free-standing silicene. This vibrational mode at 560 cm-1 represents the highest ever experimentally measured value and is representative of quasi-free-standing silicene with almost no interaction with inert nonmetal substrates. From a coverage rate of 1 ML, the silicene sheets disappear at the expense of 3D Si dendritic islands whose density, size, and thickness increase with the deposited thickness. From this coverage, the Raman mode assigned to quasi-free-standing silicene totally vanishes, and the 2D flakes of silicene are no longer observed by AFM. The experimental results are in very good agreement with the results of kinetic Monte Carlo simulations that rationalize the initial flake growth in solid-state dewetting conditions, followed by the growth of ridges surrounding and eventually covering the 2D flakes. A full description of the growth mechanism is given. This study, which covers a wide range of growth parameters, challenges recent results stating the impossibility to grow silicene on a carbon inert surface and is very promising for large-scale silicene growth. It shows that silicene growth can be achieved using perfectly controlled and ultraclean deposition conditions and an almost defect-free Gr substrate.

International audience; Secondary-ion mass spectrometry (SIMS) is probably the most widely used chemical analysis technique in semiconductor science and in metallurgy because of its ultimate sensitivity to all elements and in particular to light elements providing semiquantitative information on the depth distribution of elements, for instance, doping elements (i.e., B, H), contaminants (i.e., C and O), chemical gradients, and segregation in thin films and at interfaces, etc. With the size shrinking of systems, high-resolution 3D chemical imaging is becoming a prerequisite for the development of new materials at the nanoscale and for the deep understanding of the correlation between their properties and functionalities. Herein, the development of an innovative analytical SIMS implemented in a focused ion beam (FIB) (using Ga source)/scanning electron microscope (SEM) is reported. The equipment enables to give elemental chemical mapping at very high resolution (

National audience; Le présent bilan de mandature 2016-2021 de la CPCN (Conférence des présidentes et présidents de sections et de commissions interdisciplinaires du Comité national de la recherche scientifique) a une triple finalité. Il constitue d’abord une forme d’autoévaluation de l’action de la CPCN et, à travers elle, de l’action coordonnée des sections et commissions interdisciplinaires (CID), au cours de cette mandature, en rappelant autant que de besoin le contexte dans lequel cette action s’est inscrite. Il vise également à rendre compte de cette action auprès de la communauté scientifique française à travers une diffusion la plus large possible. Il doit enfin permettre un passage de relais avec les sections et CID et avec la CPCN qui seront mises en place à l’automne 2021.

We report a new strategy for the ordering of 2D arrays of Ge and Au nanodots on a silicon wafer using a patterned titanium oxide layer. In a rst step, a TiO 2 layer is prepared by block-copolymer-micelles-assisted sol-gel deposition on a full Si wafer, followed by a thermal annealing. The process leads to hexagonally positioned perforations of homogeneous size and spacing. In a second step, these TiO 2 Inorganic NanoPatterns (INPs) are used as templates for the organization of Ge and Au nanodots. Germanium adatoms deposited by Molecular Beam Epitaxy on INPs, diuse and self-assemble into nanodots, located within the INPs pores. They form homogeneous sub-20 nm Ge nanodots in epitaxy on the silicon substrate and regularly distributed with one dot per perforation. The same approach is used for the formation of Au nanodots. In this case, a gentle mechanical polishing is requiered to suppress the dots seating at 1 the top of the TiO 2 network. The process developed in this study paves the way to the large scale self-organisation of quantum dots that are highly interesting for various applications, such as opto-electronics, and microelectronics.

International audience

Silicon-Germanium strain engineering has been used for more than two decades in silicon based devices and has contributed to the scaling down of a transistor’s size and to significant improvements in device performance. However, while conventional silicon-germanium based electronics has experienced rapid and steady growth, thanks to this continuous miniaturization of transistors, this trend cannot continue indefinitely. Industry has already moved to alternate methods such as FinFET devices, in which a thin silicon channel is placed vertically, and the FD-SOI (FD-SGOI) design consisting of a thin film Si(SiGe) channel placed horizontally. For nodes scaled down below 28 nm, low power operation will be inherently hindered by both the imperfect interface, non-uniformity of ultra-thin films and quantum confinement effects, which increase the effective bandgap. In these devices, despite the intense research activity on the strained SiGe ultra-thin body, which accounts for a large portion of such microelectronic devices (below the 45 nm node), we still fail to properly understand the mechanisms that limit hole and electron mobilities in SGOI layers. In addition, one of the main challenges for Si based devices remains the fabrication of efficient group-IV photon sources / photon detectors compatible with the microelectronic industry, which would usefully replace the integration of III-V heterostructures on Si. The major bottleneck is that group-IV semiconductor elements have indirect bandgaps, but with possibilities of being transformed to direct bandgaps using strain engineering strategies. In this presentation, we will review the formation mechanism of Ge-rich layers on SOI by condensation at different temperatures. TEM cross-section and GPA analysis of the heterostructures will be presented. We will also report the physical and optical properties of these heterostructures. Special attention is devoted to the influence of the SiGe thickness reduction (up to few MLs), where quantum confinement is prominent in the optical properties of the layers. Raman and PL results will be presented to better explain such confinement behavior. We show that novel SGOI substrates could represent a key strategy for the fabrication of future photonic devices.

