67 results on '"Tokashiki K"'
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2. Successful management of critical limb ischemia with intravenous sodium thiosulfate in a chronic hemodialysis patient
3. Advanced Gate Etching for Accurate CD Control for 130-nm Node ASIC Manufacturing
4. Accurate gate CD control for 130 nm CMOS technology node.
5. A stacked capacitor technology with ECR plasma MOCVD (Ba,Sr)TiO/sub 3/ and RuO/sub 2//Ru/TiN/TiSi/sub x/ storage nodes for Gb-scale DRAMs
6. A 500-MHz 4-Mb CMOS pipeline-burst cache SRAM with point-to-point noise reduction coding I/O
7. Optical emission diagnostics for contact etching in Applied Materials Centura HDP 5300 etcher
8. Process integration technology for low process complexity BiCMOS using trench collector sink.
9. An ECR MOCVD (Ba,Sr)TiO/sub 3/ based stacked capacitor technology with RuO/sub 2//Ru/TiN/TiSi/sub x/ storage nodes for Gbit-scale DRAMs.
10. A voltage-regulated static keeper technique for high-performance ASICs.
11. Characterization of sputter-deposited (Ba,Sr)TiO/sub 3/ thin films on the sidewalls of fine-patterned electrodes.
12. A Gbit-scale DRAM stacked capacitor technology with ECR MOCVD SrTiO/sub 3/ and RIE patterned RuO/sub 2/TiN storage nodes.
13. Correlation Between Electron Temperature Uniformity And Charging Damage In High Density Plasma Etching Tool.
14. Effect of electron temperature and electron density on topography dependent charging (TDC) damage in inductively coupled plasma etching tool.
15. Dry etching of bottom anti-reflective-coat and its application to gate length control.
16. A 2.9 /spl mu/m/sup 2/ embedded SRAM cell with co-salicide direct-strap technology for 0.18 /spl mu/m high performance CMOS logic.
17. Reliability of thin gate oxide under plasma charging caused by antenna topography-dependent electron shading effect.
18. Two-dimensional borderless contact pad technology for a 0.135 /spl mu/m/sup 2/ 4-gigabit DRAM cell.
19. A 1.9-/spl mu/m/sup 2/ loadless CMOS four-transistor SRAM cell in a 0.18-/spl mu/m logic technology.
20. The Influence of HBr Discharge Ambience on Poly-Si/SiO2 Etching Selectivity
21. Influence of process chamber ambient on SiOC (k=2.9) ILD Cu damascene ashing.
22. An ECR MOCVD (Ba,Sr)TiO3 based stacked capacitor technology with RuO2/Ru/TiN/TiSix storage nodes for Gbit-scale DRAMs
23. Dry etching of bottom anti-reflective-coat and its application to gate length control
24. A 2.9 μm/sup 2/ embedded SRAM cell with co-salicide direct-strap technology for 0.18 μm high performance CMOS logic
25. Two-dimensional borderless contact pad technology for a 0.135 μm/sup 2/ 4-gigabit DRAM cell
26. A 1.9-μm/sup 2/ loadless CMOS four-transistor SRAM cell in a 0.18-μm logic technology
27. A voltage-regulated static keeper technique for high-performance ASICs
28. A 500 MHz 4 Mb CMOS pipeline-burst cache SRAM with point-to-point noise reduction coding I/O
29. Effect of electron temperature and electron density on topography dependent charging (TDC) damage in inductively coupled plasma etching tool
30. Reliability of thin gate oxide under plasma charging caused by antenna topography-dependent electron shading effect
31. An ECR MOCVD (Ba,Sr)TiO/sub 3/ based stacked capacitor technology with RuO/sub 2//Ru/TiN/TiSi/sub x/ storage nodes for Gbit-scale DRAMs
32. A 500 MHz 4 Mb CMOS pipeline-burst cache SRAM with point-to-point noise reduction coding I/O.
33. The Influence of HBr Discharge Ambience on Poly-Si/SiO2 Etching Selectivity.
34. Usefulness of Upfront Neck Dissection Before Chemoradiation Therapy for Head and Neck Squamous Cell Carcinoma.
35. Role of Hematological Markers in Recurrent/Metastatic Head and Neck Squamous Cell Carcinoma Treated With Pembrolizumab.
36. Effect of Nivolumab on the Quality of Life in Recurrent/Metastatic Head and Neck Cancer.
37. Lemierre's Syndrome after Head and Neck Photoimmunotherapy for Local Recurrence of Nasopharyngeal Carcinoma.
38. Extent of thyroidectomy and paratracheal lymph node dissection in total pharyngolaryngectomy for pyriform sinus cancer, and recurrence, survival, and postoperative hypoparathyroidism: A multicenter retrospective study.
39. A Case of Successful Treatment with an Immune Checkpoint Inhibitor after Head and Neck Photoimmunotherapy.
40. Two Cases of Emergency Tracheostomy After Head and Neck Photoimmunotherapy.
41. Postoperative Pharyngeal Fistula Diagnosed by Prone Position Computed Tomography With Oral Contrast Agent: A Case Report.
42. A Case of Oropharyngeal Carcinoma with an Oblique Neck that Benefited from Transoral Robotic Surgery.
43. Efficacy of Nivolumab and Pembrolizumab in Platinum-sensitive Recurrent or Metastatic Head and Neck Squamous Cell Carcinoma.
44. Effects of Pembrolizumab in Recurrent/Metastatic Squamous Cell Head and Neck Carcinoma: A Multicenter Retrospective Study.
45. Nivolumab for Platinum-refractory and -sensitive Recurrent and Metastatic Head and Neck Squamous Cell Carcinoma.
46. Real-world treatment patterns and outcomes in Japanese patients with cervical esophageal cancer.
47. Quality-of-Life Evaluation of Patients with Unresectable Locally Advanced or Locally Recurrent Head and Neck Carcinoma Treated with Head and Neck Photoimmunotherapy.
48. Pericardial metastasis of parotid mucoepidermoid carcinoma diagnosed by pericardial biopsy.
49. Postoperative Complications and Swallowing Function after Jejunal and Skin Flap Reconstruction for Hypopharyngeal Carcinoma-A Multicenter Retrospective Study.
50. Comparison of Dosage of Nivolumab in Efficacy and Safety for Recurrent Metastatic Squamous Cell Carcinoma.
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