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1. Unequally Spaced Waveguide Arrays for Silicon Nanomembrane-Based Efficient Large Angle Optical Beam Steering

2. Preferential orientation effects in partial melt laser crystallization of silicon

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3. Pulsed laser techniques for nanographoepitaxy

4. Secondary electron detection for distributed axis electron beam systems

5. Demonstration of Secondary Electron Detection using Monolithic Multi-Channel Electron Detector

6. Lithography and Other Patterning Techniques for Future Electronics

7. Lamellar crystallization of silicon for 3-dimensional integration

8. Nano-graphoepitaxy of semiconductors for 3D integration

9. Low-energy electron/atom elastic scattering cross sections from 0.1-30 keV

10. Effect of nanoimprinted surface relief on Si and Ge nucleation and ordering

11. Photoelectronic analog-to-digital conversion: sampling and quantizing at 100 Gs/s

12. Preparation of clean GaAs(100) studied by synchrotron radiation photoemission

13. High-throughput high-density mapping and spectrum analysis of transistor gate length variations in SRAM circuits

14. The micromechanical tunneling transistor

15. Exploiting structure in fast aerial image computation for integrated circuit patterns

16. An exact algorithm for self-calibration of two-dimensional precision metrology stages

17. Switching characteristics of submicron cobalt islands

18. Lithographically patterned single-domain cobalt islands for high-density magnetic recording

19. Electron scattering study within the depletion region of the GaN(0001) and the GaAs(100) surface

20. Can nanolithography ever be a manufacturing technology?

21. A review of mask errors on a variety of pattern generators

22. Cooling three-dimensional integrated circuits using power delivery networks

23. Empirical forms for the electron/atom elastic scattering cross sections from 0.1 to 30 keV

24. Limits of high-density, low-force pressure contacts

25. Simple method for cleaning gallium nitride (0001)

26. Sub-15 nm Photo-electron Source Using a Nano-aperture Integrated with a Nano-antenna

27. High aspect ratio lines as low distortion, high frequency off-chip interconnects

28. 8.1: Experimental verification of a λ/50 optical spot size of a C-aperture nano antenna tip for photo-electron emitter applications

29. Growth mechanisms and properties of 90° grain boundaries inYBa2Cu3O7thin films

30. Absence of weak-link behaviour in YBa2Cu307 grains connected by 90° [010] twist boundaries

31. Lateral resonant tunneling transistors employing field-induced quantum wells and barriers

32. Limits of nano-gate fabrication

33. Innovative Technologies for Maskless Lithography and Non-Conventional Patterning

34. Real time simulation of heat detection in DNA Thermosequencing

35. Significant Advances in Scanning Electron Microscopes (1965–2007)

36. A catadioptric reduction camera for deep UV microlithography

37. Resonant tunneling of 1-dimensional electrons across an array of 3-dimensionally confined potential wells

38. High-Speed Scanning Electron Microscopy using Distributed-axis Electron Optics

39. Parameters and mechanisms governing image contrast in scanning electron microscopy of single-walled carbon nanotubes

40. Fabrication of silicon nanopillars containing polycrystalline silicon/insulator multilayer structures

41. Sub-100 nm Gate Length GaAs MESFETs Fabricated By Molecular Beam Epitaxy And Electron Beam Lithography

42. Ab initio modeling of the interaction of electron beams and single-walled carbon nanotubes

43. Thin film nano thermocouple sensors for applications in laser and electron beam irradiation

44. Effect of magnetocrystalline anisotropy in single-domain polycrystalline cobalt islands

45. Lithography for 0.25 mu m and below using simple high-performance optics

46. Self‐limiting oxidation for fabricating sub‐5 nm silicon nanowires

47. Limits of high density, low-force pressure contacts

48. System level packaging: an alternative to monolithic ULSI?

49. Exploiting structure in positioning of nonsymmetric signals

50. High-performance negative electron affinity photocathodes for high resolution electron beam lithography and metrology