A study on optical and structural properties of nanoporous silicon is presented in this paper. The samples were prepared by electrochemical etching a heavily boron doped silicon wafer in a hydrofluoric acid electrolyte and flowed by in-situ sintering in ultra-high vacuum chemical vapor deposition reactor (UHVCVD) under hydrogen atmosphere at high temperature varied between 900 and 1100 °C. The structural and morphological properties were carried out using atomic force microscopy (AFM), scanning electronic microscopy (SEM) and high resolution transmission electronic microscopy (HRTEM). The optical properties were performed using the photoluminescence Spectroscopy (PL), Time Resolved Photoluminescence (TRPL), RAMAN spectroscopy and Fourier-transform infrared spectroscopy (FT-IR). It is shown that the in-situ heating at 900 °C desorbs the native oxide from the porous layer and closes the pores forming a continuous defects-free surface at the top of porous layer. The process allows obtaining stable porous layer with enhanced structural and optical properties and also tailoring the morphological properties and the visible optical emission. This paper aims at a comprehensive determination of the physical properties of sintered porous silicon, in particular, its structural and optical properties.

We report the high performances of Metal-Insulator-Semiconductor Photodetectors (MIS PD) made with crystalline Ge nanocrystals (Ge NCs) as the active absorbers embedded in a silicon dioxide matrix. The Ge NCs have been obtained by a combination of Ge deposition by Molecular Beam Epitaxy (MBE) on tunnel thermal silicon oxide and solid state dewetting processes. Ge NCs structure and morphology are characterized by High Resolution Transmission Electron Microscopy (HRTEM) and Scanning Electron Microscopy (SEM). The photocurrent generation is determined by I-V spectroscopy and Photocurrent spectroscopy. We evidence the role of high quality Ge NCs on photocurrent and explain the high sensitivity of MIS photodetector as a result of transport mechanisms via photoexcited Ge NCs.These results indicate that the crystalline Ge NCs obtained via solid state dewetting can be integrated with opto-electronics and photonics technologies to produce new high performance optoelectronic devices fully compatible with Complementary Oxide Metal (CMOS) technology.

International audience; We report a novel approach for engineering tensely strained Si layers on a relaxed silicon germanium on insulator (SGOI) film using a combination of condensation, annealing, and epitaxy in conditions specifically chosen from elastic simulations. The study shows the remarkable role of the SiO2 buried oxide layer (BOX) on the elastic behavior of the system. We show that tensely strained Si can be engineered by using alternatively rigidity (at low temperature) and viscoelasticity (at high temperature) of the SiO2 substrate. In these conditions, we get a Si strained layer perfectly flat and free of defects on top of relaxed Si1–xGex. We found very specific annealing conditions to relax SGOI while keeping a homogeneous Ge concentration and an excellent thickness uniformity resulting from the viscoelasticity of SiO2 at this temperature, which would allow layer-by-layer matter redistribution. Remarkably, the Si layer epitaxially grown on relaxed SGOI remains fully strained with −0.85% tensile strain. The absence of strain sharing (between Si1–xGex and Si) is explained by the rigidity of the Si1–xGex/BOX interface at low temperature. Elastic simulations of the real system show that, because of the very specific elastic characteristics of SiO2, there are unique experimental conditions that both relax Si1–xGex and keep Si strained. Various epitaxial processes could be revisited in light of these new results. The generic and simple process implemented here meets all the requirements of the microelectronics industry and should be rapidly integrated in the fabrication lines of large multifinger 2.5 V n-type MOSFET on SOI used for RF-switch applications and for many other applications.

