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The development of a CMOS manufactured THz sensing platform could enable the integration of state-of-the-art sensing principles with the mixed signal electronics ecosystem in small footprint, low-cost devices. To this aim, in this work we demonstrate a label-free protein sensing platform using highly doped germanium plasmonic antennas realized on Si and SOI substrates and operating in the THz range of the electromagnetic spectrum. The antenna response to different concentrations of BSA shows in both cases a linear response with saturation above 20 mg/mL. Ge antennas on SOI substrates feature a two-fold sensitivity as compared to conventional Si substrates, reaching a value of 6 GHz/(mg/mL), which is four-fold what reported using metal-based metamaterials. We believe that this result could pave the way to a low-cost lab-on-a-chip biosensing platform.

The integration of both optical and electronic components on a single chip, despite the challenge, holds the promise of compatibility with CMOS technology and high scalability. Among all candidate materials, III-V semiconductor nanostructures are key ingredients for opto-electronics and quantum optics devices, such as light emitters and harvesters. The control over geometry, and dimensionality of the nanostructures, enables one to modify the band structures, and hence provide a powerful tool for tailoring the opto-electronic properties of III-V compounds. One of the most creditable approaches towards such growth control is the combination of using patterned wafer and the self-assembled epitaxy. This work presents monolithically integrated catalyst-free InP nanowires grown selectively on nanotip-patterned (001)Si substrates using gas-source molecular-beam epitaxy. The substrates are fabricated using CMOS nanotechnology. The dimensionality of the InP structures can be switched between two-dimensional nanowires and three-dimensional bulk-like InP islands by thermally modifying the shape of Silicon nanotips, surrounded by the SiO2 layer during the oxide-off process. The structural and optical characterization of nanowires indicate the coexistence of both zincblende and wurtzite InP crystal phases in nanowires. The two different crystal structures were aligned with a type-II heterointerface.

Localized Surface Plasmon Resonances (LSPR) based on highly doped semiconductors microstructures, such as antennas, can be engineered to exhibit resonant features at THz frequencies. In this work, we demonstrate plasmonic antennas with increased quality factor LSPRs from Fano coupling to dark modes. We also discuss the advances in the biofunctionalization of n-doped Ge antennas for specific protein immobilization and cell interfacing. Finally, albumin biolayers with a thickness of a few hundred nanometers are used to demonstrate the performance of the fano-coupled n-Ge antennas as sensors. A resonant change of over 10% in transmission, due to the presence of the biolayer, can be detected within a bandwidth of only 20 GHz.

HfO2-based solid-state incandescent light emission devices (SSI-LEDs) with conductive filament-related light emission mechanism are promising candidates for future light emission devices. In this letter, the temperature impact on the electrical and light emission properties of SSI-LEDs has been studied. The increase of the substrate temperature of the device leads to a reduction of the hard breakdown voltage and a decrease of the lighting efficiency. Both behaviors can be attributed to the Si-diffusion-assisted filament mechanism. By understanding such mechanism, we demonstrate a patterned wafer approach, geometrically confining the electrical field to effectively enhance the lighting performance of HfO2 SSI-LED devices. Our results support the explanation of the underlying light mechanism and open an effective pathway to improve the performance of the SSI-LED devices.

We present n-doped germanium-on-silicon (Ge-on- Si) antennas fabricated with CMOS mainstream methods, showing resonances between 0.1 and 0.7 THz for sensing applications. After surface functionalization with α-lipoic acid, a red-shift of the antenna resonance is observed, as demonstrated by THz time domain spectroscopy. Similar results are obtained with silicon nitride (Si 3 N 4 )-coated antennas, enabling microfluidic integration. Finally, we compare antennas of bow-tie slots to antennas fabricated via maskless photolithography.

Label-free optical detection of biomolecules is currently limited by a lack of specificity rather than sensitivity. To exploit the much more characteristic refractive index dispersion in the mid-infrared (IR) regime, we have engineered three-dimensional IR-resonant silicon micropillar arrays (Si-MPAs) for protein sensing. By exploiting the unique hierarchical nano- and microstructured design of these Si-MPAs attained by CMOS-compatible silicon-based microfabrication processes, we achieved an optimized interrogation of surface protein binding. Based on spatially resolved surface functionalization, we demonstrate controlled three-dimensional interfacing of mammalian cells with Si-MPAs. Spatially controlled surface functionalization for site-specific protein immobilization enabled efficient targeting of soluble and membrane proteins into sensing hotspots directly from cells cultured on Si-MPAs. Protein binding to Si-MPA hotspots at submonolayer level was unambiguously detected by conventional Fourier transform IR spectroscopy. The compatibility with cost-effective CMOS-based microfabrication techniques readily allows integration of this novel IR transducer into fully fledged bioanalytical microdevices for selective and sensitive protein sensing.

The present work investigates the role of threading dislocation densities (TDD) in the low density regime on the vertical transport in Si0.06Ge0.94 heterostructures integrated on Si(001). The use of unintentionally doped Si0.06Ge0.94 layers enables the study of the impact of grown-in threading dislocations (TD) without interaction with processing-induced defects originating e.g. from dopant implantation. The studied heterolayers, while equal in composition, the degree of strain relaxation, and the thickness, feature three different values for the TDD: 3×106 , 9×106 and 2×107 cm-2 . Current-voltage measurements reveal that leakage currents do not scale linearly with TDD. The temperature dependence of the leakage currents suggests a strong contribution of field-enhanced carrier generation to the current transport, with the trap-assisted tunneling via TD-induced defect states identified as the dominant transport mechanism at room temperature. At lower temperature and at high electric fields, direct band-to-band tunneling without direct interaction with defect levels becomes the dominating type of transport. Leakage currents related to emission from mid-gap traps by the ShockleyRead-Hall (SRH) generation isobserved at higher temperatures (>100 °C). Here, we see a reduced contribution coming from SRH in our material, featuring the minimal TDD (3×106 cm-2 ), which we attribute to a reduction in point defect clusters trapped in the TD strain fields.

