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Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias
- Publication Year :
- 2019
- Publisher :
- Linköpings universitet, Plasma och beläggningsfysik, 2019.
-
Abstract
- The effect of applying a positive voltage pulse (Urev = 10 - 150 V) directly after the negative high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investigated for the reactive sputter deposition of TiN thin films. Energy-resolved mass spectroscopy analyses are performed to gain insight in the effect on the ion energy distribution function of the various ions. It is demonstrated that the energy of a large fraction of the ions can be tuned by a reverse target potential and gain energy corresponding to the applied Urev. Microscopy observations and x-ray reflectometry reveal densification of the films which results in an increase in the film hardness from 23.9 to 34 GPa as well as an increase in compressive film stress from 2.1 GPa to 4.7 GPa when comparing conventional HiPIMS with bipolar HiPIMS (Urev = 150 V).
- Subjects :
- Materials science
chemistry.chemical_element
FOS: Physical sciences
02 engineering and technology
Substrate (electronics)
Applied Physics (physics.app-ph)
Titanium nitride
01 natural sciences
Ion energy distribution function tuning
0103 physical sciences
Materials Chemistry
Fysik
Voltage pulse
Thin film
010302 applied physics
Condensed Matter - Materials Science
Pulse (signal processing)
business.industry
Metals and Alloys
Materials Science (cond-mat.mtrl-sci)
High power impulse magnetron sputtering
Surfaces and Interfaces
Physics - Applied Physics
021001 nanoscience & nanotechnology
Ion bombardment
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Bipolar HiPIMS
chemistry
Physical Sciences
Optoelectronics
High-power impulse magnetron sputtering
0210 nano-technology
Tin
business
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Accession number :
- edsair.doi.dedup.....bf3b5f698eb2c4aaf7d27ea478f89a0a