Despite the large literature focused on the growth of graphene (Gr) on 6H-SiC(0001) by chemical vapour deposition (CVD), some important issues have not been solved and full wafer scale epitaxy of Gr remains challenging, hampering applications in microelectronics. With this study we shed light on the generic mechanism which produces the coexistence of two different types of Gr domains, whose proportion can be carefully controlled by tuning the H2 flow rate. For the first time, we show that the growth of Gr using CVD under H2/Ar flow rate proceeds in two stages. Firstly, the nucleation of free-standing epitaxial graphene on hydrogen (H-Gr) occurs, then H-atoms eventually desorb from either step edges or defects. This gives rise, for H2 flow rate below a critical value, to the formation of (6x6)Gr domains on 6H-SiC(0001). The front of H-desorption progresses proportionally to the reduction of H2. Using a robust and generic X-ray photoelectron spectroscopy (XPS) analysis, we realistically quantify the proportions of H-Gr and (6x6)Gr domains of a Gr film synthetized in any experimental conditions. Scanning tunnelling microscopy supports the XPS measurements. From these results we can deduce that the H-assisted CVD growth of Gr developed here is a unique method to grow fully free-standing H-Gr on the contrary to the method consisting of H-intercalation below epitaxial Gr on buffer layer. These results are of crucial importance for future applications of Gr/SiC(0001) in nanoelectronics, providing the groundwork for the use of Gr as an optimal template layer for Van der Waals homo-and hetero-epitaxy.

International audience; We report experimental evidence for a spontaneous shape transition, from regular islands to elongated nanowires, upon high-temperature annealing of a thin Mn wetting layer evaporated on Ge(111). We demonstrate that 4.5 monolayers is the critical thickness of the Mn layer, governing the shape transition to wires. A small change around this value modulates the geometry of the nanostructures. The Mn–Ge alloy nanowires are single-crystalline structures with homogeneous composition and uniform width along their length. The shape evolution towards nanowires occurs for islands with a mean size of ≃170 nm. The wires, up to ≃1.1 μm long, asymptotically tend to ≃80 nm of width. We found that tuning the annealing process allows one to extend the wire length up to ≃1.5 μm with a minor rise of the lateral size to ≃100 nm. The elongation process of the nanostructures is in agreement with a strain-driven shape transition mechanism proposed in the literature for other heteroepitaxial systems. Our study gives experimental evidence for the spontaneous formation of spatially uniform and compositionally homogeneous Mn-rich GeMn nanowires on Ge(111). The reliable and simple synthesis approach allows one to exploit the room-temperature ferromagnetic properties of the Mn–Ge alloy to design and fabricate novel nanodevices.

We report experimental evidence for a spontaneous shape transition, from regular islands to elongated nanowires, upon high-temperature annealing of a thin Mn wetting layer evaporated on Ge(111). We demonstrate that 4.5 monolayers is the critical thickness of the Mn layer, governing the shape transition to wires. A small change around this value modulates the geometry of the nanostructures. The Mn–Ge alloy nanowires are single-crystalline structures with homogeneous composition and uniform width along their length. The shape evolution towards nanowires occurs for islands with a mean size of ≃170 nm. The wires, up to ≃1.1 μm long, asymptotically tend to ≃80 nm of width. We found that tuning the annealing process allows one to extend the wire length up to ≃1.5 μm with a minor rise of the lateral size to ≃100 nm. The elongation process of the nanostructures is in agreement with a strain-driven shape transition mechanism proposed in the literature for other heteroepitaxial systems. Our study gives experimental evidence for the spontaneous formation of spatially uniform and compositionally homogeneous Mn-rich GeMn nanowires on Ge(111). The reliable and simple synthesis approach allows one to exploit the room-temperature ferromagnetic properties of the Mn–Ge alloy to design and fabricate novel nanodevices.

A comprehensive picture of the initial stages of silicene growth on graphite is drawn. Evidence is shown that quasiparticle interferences play a crucial role in the formation of the observed silicene configurations. We propose, on one hand, that the charge modulations caused by those quantum interferences serve as templates and guide the incoming Si atoms to self-assemble to the unique $$\left( {\sqrt 3 \times \sqrt 3 } \right)$$ R30° honeycomb atomic arrangement. On the other hand, their limited extension limits the growth to about 150 Si atoms under our present deposition conditions. The here proposed electrostatic interaction finally explains the unexpected stability of the observed silicene islands over time and with temperature. Despite the robust guiding nature of those quantum interferences during the early growth phase, we demonstrate that the window of experimental conditions for silicene growth is quite narrow, making it an extremely challenging experimental task. Finally, it is shown that the experimentally observed three-dimensional silicon clusters might very well be the simple result of the end of the silicene growth resulting from the limited extent of the quasi-particle interferences.

Large-scale, defect-free, micro- and nano-circuits with controlled inter-connections represent the nexus between electronic and photonic components. However, their fabrication over large scales often requires demanding procedures that are hardly scalable. Here we synthesize arrays of parallel ultra-long (up to 0.75 mm), monocrystalline, silicon-based nano-wires and complex, connected circuits exploiting low-resolution etching and annealing of thin silicon films on insulator. Phase field simulations reveal that crystal faceting and stabilization of the wires against breaking is due to surface energy anisotropy. Wires splitting, inter-connections and direction are independently managed by engineering the dewetting fronts and exploiting the spontaneous formation of kinks. Finally, we fabricate field-effect transistors with state-ofthe- art trans-conductance and electron mobility. Beyond the first experimental evidence of controlled dewetting of patches featuring a record aspect ratio of 1/60000 and selfassembled mm long nano-wires, our method constitutes a distinct and promising approach for the deterministic implementation of atomically-smooth, mono-crystalline electronic and photonic circuits.