International audience; Highly polar materials are usually preferred over weakly polar ones to study strong electron–phonon interactions and its fascinating properties. Here, we report on the achievement of simultaneous confinement of charge carriers and phonons at the vicinity of a 2D vertical homovalent singularity (antiphase boundary, APB) in an (In,Ga)P/SiGe/Si sample. The impact of the electron–phonon interaction on the photoluminescence processes is then clarified by combining transmission electron microscopy, X-ray diffraction, ab initio calculations, Raman spectroscopy, and photoluminescence experiments. 2D localization and layer group symmetry properties of homovalent electronic states and phonons are studied by first-principles methods, leading to the prediction of a type-II band alignment between the APB and the surrounding semiconductor matrix. A Huang–Rhys factor of 8 is finally experimentally determined for the APB emission line, underlining that a large and unusually strong electron–phonon coupling can be achieved by 2D vertical quantum confinement in an undoped III–V semiconductor. This work extends the concept of an electron–phonon interaction to 2D vertically buried III–V homovalent nano-objects and therefore provides different approaches for material designs, vertical carrier transport, heterostructure design on silicon, and device applications with weakly polar semiconductors.

This study reports on a novel vacuum epitaxial lift-off (VELO) process to reuse the GaAs substrates in light-emitting diode (LED) production. The method is based on an epitaxial lift-off technique, whose application is however limited to flexible wafers, as gaseous reaction products (e.g. AsH 3 ) formed during the etching of AlAs with hydrofluoric acid are trapped within the wafer stack. In the developed VELO process, an applied vacuum of ∼ 5000 Pa to the bonded wafer stack removes such detrimental reaction gases, allowing a separation of hard substrate/carrier systems. The VELO process is evaluated with a state-of-the-art thin-film light-emitting diode (TF-LED) phosphide-based epitaxial structure with a buried AlAs sacrificial layer and a simplified LED chip construction at 4-in. wafer level. Characterization of the so-processed LEDs using high-resolution x-ray diffraction, μ -photoluminescence and electrical testing reveal that the VELO TF-LEDs show a comparable performance like to released chips by using conventional grinding/polishing and etching of the GaAs substrate. As our VELO process is non-destructive to the substrate, the GaAs wafers can be reused, enabling lower costs for LED production and reduced toxic waste to establish a green semiconductor production.

The local atomic structure of [110] tilt grain boundaries (GBs) formed in ∼100 nm-sized GaAs nanocrystals, which crystallize in the non-centrosymmetric zincblende-type structure with face-centred cubic lattice symmetry, was imaged and analysed by means of high-resolution high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM). The nanocrystals were grown by metal–organic vapour phase epitaxy on top of (001) Si nanotips embedded in an oxide matrix. This paper introduces an automatic analysis method and corresponding processing tool for the identification of the GBs. The method comprises (i) extraction of crystallographic parameters,i.e.misorientation angles and transformation matrices for the different crystal parts (grains/twins) observed by HAADF-STEM, and (ii) determination of their common plane(s) by modelling all possible intersections of the corresponding three-dimensional reciprocal lattices. The structural unit model is also used to characterize the GB structures and to validate the data obtained by the developed algorithm.

Crystal defects, present in ~100 nm GaAs nanocrystals grown by metal organic vapour phase epitaxy on top of (0 0 1)-oriented Si nanotips (with a tip opening 50–90 nm), have been studied by means of high-resolution aberration-corrected high-angle annular dark-field scanning transmission electron microscopy. The role of 60° perfect, 30° and 90° Shockley partial misfit dislocations (MDs) in the plastic strain relaxation of GaAs on Si is discussed. Formation conditions of stair-rod dislocations and coherent twin boundaries in the GaAs nanocrystals are explained. Also, although stacking faults are commonly observed, we show here that synthesis of GaAs nanocrystals with a minimum number of these defects is possible. On the other hand, from the number of MDs, we have to conclude that the GaAs nanoparticles are fully relaxed plastically, such that for the present tip sizes no substrate compliance can be observed.

In this paper we have deposited structures comprising a stack of 10 periods made of 15 nmthick Ge multi quantum well (MQW) enclosed in 15 nm-thick Si0.2Ge0.8 barrier have been deposited on SiGe virtual substrates (VS) featuring different Ge contents in the 85% - 100% Ge range to investigate the influence of heteroepitaxial strain on the Si0.2Ge0.8 and Ge growth. With increasing Ge concentration of the VS, growth rate of the Si0.2Ge0.8 in the MQW increases. Si incorporation into the Si0.2Ge0.8 layer becomes also slightly higher. However, almost no influence of the growth rate is observed for Ge growth in the MQW. We argue that the increased tensile strain promotes the Si reaction at the surface. In the case of the Si0.2Ge0.8 growth on Ge, we observe a smeared interface due to the Ge segregation during the growth. Furthermore, we observe that this interface width increases with increasing Ge concentration of VS. We attribute this observation to the increased segregation of Ge driven by the increased strain energy accumulated in the in the Si0.2Ge0.8 layers. We also observed that the MQW layer “filters-out” threading dislocations formed in the VS.

