46 results on '"Plais, F."'
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2. Comparison of SiO2 Thin Film Properties Deposited by Distributed Electron Cyclotron Resonance Plasma Using Two Different Oxidant Gases: N2O or O2
3. Thin films for large area electronics
4. Matrix addressing for organic electroluminescent displays
5. Surface melt dynamics and super lateral growth regime in long pulse duration excimer laser crystallization of amorphous Si films
6. Correlation Between Kink Effect and Hot-Carrier Induced Degradation in Polysilicon Thin-Film Transistors
7. Two-Dimensional Numerical Analysis of Electrical Characteristics of Polysilicon Thin-Film Transistors
8. Compact Analytical Physical-Based Model of LTPS TFT for Active Matrix Displays Addressing Circuits Simulation and Design
9. Addressing of Organic Electroluminescent Displays
10. Influence of Insulator-Deposited Wall on Plasma Bias Characteristics
11. Defects in solid phase and laser crystallised polysilicon thin film transistors
12. Combined Solid Phase Crystallization and Excimer Laser Annealing Process for Polysilicon Thin-Film Transistors
13. Determination of excess current due to impact ionization in polycrystalline silicon thin-film transistors
14. Analysis of electrical characteristics of polycrystalline silicon thin-film transistors under static and dynamic conditions
15. Hot-carrier-induced modifications to the noise performance of polycrystalline silicon thin-film transistors
16. Noise performances in polycrystalline silicon thin-film transistors fabricated by excimer laser crystallization
17. Cristallisation du silicium amorphe par laser à excimères
18. Low Temperature Polysilicon Materials and Devices
19. Evidence of carrier number fluctuation as origin of 1/f noise in polycrystalline silicon thin film transistors
20. Low temperature polysilicon TFTs: a comparison of solid phase and laser crystallization
21. Etude par Microscopie Electronique et Mesures de Conductance Electrique In Situ de la Cristallisation de Couches a-Si Obtenues par Pyrolyse de Silane et Disilane par LPCVD dans des Conditions Ultra-Pures
22. Microstructure and Transistor Properties of Solid-State-Crystallised Polysilicon: Effect of a Prolonged 600°C Anneal
23. High Mobility Non-Hydrogenated Low Temperature Polysilicon TFTs
24. Deposition and Crystallisation Behaviour of Amorphous Silicon Thin Films Obtained by Pyrolysis of Disilane Gas at Very Low Pressure
25. Low-temperature (≤600 degrees C) polysilicon thin-film transistors
26. ChemInform Abstract: Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition.
27. Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition
28. Floating Temperature Deposition of Device Quality SiO2 Thin Films by DECR Plasma
29. Low temperature deposition of SiO/sub 2/ on InP substrates by DECR PECVD.
30. InP/insulator interface properties: a comparison between UVCVD, DECR PECVD and 13.56 MHz PECVD.
31. InP MISFETs with SiO/sub 2/ gate insulator deposited by distributed electron cyclotron resonance plasma deposition.
32. Frequency, energy and spatially resolved characterization of interface traps in metal-insulator-InP transistors based on noise and current drift measurements.
33. High Quality Polycrystalline Thin Films Transistors Made by Excimer Laser Crystallisation.
34. 1/f Noise in Polycrystalline Silicon Thin Film Transistors.
35. Analysis and Characterization of Polycrystalline Silicon Thin-Film Transistors.
36. Large Area Deposition of Device Quality SiO2 for Poly Si TFT Fabrication.
37. Electrical properties of distributed electron cyclotron resonance plasma‐deposited SiO2‐InP diodes
38. Surface analysis to study the improvements of silicon nitride/gallium arsenide interface properties
39. Defects in solid phase and laser crystallised polysilicon thin film transistors
40. 1/f noise in polycrystalline silicon thin film transistors
41. High quality polycrystalline thin films transistors made by excimer laser crystallisation
42. Analysis and characterization of polycrystalline silicon thin-film transistors
43. Single crystalline silicon thin film transistors fabricated on Corning 7059
44. Single crystalline silicon thin film transistors fabricated on Corning 7059.
45. Floating Temperature Deposition of Device Quality SiO2 Thin Films by DECR Plasma.
46. Leakage current reduction due to hot carrier effects in n-channel polycrystalline silicon thin film transistors
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