All-dielectric photonics is a rapidly developing field of optics and material science. The main interest at visible and near-infrared frequencies is light management using high-refractive-index Mie-resonant dielectric particles. Most work in this area of research focuses on exploiting Si-based particles. Here, we study monocrystalline Mie-resonant particles made of Ge-rich SiGe alloys with refractive index higher than that of Si. These islands are formed via solid state dewetting of SiGe flat layers by using two different processes: (i) dewetting of monocrystalline SiGe layers (60%-80% Ge content) obtained via Ge condensation of SiGe on silicon on insulator; and (ii) dewetting of a SiGe layer deposited via molecular beam epitaxy on silicon on insulator and ex situ Ge condensation, forming a Ge-rich shell surrounding a SiGe-core. Using high-spatial-resolution Raman microscopy we monitor Ge content x and strain ϵ of flat layers and SiGe-islands. We observe strain relaxation associated with formation of trading dislocations in the SiGe islands compared to the starting SiGe layers, as confirmed by TEM images. For initial high Ge concentration in the flat layers, the corresponding Ge content in the dewetted islands is lower, owing to diffusion of Si atoms from Si or SiO

Large-scale, defect-free, micro- and nano-circuits with controlled inter-connections represent the nexus between electronic and photonic components. However, their fabrication over large scales often requires demanding procedures that are hardly scalable. Here we synthesize arrays of parallel ultra-long (up to 0.75 mm), monocrystalline, silicon-based nano-wires and complex, connected circuits exploiting low-resolution etching and annealing of thin silicon films on insulator. Phase field simulations reveal that crystal faceting and stabilization of the wires against breaking is due to surface energy anisotropy. Wires splitting, inter-connections and direction are independently managed by engineering the dewetting fronts and exploiting the spontaneous formation of kinks. Finally, we fabricate field-effect transistors with state-of-the-art trans-conductance and electron mobility. Beyond the first experimental evidence of controlled dewetting of patches featuring a record aspect ratio of \documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\sim$$\end{document}~1/60000 and self-assembled \documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\sim$$\end{document}~mm long nano-wires, our method constitutes a distinct and promising approach for the deterministic implementation of atomically-smooth, mono-crystalline electronic and photonic circuits., Fabricating defect-free micro- and nano-circuits over large scales with controlled interconnections remains a challenge. Here, Bollani et al. show a dewetting strategy for engineering arrays of parallel Si-based nanowires up to 0.75 mm and complex interconnected circuits of monocrystalline Si on a chip.

In the present work, we report on the charge trapping properties of Germanium Nanocrystals (Ge NCs) self assembled on SiO2 thin layer for promising applications in next-generation non volatile memory by the means of Deep Level Transient Spectroscopy (DLTS) and high frequency C-V method. The Ge NCs were grown via dewetting phenomenon at solid state by Ultra-High Vacuum (UHV) annealing and passivated with silicon before SiO2 capping. The role of the surface passivation is to reduce the electrical defect density at the Ge NCs-SiO2 interface. The presence of the Ge NCs in the oxide of the MOS capacitors strongly affects the C-V characteristics and increases the accumulation capacitance, causes a negative flat band voltage (VFB) shift. The DLTS has been used to study the individual Ge NCs as a single point deep level defect in the oxide. DLTS reveals two main features: the first electron traps around 255 K could correspond to dangling bonds at the Si/SiO2 interface and the second, at high-temperature (>300 K) response, could be originated from minority carrier generation in Ge NCs.

We address the solid state dewetting of ultra-thin and ultra-large patches of monocrystalline silicon on insulator. We show that the underlying instability of the thin Si film under annealing can be perfectly controlled to form monocrystalline, complex nanoarchitectures extending over several microns. These complex patterns are obtained guiding the dewetting fronts by etching ad-hoc patches prior to annealing. They can be reproduced over hundreds of repetitions extending over hundreds of microns. We discuss the effect of annealing temperature and patch size on the stability of the final result of dewetting showing that for simple patches (e.g. simple squares) the final outcome is stable and well reproducible at 720 degrees C and for similar to 1 mu m square size. Finally, we demonstrate that introducing additional features within squared patches (e.g. a hole within a square) stabilises the dewetting dynamic providing perfectly reproducible complex nanoarchitectures of 5 pm size. (C) 2018 Elsevier B.V. All rights reserved.