Exploiting intersubband transitions in Ge/SiGe quantum cascade devices provides a way to integrate terahertz light emitters into silicon-based technology. With the view to realizing a Ge/SiGe Quantum Cascade Laser, we present the optical and structural properties of n-type strain-symmetrized Ge/SiGe asymmetric coupled quantum wells grown on Si(001) substrates by means of ultrahigh vacuum chemical vapor deposition. We demonstrate high material quality of strain-symmetrized structures and heterointerfaces as well as control over inter-well coupling and electron tunneling. Motivated by the promising results obtained on ACQWs, which are the basic building block of a cascade structure, we investigate, both experimentally and theoretically, a Ge/SiGe THz QCL design, optimized through a non-equilibrium Green’s function formalism

The imaging and sensing technology operating in the THz region of the electromagnetic spectrum has a number of applications, with demonstrator products already available on the market for oncology imaging, production monitoring, and non-destructive test [1]. However, the THz sources now at hand are still bulky and too expensive for expanding this technology to other proposed applications, which also include, among other, THz bandwidth photonics and security imaging. A higher level of integration with control electronics, a lower production cost, and a broader wavelength range of emission towards the far-infrared, are all desirable features to expand the fields of application of THz radiation. N-type Ge/SiGe quantum cascade structures grown on top of a Si(001) substrate are particularly promising for realizing a Si based THz source [2]. The low effective mass and long non-radiative relaxation times due to the non-polar nature of the material, are expected to i) provide gain values close to those demonstrated in III-V quantum cascade structures at 4 K, and ii) to potentially enable 300 K operation. In this presentation we will discuss the optical and structural properties of n-type s-Ge/SiGe multi-quantum wells and asymmetric coupled quantum wells grown on Si(001) substrates by means of ultrahigh vacuum chemical vapor deposition [3]. Extensive structural characterization obtained by scanning transmission electron microscopy (STEM), atomic probe tomography (APT) and X-ray diffraction shows the high material quality of strain-symmetrized structures (up to 5 micron active region thickness) and heterointerfaces (featuring interface roughness below 0.2 nm), down to the ultrathin barrier limit (about 1 nm). By performing THz absorption spectroscopy measurements combined to theoretical modeling on different asymmetric coupled quantum well systems (with varying large-well width or barrier thickness), we unambiguously demonstrated inter-well coupling and wavefunction tunneling [3]. The agreement between experimental data and simulations allowed us to characterize the tunneling barrier parameters and, in turn, achieve a highly-controlled engineering of the electronic structure in forthcoming unipolar cascade systems based on n-type Ge/SiGe multi quantum-wells. Furthermore, by pump-and-probe, and time domain spectroscopic data with a thorough theoretical modeling, we will show that this material system is indeed promising as active material in quantum cascade lasers (QCL). We found i) narrow intersubband (ISB) absorption lines; ii) relatively long non-radiative ISB relaxation times at high temperature; iii) relaxation times for different ISB transitions favorable to population inversion. Leveraging on the promising results obtained by spectroscopy experiments, we theoretically investigate an electrically-pumped Ge/SiGe THz QCL through a non-Equilibrium Green Function formalism (nextnano.QCL), using as material parameters to model the scattering processes the values estimated from the analysis of the optical experimental data [4]. As expected, due to the weaker interaction with the phonon field with respect to III-V based devices, we find a lower impact of the temperature on the gain spectrum. In addition, simulations show that the interface roughness values measured on our samples allows to achieve gain overcoming the losses of double-metal waveguides at room temperature. We believe that the present results will motivate new experimental efforts aimed at demonstrating room-temperature operation in group IV QCL THz devices. References [1] D. J. Paul, Laser Photon. Rev. 4, 610 (2010). [2] K. Driscoll, and R. Paiella, J. Appl. Phys. 102, 093103 (2007). [3] C. Ciano, M. Virgilio, M. Montanari, L. Persichetti, L. Di Gaspare, M. Ortolani, L. Baldassarre, M. H. Zollner, O. Skibitzki, G.Scalari, J. Faist, D. J. Paul, M. Scuderi, G. Nicotra, T. Grange, S. Birner, G. Capellini, and M. De Seta, Accepted in Phys. Rev. Appl., 11, 014003 (2019). [4] T. Grange, D. Stark, G. Scalari, J. Faist, L. Persichetti, L. Di Gaspare, M. De Seta, M. Ortolani, D.J. Paul, G. Capellini, S. Birner and M. Virgilio, Submitted to Applied Physics Letters. Preprint available at https://arxiv.org/pdf/1811.12879.pdf.

We explore saturable absorption and terahertz photoluminescence emission in a set of n-doped Ge/SiGe asymmetric coupled quantum wells, designed as three-level systems (i.e., quantum fountain emitter). We generate a non-equilibrium population by optical pumping at the 1→3 transition energy using picosecond pulses from a free-electron laser and characterize this effect by measuring absorption as a function of the pump intensity. In the emission experiment we observe weak emission peaks in the 14–25 meV range (3–6 THz) corresponding to the two intermediate intersubband transition energies. The results represent a step towards silicon-based integrated terahertz emitters.

The exploitation of intersubband transitions in Ge/SiGe quantum cascade devices could pave the way towards the integration of THz light emitters into the silicon-based technology. Aiming at the realization of a Ge/SiGe Quantum Cascade Laser (QCL), we investigate optical and structural properties of n-type Ge/SiGe coupled quantum well systems. The samples have been investigated by means of X-ray diffraction, scanning transmission electron microscopy, atom probe tomography and Fourier Transform Infrared absorption spectroscopy to assess the growth capability with respect to QCL design requirements, carefully identified by means of modelling based on the non-equilibrium Green function formalism.

