1. Mechanism of bias-dependent contrast in scanning-capacitance-microscopy images
- Author
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Bernhard Basnar, S. Golka, B. Löffler, M. Schatzmayr, Erich Gornik, Jürgen Smoliner, and Hubert Enichlmair
- Subjects
Work (thermodynamics) ,Yield (engineering) ,Materials science ,Physics and Astronomy (miscellaneous) ,Silicon ,Condensed matter physics ,Doping ,chemistry.chemical_element ,Nanotechnology ,Computer Science::Human-Computer Interaction ,Scanning capacitance microscopy ,Epitaxy ,Signal ,Computer Science::Other ,Condensed Matter::Materials Science ,chemistry ,Condensed Matter::Superconductivity ,Condensed Matter::Strongly Correlated Electrons ,Extrinsic semiconductor - Abstract
In this work, the physical processes leading to contrast in scanning capacitance microscopy (SCM) are investigated both experimentally and theoretically. Using a p-type epitaxial doping staircase on silicon, we show that a monotonic dependence of the SCM signal on the doping level is only obtained, if the tip bias is adjusted in a way that the sample is either in accumulation or depletion. In the transition region, the SCM signal is nonmonotonic as a function of doping and depends on the bias. Therefore, any doping concentration can yield a maximum SCM signal size. We also show that this behavior is in agreement with the conventional model of a metal-oxide-semiconductor junction.
- Published
- 2001