International audience; We present the photoluminescence (PL) emission of Silicon and Germanium nanocrystals (NCs) of different sizes embedded in two different matrices. Formation of the NCs is achieved via solid-state dewetting during annealing in a molecular beam epitaxy ultra-high vacuum system of ultrathin amorphous Si and Ge layers deposited at room temperature on SiO2. During the dewetting process, the bi-dimensional amorphous layers transform into small pseudo-spherical islands whose mean size can be tuned directly with the deposited thickness. The nanocrystals are capped either ex situ by silicon dioxide or in situ by amorphous Silicon. The surface-state dependent emission (typically in the range 1.74 eV-1.79 eV) exhibited higher relative PL quantum yields compared to the emission originating from the band gap transition. This red-PL emission comes from the radiative transitions between a Si band and an interface level. It is mainly ascribed to the NCs and environment features deduced from morphological and structural analyses. Power dependent analysis of the photoluminescence intensity under continuous excitation reveals a conventional power law with an exponent close to 1, in agreement with the type II nature of the emission. We show that Ge-NCs exhibit much lower quantum efficiency than Si-NCs due to non-radiative interface states. Low quantum efficiency is also obtained when NCs have been exposed to air before capping, even if the exposure time is very short. Our results indicate that a reduction of the non-radiative surface states is a key strategy step in producing small NCs with increased PL emission for a variety of applications. The red-PL band is then an effective tool for the quality assessment of NCs based structures. (C) 2017 Elsevier B.V. All rights reserved.

Capillary-driven mass transport in solids is typically understood in terms of surface-diffusion limited kinetics, leading to conventional solid-state dewetting of thin films. However, another mass transport mechanism, so-called surface-attachment and detachment limited kinetics, is possible. It can shrink a solid film, preserving its original topology without breaking it in isolated islands, and leads to faster dynamics for smaller film curvature in contrast with the opposite behavior observed for surface-diffusion limited kinetics. In this work, we present a rimless dewetting regime for Si, which is ascribed to effective attachment-limited kinetics mediated by the coexistence of crystalline and amorphous Si phases. Phase-field numerical simulations quantitatively reproduce the experimental observations, assessing the main mass transport mechanism at play. The process can be exploited to obtain in a deterministic fashion monocrystalline islands (with 95% probability) pinned at ≈500 nm from a hole milled within closed patches.

Capillary-driven mass transport in solids is typically understood in terms of surface-diffusion limited kinetics, leading to conventional solid-state dewetting of thin films. However, another mass transport mechanism, so-called surface-attachment/detachment limited kinetics, is possible. It can shrink a solid film, preserving its original topology without breaking it in isolated islands, and leads to faster dynamics for smaller film curvature in contrast with the opposite behavior observed for surface-diffusion limited kinetics. In this work, we present a rimless dewetting regime for Si, which is ascribed to effective attachment-limited kinetics mediated by the coexistence of crystalline and amorphous Si phases. Phase-field numerical simulations quantitatively reproduce the experimental observations, assessing the main mass transport mechanism at play. The process can be exploited to obtain in a deterministic fashion monocrystalline islands (with $95%$ probability) pinned at $\ensuremath{\approx}500$ nm from a hole milled within closed patches.

International audience; We present a novel self-assembly route to align SiGe quantum dots. By a combination of theoretical analyses and experimental investigation, we show that epitaxial SiGe quantum dots can cluster in ordered closely packed assemblies, revealing an attractive phenomenon. We compute nucleation energy barriers, accounting for elastic effects between quantum dots through both elastic energy and strain-dependent surface energy. If the former is mostly repulsive, we show that the decrease in the surface energy close to an existing island reduces the nucleation barrier. It subsequently increases the probability of nucleation close to an existing island, and turns out to be equivalent to an effective attraction between dots. We show by Monte-Carlo simulations that this effect describes well the experimental results, revealing a new mechanism ruling self-organisation of quantum dots. Such a generic process could be observed in various heterogeneous systems and could pave the way for a wide range of applications.

The dual action of oxide-related defects in the visible and infrared emission of germanium (Ge) self-assembled quantum dots (QDs) is discussed. The Ge particles were fabricated by solid-state dewetting on a thin layer of $${\hbox {SiO}}_{2}$$ . Subsequent surface passivation by amorphous silicon was carried out for several samples. All samples were encapsulated by $${\hbox {SiO}}_{2}$$ . Atomic force microscopy analysis indicates a linear relationship between the size of QDs and the initial thickness of the amorphous Ge films. The crystallization of the QDs was evidenced by transmission electron microscopy and Raman spectroscopy. Photoluminescence measurements show that the main visible emission is blue-green centred around 520 nm. The luminescence attributed to the radiative recombination of quantum-confined excitons is only observed when the surface is in-situ passivated prior to the deposition of the oxide matrix. The results of this work are helpful for optimizing the performance of the optoelectronic devices based on the infrared emission of Ge nanocrystals.

