1. Nanoscaled Profiling of Silicon Surface via Local Anodic Oxidation
- Author
-
I. N. Kots, Oleg A. Ageev, V. V. Polyakova, and Vladimir A. Smirnov
- Subjects
010302 applied physics ,chemistry.chemical_classification ,Materials science ,Base (chemistry) ,Silicon ,Anodic oxidation ,Substrate surface ,Analytical chemistry ,Oxide ,chemistry.chemical_element ,02 engineering and technology ,Substrate (electronics) ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Electronic, Optical and Magnetic Materials ,chemistry.chemical_compound ,chemistry ,Nanoelectronics ,0103 physical sciences ,Materials Chemistry ,Voltage pulse ,Electrical and Electronic Engineering ,0210 nano-technology - Abstract
The nanoscaled profiling of a silicon 5 (111) n-type substrate surface is studied by the local anodic oxidation (LAO). Varying the voltage pulse amplitude from 5 to 12.5 V and the humidity from 30 ± 1 to 70 ± 1% during the LAO is a promising way to form oxide structures with heights from 0.5 ± 0.3 to 2.1 ± 0.1 nm and profiled structures with depths from 0.4 ± 0.3 to 1.5 ± 0.2 nm on the substrate. The results can be applied to the development of technological processes of the element base of silicon-based nanoelectronics using the probe nanotechnologies.
- Published
- 2019