Let's talk about your flaws\dots{} The authors present nondestructive examination of the crystallographic properties (including crystal size, facet shape, strain, and defects) of lone InP nanocrystals (NC) grown on Si nanostructures. This sort of three-dimensional structured imaging is of great significance in evaluating the quality of the active nanomaterials in fully processed nanoelectronic and nano-optoelectronic devices, even in an $o\phantom{\rule{0}{0ex}}p\phantom{\rule{0}{0ex}}e\phantom{\rule{0}{0ex}}r\phantom{\rule{0}{0ex}}a\phantom{\rule{0}{0ex}}n\phantom{\rule{0}{0ex}}d\phantom{\rule{0}{0ex}}o$ manner.

To satisfy the continuous demand of ever smaller feature sizes, plasma etching technologies in microelectronics enable the fabrication of device structures in the nanometer range. To control these processes, real-time access to the structure’s dimensions is needed. We develop a special method of optical critical dimension metrology and evaluate the feasibility of reconstructing the etched dimensions from experimental reflectivity spectra of the surface, taken about every second. For a periodic 2D model structure etched into a silicon, we develop and test a fast algorithm. To reduce the computing time, we generate a library of spectra before the etching. We demonstrate that, by replacing the numerically simulated spectra in the reconstruction algorithm by spectra interpolated from the library, it is possible to compute the geometry parameters in times less than a second. Finally, to also reduce memory size and computing time for the library, we reduce the scanning of the parameter values to a sparse grid.

The efficient integration of electronic and optoelectronic functions on a single chip within a CMOS-compatible material and technology platform is witnessing the next disruptive innovation in the microelectronics industry. Among the proposed approaches to “siliconize” photonics, the most ambitious is to develop a monolithic Si-based light source. The main challenge is the indirect bandgap of Si which hinders efficient light emission. A number of different solutions has been suggested to break down this material limitation, and the optimal strategy depends on the specific spectral range of application. In the THz range, quantum cascade laser (QCL) architectures based on the Group-IV material system have been predicted as viable potential sources up to room temperature1-3, by exploiting intersubband (ISB) transitions in the conduction band of n-type, Ge-rich Ge/SiGe multi-quantum well (MQW) heterostructures3. In this paper, we will show that the interface quality and threading dislocation density4 in this material system have finally reached the level required for possibly enabling, within a wide temperature range, a material gain larger than the cavity losses5. From the structural standpoint, we report on the growth by ultra-high-vacuum chemical vapor deposition (UHV-CVD) of strain-compensated QCL stacks with a thickness up to 10 µm, demonstrating by X-ray diffraction and scanning transmission electron microscopy their high crystalline quality and remarkable growth reproducibility [Fig. 1(a)]. We will also describe optimized designs obtained in waveguide modelling with which waveguide losses comparable to III-V architectures are achieved6. In the model system of n-type Ge-rich asymmetric coupled quantum wells (ACQWs)7,8, being the building block of a QCL structure, we will prove a high degree of control on the engineering at the nanoscale the intersubband electronic spectrum and the wavefunctions relevant for tunneling processes, which allowed us the observation of photoluminescence at 4 THz after optical excitation using a free-electron laser (FEL)9. In addition, we will present a systematic calibration study of the material parameters controlling the interface roughness (IFR) and electron-phonon scatterings in n-type Ge/SiGe MQWs by combining experimental pump-probe data with a numerical model of ISB carrier dynamics including inelastic and elastic scattering channels. The time evolution of subband populations after FEL optical pumping is investigated as a function of the MQW design geometry, comparing symmetric and stepwise configurations, and analyzed by varying the subband energy spacing changing the well width. As a matter of fact, these material parameters critically affect the outcomes of the non-equilibrium Green’s function calculations widely used for predicting quantum transport and, ultimately optical gain of QCL devices10,11 and so to guide the optimization of proposed device designs. Hitherto, however, in most cases, the adopted values for these material parameters were not calibrated against experiments. For a proper calibration of the deformation potentials, we studied the non-radiative lifetimes as a function of the subband spacing on a set of symmetric MQWs of different Ge well widths. The corresponding α2D absorption spectra are reported in the left panels Fig. 1(b-d). Differential transmission spectra from single-color pump-probe experiments and model simulations indicate [Fig. 1(e-g)] that the electron-phonon coupling is much less effective than that expected from the bulk deformation potentials reported by Jacoboni et al.12. In particular, we found that the relaxation mediated by the emission of intervalley OPs is suppressed in low-dimensional multilayer structures while the intravalley OP scattering is described by a reduced effective deformation potential, thus explaining the observation of relaxation times larger than 10 ps above both the OP energy thresholds in single-color pump probe spectroscopy experiments. These results are crucial for developing adequate simulation frameworks and specific design approaches for achieving optical gain in silicon-compatible quantum cascade emitters. [1] K. Driscoll et al., Appl. Phys. Lett. 89, 191110 (2006). [2] K. Driscoll et al., J. Appl. Phys. 102, 093103 (2007). [3] D. J. Paul, Laser & Photonics Reviews 4, 610 (2010). [4] T. Grange et al., Physical Review Applied 13, 044062 (2020). [5] T. Grange et al., Appl. Phys. Lett. 114, 111102 (2019). [6] K. Gallacher et al., Opt. Express 28, 4786 (2020). [7] C. Ciano et al., Physical Review Applied 11, 014003 (2019). [8] L. Persichetti et al., Crystals 10, 179 (2020). [9] C. Ciano et al., Opt. Express 28, 7245 (2020). [10] A. Valavanis et al., Phys. Rev. B 83, 195321 (2011). [11] C. Jirauschek et al., Applied Physics Reviews 1, 011307 (2014). [12] C. Jacoboni et al., Phys. Rev. B 24, 1014 (1981). Figure 1