Highly oriented pyrolitic graphite (HOPG) is an inert substrate with a structural honeycomb lattice, well suited for the growth of two-dimensional (2D) silicene layer. It was reported that when Si atoms are deposited on HOPG surface at room temperature, they arrange in two configurations: silicene nanosheets and three dimensional clusters. In this work we demonstrate, by using scanning tunneling microscopy (STM) and Raman spectroscopy, that a third configuration stabilizes in the form of Si 2D nanosheets intercalated below the first top layer of carbon atoms. The Raman spectra reveal a structure located at 538 cm$^{-1}$ which we ascribe to the presence of sp$^2$ Si hybridization. Moreover, the silicon deposition induces several modifications in the graphite D and G Raman modes, which we interpret as an experimental evidence of the intercalation of the silicene nanosheets. The Si atom intercalation at room temperature takes place at the HOPG step edges and it detaches only the outermost graphene layer inducing a strong tensile strain mainly concentrated on the edges of the silicene nanosheets. Theoretical calculations of the structure and energetic viability of the silicene nanosheets, of the strain distribution on the outermost graphene layer and its influence on the Raman resonances support the STM and Raman observations., 18 pages, 9 figures, 2 tables

International audience; Strained epitaxial SiGe on vicinal Si(001) substrates develops a morphological instability perpendicular to the steps unlike the usual growth instabilities on vicinal substrates, eventually leading to planar nanowires. We assess both theoretically and experimentally the effect of strain anisotropy on the 1D elongation of the Asaro-Tiller-Grinfel'd (ATG) instability. The anisotropy of strain relaxation due to the presence of step edges is considered in a continuum model with two different effective strains in the surface plane. We show that the measured in-plane strain anisotropy and the theoretical model are consistent with the experimental morphologies. Nice network of ultrasmall aligned elongations are predicted resulting from a complex interplay of kinetic and energetic phenomena associated with strain anisotropy.

International audience; This work investigates the influence of the ion source (Au+ and Si+2 ions) of liquid metal alloy source-focused ion beam (LMAIS/FIB) on the nanopattering. Two sets of SiO2/Si nanopatterns with a width of 450 nm on Silicon on insulator (SOI) substrate are fabricated by 30 keV Au+ and Si+2 ions, respectively. To study this effect, the sputtering yield is calculated using the volume loss method from atomic force microscopy (AFM) profiles obtained for each set. The results of the sputtering yield were compared with theoretical results calculated from Yamamura model for normal incidence for validation. The comparison showed a good agreement between the two results with a relative difference of about 5.3% obtained using Si+2 ions.

This study set out to modulate and simulate a new quantum dot solar cell GaAs 1-x Bi x /GaAs. In this work, we have treated several phenomena such as: short-circuit current (J sc ), open-circuit voltage (V oc ), the Forme-Factor (FF), conversion Efficiency ($\eta $) and Quantum Efficiency (EQE) of GaAs 1-x Bi x /GaAs QDSC, for optimization. It has been found that 30 layers of GaAs 0.95 Bi 0.05 /GaAs QD, provides a relative improvements of 6.86 % and 12.05% of J sc and $\eta $ respectively. The absorption range edge of the pin GaAs solar cell extended from 1060 nm to 1200 nm.

International audience; We report on supersaturation state effect in diffusion-induced vapor-liquid-solid growth of Ge nanowires at high temperature. Our experimental investigation establishes that at T >= 550 degrees C the growth is hindered while the growth limitation is not resulted from a high value of the desorption rate. We demonstrate that the suppressed growth is a result of the droplets large chemical potential that inhibit the supersaturation state. This results either in a strong growth limitation due to a significant droplets enlargement or to a growth cessation. (C) 2015 Elsevier B.V. All rights reserved.

In this paper, we present simulations and the optimization of electrical and optical properties of GaAs Quantum Dots (QD) in a GaAs1-xPx matrix. Our results showed that 25 GaAs/GaAs1-xPx QD layers provide a relative enhancement of 41.34% and 75.40% of the short-circuit current and efficiency, respectively. With the same number of the QD layers, the External Quantum Efficiency (EQE) measurement shows that the absorption range edge of low energy photons has been extended from 875 to 1200 ​nm (ΔEQE ​= ​25%). The temperature effect has been studied for a different number of QD inserted. The optimal conversion efficiency of 25 QD layers is degraded from 23.50% to 18.70% by increasing the temperature from 273 ​K to 350 ​K. Moreover, the electrical features obtained and EQE measurements for GaAs/GaAs1-xPx QDSC have been compared with those obtained for In0.47Ga0.53As/GaAs0.86P0.14 QDSC, In0.167Ga0.53As/GaAs and GaAs reference cell, in order to show the better structure.

