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4. Photo-polymerisation kinetic study of UV-NIL dedicated resists

5. Photopolymerisation kinetic study of UV-NIL dedicated resists

6. Deprotection kinetic monitoring of a 193nm resist by ellipsometry

7. Low-k epoxy silsesquioxane resists for UV nanoimprint lithography

15. Organic-Inorganic Hybrid Planarization and Water Vapor Barrier Coatings on Cellulose Nanofibrils Substrates.

16. Direct ArF laser photopatterning of metal oxide nanostructures prepared by the sol-gel route.

17. Evolution of the surface polar character of pyrogenic silicas, with their grafting ratios by dimethylchlorosilane, studied by microcalorimetry.

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