Germanium (Ge) nanowires (NWs) were grown in-plane on nano-structured Si(001)/SiO2 substrates by molecular beam epitaxy using gold (Au) as solvent. The site-selective NW growth was enabled by a rectangular array of gold droplets on silicon (Si) tips with a Au nuclei density below 0.25 µm-2 on the surrounding silicon oxide (SiO2). The initial growth of Ge NWs starting from Si-Au droplets with SixGe1-x nucleation from ternary alloy is discussed from a thermodynamic point of view. The in-plane NW elongation occurred within 〈110〉 directions on the substrate and NWs were mainly bounded by two 55° inclined {111} facets and a less pronounced planar (001) top facet. Fully relaxed crystal lattices of Ge NWs were observed from two-dimensional reciprocal space maps of X-ray diffraction measurements.

Theoretical predictions indicate that the n-type Ge / Si − Ge multi-quantum-well system is the most promising material for the realization of a Si -compatible THz quantum cascade laser operating at room temperature. To advance in this direction, we study, both experimentally and theoretically, asymmetric coupled multi-quantum-well samples based on this material system, that can be considered as the basic building block of a cascade architecture. Extensive structural characterization shows the high material quality of strain-symmetrized structures grown by chemical vapor deposition, down to the ultrathin barrier limit. Moreover, THz absorption spectroscopy measurements supported by theoretical modeling unambiguously demonstrate inter-well coupling and wavefunction tunneling. The agreement between experimental data and simulations allows us to characterize the tunneling barrier parameters and, in turn, achieve highly controlled engineering of the electronic structure in forthcoming unipolar cascade systems based on n-type Ge / Si − Ge multi-quantum-wells.

We investigate the distribution of Sn in GeSn nano-heteroepitaxial clusters deposited at temperatures well exceeding the eutectic temperature of the GeSn system. The 600 °C molecular beam epitaxy on Si-patterned substrates results in the selective growth of GeSn nano-clusters having a 1.4 ± 0.5 at% Sn content. These nano-clusters feature Sn droplets on their faceted surfaces. The subsequent deposition of a thin Ge cap layer induced the incorporation of the Sn atoms segregated on the surface in a thin layer wetting the nano-dots surface with 8 ± 0.5 at% Sn. The presence of this wetting layer is associated with a relatively strong photoluminescence emission that we attribute to the direct recombination occurring in the GeSn nano-dots outer region.

Lateral solid phase epitaxy (L-SPE) in non-doped or in-situ B-doped amorphous- (a-) SiGe deposited on SiO 2 patterned Si(100) wafers by in-situ postannealing in reduced pressure chemical vapor deposition system was investigated for possible heterojunction bipolar transistor (HBT) base link resistivity improvement. Using Si 2 H 6 as Si precursor gas, an epitaxial and amorphous layer was grown on the mask window and on the SiO 2 area, respectively. By inserting a-Si buffer underneath, the deposited a-SiGe surface became smoother. After the L-SPE process, an improved L-SPE length was observed due to suppressed random nucleation on SiO 2 . The L-SPE length increased with increasing postannealing time and saturated due to random poly-grain formation on the SiO 2 . At the same L-SPE time, increased L-SPE length was observed at higher temperature and at higher Ge concentration. With increasing B concentration in the a-SiGe, the L-SPE length firstly increased. However, after reaching 2 × 10 19 atom/cm 3 , the L-SPE length reduced again down to the undoped case. These results of L-SPE process might have potential to improve dynamic performance of SiGe HBT by reducing the base link resistivity by widening the monocrystalline region around bipolar window.

We report the observation of field emission from InP nanocrystals epitaxially grown on an array of p-Si nanotips. We prove that field emission can be enhanced by covering the InP nanocrystals with graphene. The measurements are performed inside a scanning electron microscope chamber with a nano-controlled W-thread used as an anode. We analyze the field emission by Fowler-Nordheim theory and find that the field enhancement factor increases monotonically with the spacing between the anode and the cathode. We also show that InP/p-Si junction has a rectifying behavior, while graphene on InP creates an ohmic contact. Understanding the fundamentals of such nanojunctions is key for applications in nanoelectronics., 7 pages, 3 figures

The epitaxial integration of highly heterogeneous material systems with silicon (Si) is a central topic in (opto-)electronics owing to device applications. InP could open new avenues for the realization of novel devices such as high-mobility transistors in next-generation CMOS or efficient lasers in Si photonics circuitry. However, the InP/Si heteroepitaxy is highly challenging due to the lattice (∼8%), thermal expansion mismatch (∼84%), and the different lattice symmetries. Here, we demonstrate the growth of InP nanocrystals showing high structural quality and excellent optoelectronic properties on Si. Our CMOS-compatible innovative approach exploits the selective epitaxy of InP nanocrystals on Si nanometric seeds obtained by the opening of lattice-arranged Si nanotips embedded in a SiO2 matrix. A graphene/InP/Si-tip heterostructure was realized on obtained materials, revealing rectifying behavior and promising photodetection. This work presents a significant advance toward the monolithic integration of graphene/III-V based hybrid devices onto the mainstream Si technology platform.