Silicon-Germanium strain engineering has been used for more than two decades in silicon based devices and has contributed to the scaling down of a transistor’s size and to significant improvements in device performance. However, while conventional silicon-germanium based electronics has experienced rapid and steady growth, thanks to this continuous miniaturization of transistors, this trend cannot continue indefinitely. Industry has already moved to alternate methods such as FinFET devices, in which a thin silicon channel is placed vertically, and the FD-SOI (FD-SGOI) design consisting of a thin film Si(SiGe) channel placed horizontally. For nodes scaled down below 28 nm, low power operation will be inherently hindered by both the imperfect interface, non-uniformity of ultra-thin films and quantum confinement effects, which increase the effective bandgap. In these devices, despite the intense research activity on the strained SiGe ultra-thin body, which accounts for a large portion of such microelectronic devices (below the 45 nm node), we still fail to properly understand the mechanisms that limit hole and electron mobilities in SGOI layers. In addition, one of the main challenges for Si based devices remains the fabrication of efficient group-IV photon sources / photon detectors compatible with the microelectronic industry, which would usefully replace the integration of III-V heterostructures on Si. The major bottleneck is that group-IV semiconductor elements have indirect bandgaps, but with possibilities of being transformed to direct bandgaps using strain engineering strategies. In this presentation, we will review the formation mechanism of Ge-rich layers on SOI by condensation at different temperatures. TEM cross-section and GPA analysis of the heterostructures will be presented. We will also report the physical and optical properties of these heterostructures. Special attention is devoted to the influence of the SiGe thickness reduction (up to few MLs), where quantum confinement is prominent in the optical properties of the layers. Raman and PL results will be presented to better explain such confinement behavior. We show that novel SGOI substrates could represent a key strategy for the fabrication of future photonic devices.

All-dielectric photonics is a promptly developing field of optics and material science. The main interest at visible and near-infrared frequencies is light management using high-refractive-index Mie-resonant dielectric particles. Most work in this area of research was done exploiting Si-based particles. Here, we study monocrys- talline Mie-resonant particles made of Ge-rich SiGe alloys with refractive index higher than that of Si. These islands are formed via solid state dewetting of SiGe flat layers by using two different processes: i) dewetting of monocrystalline SiGe layers (60-80% Ge content) obtained via Ge condensation of SiGe on silicon on insulator, ii) dewetting of a SiGe layer deposited via molecular beam epitaxy on silicon on insulator and ex-situ Ge con- densation, forming a Ge-rich shell surrounding a SiGe-core. Using high-spatial-resolution Raman microscopy we monitor Ge content x and strain of flat layers and SiGe-islands. We observe strain relaxation associated with formation of trading dislocations in the SiGe islands compared to the starting SiGe layers, as confirmed by TEM images. For initial high Ge concentration in the flat layers, the corresponding Ge content in the dewetted islands is lower, owing to diffusion of Si atoms from Si or SiO 2 into SiGe islands. The Ge content also varies from particle to particle on the same sample. Size and shape of the dewetted particles depend on the fabrication process: thicker initial SiGe layers lead to larger particles. Samples with narrow island size distribution display rather sharp Mie resonances in the 1000-2500 nm spectral range. Larger islands display Mie resonances at longer wavelength. Positions of the resonances are in agreement with the theoretical calculations in the discrete dipole approximation.

International audience; In this work we report a modeling and optimization of a novel core (p-GaN)-multishell (i-InxGa1-xN/i-GaN/n-Al0.1Ga0.9N/n-GaN) coaxial NWs with a total length of about 3 μm and a radius of 0.19 μm. The variation of Indium composition in the i-InxGa1-xN active layer shows that x = 15% is the optimal composition that gives a good short circuit current and efficiency of about 2.24 mA/cm2 and 2.93%, respectively. Beyond x = 35% the structure starts to present deteriorations. Moreover, the optimal x composition founded provides a gain of about 12.9% of EQE in the mid-infrared part. The study of the variation of the total current density along the nanowire demonstrates that the maximum of this latter is located in AlGaN cladding shell layer and at the interfaces between the i-region and AlGaN cladding shell layer. In other hand, our results show that our structure presents an optimal efficiency of about 3.5% at a temperature of 275 K with the same AM1.5G solar spectrum.

International audience; Composition and microstructure of Ge grown on porous silicon (PSi) by Molecular Beam Epitaxy (MBE) at different temperatures are examined using High Resolution Transmission Electron Microscopy (HRTEM) and Raman spectroscopy. Ge grown at 400 °C on PSi buffer produces a planar Ge film with high crystalline quality compared to Ge grown on bulk Si. This result is attributed to the compliant nature of PSi. Increasing growth temperature \textgreater600 °C, changes the PSi morphology, increase the Ge/Si intermixing in the pores during Ge growth and lead to obtain a composite SiGe/Si substrate. Ge content in the composite SiGe substrate can controlled via growth temperature. These substrates serve as low cost virtual substrate for high efficiency III–V/Si solar cells.

International audience; Selective oxidation of the silicon element of silicon germanium (SiGe) alloys during thermal oxidation is a very important and technologically relevant mechanism used to fabricate a variety of microelectronic devices. We develop here a simple integrative approach involving vapor−liquid−solid (VLS) growth followed by selective oxidation steps to the construction of core−shell nanowires and higher-level ordered systems with scalable configurations. We examine the selective oxidation/ 16 condensation process under nonequilibrium conditions that gives rise to spontaneous formation of core−shell structures by germanium condensation. We contrast this strategy that uses reaction-diffusion-segregation mechanisms to produce coherently strained structures with highly configurable geometry and abrupt interfaces with growth-based processes which lead to low strained systems with nonuniform composition, three-dimensional morphology, and broad core−shell interface. We specially focus on SiGe core−shell nanowires and demonstrate that they can have up to 70% Ge-rich shell and 2% homogeneous strain with core diameter as small as 14 nm. Key elements of the building process associated with this approach are identified with regard to existing theoretical models. Moreover, starting from results of ab initio calculations, we discuss the electronic structure 23 of these novel nanostructures as well as their wide potential for advanced device applications.

Si-based nanoarchitectures are formed with unprecedented precision and reproducibility via templated dewetting of thin SOI., Dewetting is a ubiquitous phenomenon in nature; many different thin films of organic and inorganic substances (such as liquids, polymers, metals, and semiconductors) share this shape instability driven by surface tension and mass transport. Via templated solid-state dewetting, we frame complex nanoarchitectures of monocrystalline silicon on insulator with unprecedented precision and reproducibility over large scales. Phase-field simulations reveal the dominant role of surface diffusion as a driving force for dewetting and provide a predictive tool to further engineer this hybrid top-down/bottom-up self-assembly method. Our results demonstrate that patches of thin monocrystalline films of metals and semiconductors share the same dewetting dynamics. We also prove the potential of our method by fabricating nanotransfer molding of metal oxide xerogels on silicon and glass substrates. This method allows the novel possibility of transferring these Si-based patterns on different materials, which do not usually undergo dewetting, offering great potential also for microfluidic or sensing applications.

We report on the optical properties of SiGe nanowires (NWs) grown by molecular beam epitaxy (MBE) in ordered arrays on SiO2/Si(111) substrates. The production method employs Au catalysts with self-limited sizes deposited in SiO2-free sites opened-up in the substrate by focused ion beam patterning for the preferential nucleation and growth of these well-organized NWs. The NWs thus produced have a diameter of 200 nm, a length of 200 nm, and a Ge concentration x = 0.15. Their photoluminescence (PL) spectra were measured at low temperatures (from 6 to 25 K) with excitation at 405 and 458 nm. There are four major features in the energy range of interest (980–1120 meV) at energies of 1040.7, 1082.8, 1092.5, and 1098.5 meV, which are assigned to the NW-transverse optic (TO) Si–Si mode, NW-transverse acoustic (TA), Si–substrate–TO and NW-no-phonon (NP) lines, respectively. From these results the NW TA and TO phonon energies are found to be 15.7 and 57.8 meV, respectively, which agree very well with the values expected for bulk Si1−xGex with x = 0.15, while the measured NW NP energy of 1099 meV would indicate a bulk-like Ge concentration of x = 0.14. Both of these concentrations values, as determined from PL, are in agreement with the target value. The NWs are too large in diameter for a quantum confinement induced energy shift in the band gap. Nevertheless, NW PL is readily observed, indicating that efficient carrier recombination is occurring within the NWs.

International audience; In this study, we demonstrate a completely novel synthesis route for producing magnetic porous silicon. The magnetic properties of this material are induced by manganese atoms. The Mn-doping in Si is achieved by ion implantation. A subsequent anodization of the substrate is done to turn it into porous silicon. Several characterization techniques, such as transmission electronic microscopy, atomic force microscopy and photoluminescence are combined to probe the structural and the optical properties of this material. Furthermore, temperature and magnetic field dependent magnetization is analyzed using superconducting quantum interference device. In addition to the well-reported structural and optical properties of the porous silicon, our Mn-doped porous silicon samples exhibit a magnetic behavior with a curie temperature (T-C) higher than room temperature. These results indicate that the magnetic porous silicon can be integrated with microelectronics and photonics technologies to produce new devices, such as magnetophotonic crystals and polarized emitting diodes.