The integration of dislocation-free Ge nano-islands was realized via selective molecular beam epitaxy on Si nano-tip patterned substrates. The Si-tip wafers feature a rectangular array of nanometer sized Si tips with (001) facet exposed among a SiO2 matrix. These wafers were fabricated by complementary metal-oxide-semiconductor (CMOS) compatible nanotechnology. Calculations based on nucleation theory predict that the selective growth occurs close to thermodynamic equilibrium, where condensation of Ge adatoms on SiO2 is disfavored due to the extremely short re-evaporation time and diffusion length. The growth selectivity is ensured by the desorption-limited growth regime leading to the observed pattern independence, i.e. the absence of loading effect commonly encountered in chemical vapor deposition. The growth condition of high temperature and low deposition rate is responsible for the observed high crystalline quality of the Ge islands which is also associated with negligible Si-Ge intermixing owing to geometric hindrance by the Si nano-tip approach. Single island as well as area-averaged characterization methods demonstrate that Ge islands are dislocation-free and heteroepitaxial strain is fully relaxed. Such well-ordered high quality Ge islands present a step towards the achievement of materials suitable for optical applications., Scientific Reports, 6, ISSN:2045-2322

The solid phase epitaxy (SPE) of undoped amorphous Si (a-Si) deposited on SiO2 patterned Si(001) wafers by reduced pressure chemical vapor deposition (RPCVD) using a H2–Si2H6 gas system was investigated. The SPE was performed by applying in-situ postannealing directly after deposition process. By transmission electron microscopy (TEM) and scanning electron microscopy, we studied the lateral SPE (L-SPE) length on sidewall and mask for various postannealing times, temperatures and a-Si thicknesses. We observed an increase in L-SPE growth for longer postannealing times, temperatures and larger Si thicknesses on mask. TEM defect studies revealed that by SPE crystallized epi-Si exhibits a higher defect density on the mask than at the inside of the mask window. By introducing SiO2-cap on the sample with 180 nm Si thickness following postannealing at 570 °C for 5 h, the crystallization of up to 450 nm epi-Si from a-Si is achieved. We demonstrated the possibility to use this technique for SiGe:C heterojunction bipolar transistor (HBT) base layer stack to crystallize Si-buffer layer to widen the monocrystalline region around the bipolar window and to improve base link resistivity of the HBT.

Solid-phase epitaxy (SPE) of in situ As-doped amorphous Si (a-Si) deposited on SiO 2 /Si 3 N 4 patterned Si (1 0 0) wafers by reduced pressure chemical vapour deposition (RPCVD) using a H 2 –Si 2 H 6 gas system was investigated. The SPE was performed by applying in situ postannealing directly after deposition process. On the one hand, we studied the lateral SPE (L-SPE) length of As-doped Si on mask and their crystal quality by TEM/SEM characterisation for various postannealing temperatures (700–1000 °C for 60 s). We observed increase in L-SPE growth and decrease of dislocation density for higher postannealing temperatures. On the other hand, L-SPE length was also investigated for different postannealing times (0–120 min at 575 °C) and As concentrations. At these conditions the L-SPE length has increased with increasing postannealing time. For both, higher and lower annealing temperature region, crystallization has been inhibited for higher As concentrations. After modifying As-doping level, we were able to crystallize up to 500 nm of a-Si on mask to epi-Si by combination of 575 °C and 1000 °C postannealing.

We demonstrate a novel method for the stable and selective surface functionalization of germanium (Ge) embedded in silicon dioxide. The Ge(001) surface is functionalized using a-lipoic acid (ALA), which can potentially be utilized for the immobilization of a wide range of biomolecules. We present a detailed pH-dependence study to establish the effect of the incubation pH value on the adsorption layer of the ALA molecules. A threshold pH value for functionalization is identified, dividing the examined pH range into two regions. Below a pH value of 7, the formation of a disordered ALA multilayer is observed, whereas a stable well-ordered ALA mono- to bi-layer on Ge(001) is achieved at higher pH values. Furthermore, we analyze the stability of the ALA layer under ambient conditions, revealing the most stable functionalized Ge(001) surface to effectively resist oxidation for up to one week. Our established functionalization method paves the way towards the successful immobilization of biomolecules in future Ge-based biosensors

In this work, we demonstrate the growth of Ge crystals and suspended continuous layers on Si(001) substrates deeply patterned in high aspect-ratio pillars. The material deposition was carried out in a commercial reduced-pressure chemical vapor deposition reactor, thus extending the "vertical-heteroepitaxy" technique developed by using the peculiar low-energy plasma-enhanced chemical vapor deposition reactor, to widely available epitaxial tools. The growth process was thoroughly analyzed, from the formation of small initial seeds to the final coalescence into a continuous suspended layer, by means of scanning and transmission electron microscopy, X-ray diffraction, and μ-Raman spectroscopy. The preoxidation of the Si pillar sidewalls and the addition of hydrochloric gas in the reactants proved to be key to achieve highly selective Ge growth on the pillars top only, which, in turn, is needed to promote the formation of a continuous Ge layer. Thanks to continuum growth models, we were able to single out the different roles played by thermodynamics and kinetics in the deposition dynamics. We believe that our findings will open the way to the low-cost realization of tens of micrometers thick heteroepitaxial layer (e.g., Ge, SiC, and GaAs) on Si having high crystal quality.

The integration of germanium (Ge) into silicon-based microelectronics technologies is currently attracting increasing interest and research effort. One way to realize this without threading and misfit dislocations is the so-called nanoheteroepitaxy approach. We demonstrate that a modified Si nanostructure approach with nanopillars or bars separated by TEOS SiO2 can be used successfully to deposit SiGe dots and lines free of misfit dislocations. It was found that strain relaxation in the pseudomorphically grown SiGe happens fully elastically. These studies are important for the understanding of the behavior of nanostructured Si for the final goal of Ge integration via SiGe buffer.

In this letter, we explore in detail the potential of nanoheteroepitaxy to controllably fabricate high quality GeSn nano-structures and to further improve the crystallinity of GeSn alloys directly grown on Si(001). The GeSn was grown by molecular beam epitaxy at relatively high temperatures up to 750 degrees C on pre-patterned Si nano-pillars embedded in a SiO2 matrix. The best compromise between selective GeSn growth and homogenous Sn incorporation of 1.4% was achieved at a growth temperature of 600 degrees C. X-ray diffraction measurements confirmed that our growth approach results in both fully relaxed GeSn nano-islands and negligible Si interdiffusion into the core of the nanostructures. Detailed transmission electron microscopy characterizations show that only the small GeSn/Si interface area reveals defects, such as stacking faults. Importantly, the main part of the GeSn islands is defect-free and of high crystalline quality. The latter was further demonstrated by photoluminescence measurements where a clear redshift of the direct CC-CV transition was observed with increasing Sn content.

We demonstrate tunable Schottky barrier height and record photo-responsivity in a new-concept device made of a single-layer CVD graphene transferred onto a matrix of nanotips patterned on n-type Si wafer. The original layout, where nano-sized graphene/Si heterojunctions alternate to graphene areas exposed to the electric field of the Si substrate, which acts both as diode cathode and transistor gate, results in a two-terminal barristor with single-bias control of the Schottky barrier. The nanotip patterning favors light absorption, and the enhancement of the electric field at the tip apex improves photo-charge separation and enables internal gain by impact ionization. These features render the device a photodetector with responsivity (3 A/W for white LED light at 3 mW/cm2 intensity) almost an order of magnitude higher than commercial photodiodes. We extensively characterize the voltage and the temperature dependence of the device parameters and prove that the multi-junction approach does not add extra-inhomogeneity to the Schottky barrier height distribution. This work represents a significant advance in the realization of graphene/Si Schottky devices for optoelectronic applications., Comment: Research paper, 22 pages, 7 figures

Dislocation networks are one of the most principle sources deteriorating the performances of devices based on lattice-mismatched heteroepitaxial systems. We demonstrate here a technique enabling fully coherent germanium (Ge) islands selectively grown on nanotip-patterned Si(001) substrates. The silicon (Si)-tip-patterned substrate, fabricated by complementary metal oxide semiconductor compatible nanotechnology, features ∼50-nm-wide Si areas emerging from a SiO2 matrix and arranged in an ordered lattice. Molecular beam epitaxy growths result in Ge nanoislands with high selectivity and having homogeneous shape and size. The ∼850 °C growth temperature required for ensuring selective growth has been shown to lead to the formation of Ge islands of high crystalline quality without extensive Si intermixing (with 91 atom % Ge). Nanotip-patterned wafers result in geometric, kinetic-diffusion-barrier intermixing hindrance, confining the major intermixing to the pedestal region of Ge islands, where kinetic diffusion barriers are, however, high. Theoretical calculations suggest that the thin Si/Ge layer at the interface plays, nevertheless, a significant role in realizing our fully coherent Ge nanoislands free from extended defects especially dislocations. Single-layer graphene/Ge/Si-tip Schottky junctions were fabricated, and thanks to the absence of extended defects in Ge islands, they demonstrate high-performance photodetection characteristics with responsivity of ∼45 mA W(-1) and an Ion/Ioff ratio of ∼10(3).

We investigate the structural properties and strain state of Ge nano-structures selectively grown on Si pillars of about 60 nm diameter with different SiGe buffer layers. A matrix of TEOS SiO2 surrounding the Si nano-pillars causes a tensile strain in the top part at the growth temperature of the buffer that reduces the misfit and supports defect-free initial growth. Elastic relaxation plays the dominant role in the further increase of the buffer thickness and subsequent Ge deposition. This method leads to Ge nanostructures on Si that are free from misfit dislocations and other structural defects, which is not the case for direct Ge deposition on these pillar structures. The Ge content of the SiGe buffer is thereby not a critical parameter; it may vary over a relatively wide range.

We present the morphological evolution obtained during the annealing of Ge strips grown on Si ridges as a prototypical process for 3D device architectures and nanophotonic applications. In particular, the morphological transition occurring from Ge/Si nanostrips to nanoislands is illustrated. The combined effect of performing annealing at different temperatures and varying the lateral size of the Si ridge underlying the Ge strips is addressed by means of a synergistic experimental and theoretical analysis. Indeed, three-dimensional phase-field simulations of surface diffusion, including the contributions of both surface and elastic energy, are exploited to understand the outcomes of annealing experiments. The breakup of Ge/Si strips, due to the activation of surface diffusion at high temperature, is found to be mainly driven by surface-energy reduction, thus pointing to a Rayleigh-like instability. The residual strain is found to play a minor role, only inducing local effects at the borders of the islands and an enhancement of the instability.

Phosphide-based thin-film light-emitting diodes (TF-LEDs) lattice-matched to GaAs are well established in optoelectronics in the wavelength range between 550 and 650 nm. In this work, we investigate the impact of oxidized AlAs to overlying phosphide-based pseudomorphically grown epitaxial structures. Oxidation of a buried AlAs sacrificial layer allows the separation of the grown TF-LED epitaxy from its substrates and enables an oxidation lift-off process. To evaluate the strain effect of progressing oxidation on the structure of the chip, we perform high-resolution x-ray diffraction analysis on as-grown, mesa-structured, semi-oxidized, and completely laterally oxidized chips. At each state, a pseudomorphic phosphide-based InAlP layer is found. The InAlP layer exhibits a tensile out-of-plane strain of approximately 0.20% and a compressive in-plane strain of approx. −0.19%. Additionally, scanning transmission electron microscopy, energy-dispersive x-ray spectroscopy, and μ-photoluminescence were used for in...

XRD techniques determined that 270 nm GaP grown on 400 nm Si 0.85 Ge 0.15 /Si(001) substrates by MOCVD is single crystalline and pseudomorphic, but carry a 0.07% tensile strain after cooling down to room temperature due to the bigger thermal expansion coefficient of GaP with respect to Si (Fig. 2). TEM and AFM examinations indicated a closed but defective GaP layer (Fig. 3(a)) with low root mean square of roughness (rms) of 3.0 nm for 1 μm 2 surface area (Fig. 3(b)). Although TEM studies confirm the absence of misfit dislocations in the pseudomorphic GaP film, growth defects (e.g. stacking faults, microtwins, and anti-phase domains) are detected, concentrating at the GaP/SiGe interface (Fig. 3(c)-(d), Fig. 4). We interpret these growth defects as a residue of the initial 3D island coalescence phase of the GaP film on the Si 0.85 Ge 0.15 buffer. TEM-EDX studies reveal that the observed growth defects are often correlated with stoichiometric inhomogeneities in the GaP film (not shown here). Finally, ToF-SIMS detects sharp heterointerfaces between GaP and SiGe films with a minor level of Ga diffusion into the SiGe buffer (Fig. 5).

Nano-heteroepitaxial growth of GaAs on Si(001) by metal organic vapor phase epitaxy was investigated to study emerging materials phenomena on the nano-scale of III-V/Si interaction. Arrays of Si nano-tips (NTs) embedded in a SiO2 matrix were used as substrates. The NTs had top Si openings of 50-90 nm serving as seeds for the selective growth of GaAs nano-crystals (NCs). The structural and morphological properties were investigated by high resolution scanning electron microscopy, atomic force microscopy, electron backscatter diffraction, x-ray diffraction, and high resolution scanning transmission electron microscopy. The GaAs growth led to epitaxial NCs featuring a bi-modal distribution of size and morphology. NCs of small size exhibited high structural quality and well-defined {111}-{100} faceting. Larger clusters had less regular shapes and contained twins. The present work shows that the growth of high quality GaAs NCs on Si NTs is feasible and can provide an alternate way to the integration of compound semiconductors with Si micro- and opto-electronics technology.

We present the nanoheteroepitaxial growth of gallium arsenide (GaAs) on nano-patterned silicon (Si) (001) substrates fabricated using a CMOS technology compatible process. The selective growth of GaAs nano-crystals (NCs) was achieved at 570 °C by MOVPE. A detailed structure and defect characterization study of the grown nano-heterostructures was performed using scanning transmission electron microscopy, x-ray diffraction, micro-Raman, and micro-photoluminescence (μ-PL) spectroscopy. The results show single-crystalline, nearly relaxed GaAs NCs on top of slightly, by the SiO2-mask compressively strained Si nano-tips (NTs). Given the limited contact area, GaAs/Si nanostructures benefit from limited intermixing in contrast to planar GaAs films on Si. Even though a few growth defects (e.g. stacking faults, micro/nano-twins, etc) especially located at the GaAs/Si interface region were detected, the nanoheterostructures show intensive light emission, as investigated by μ-PL spectroscopy. Achieving well-ordered high quality GaAs NCs on Si NTs may provide opportunities for superior electronic, photonic, or photovoltaic device performances integrated on the silicon technology platform.

Defects in form of dislocations at the interface and threading arms in the film as well as SiGe intermixing are the main mechanisms to release the crystallographic misfit strain in Germanium (Ge) heterostructures grown on the mature Silicon (Si) wafer platform, severely deteriorating thereby the superior optoelectronic properties of Ge for device applications. We demonstrate here a novel technique, enabling fully coherent, high Ge content islands on nano-tip patterned Si (001) substrates by the suppression of plastic relaxation as well as SiGe intermixing. The Si-tip patterned substrate, fabricated by complementary metal-oxide-semiconductor (CMOS) compatible nanotechnology, features ~50 nm wide Si tips emerging from a SiO2 matrix and arranged in an ordered lattice. Molecular beam epitaxy (MBE) growths result in Ge nano-islands with high selectivity and having homogeneous shape and size. The ~850°C growth temperature required for ensuring selective growth has been shown to lead to the formation of Ge islands of high crystalline quality without extensive Si intermixing (with 91 at.% Ge). Nano-tip patterned wafers result in geometric, kinetic diffusion barrier intermixing hindrance (in particular surface diffusion suppression) confining the major intermixing to the pedestal region of Ge islands where kinetic diffusion barriers are however high. Theoretical calculations suggest that the self-assembled thin SiGe layer at the interface plays nevertheless a significant role in realizing fully coherent Ge nano-islands free from extended defects especially dislocations. Finally, single layer graphene (SLG)/Ge/Si-tip Schottky junctions were fabricated and thanks to the absence of extended defects and SiGe intermixing in the Ge islands, high performance photodetection characteristics with responsivity and Ion/Ioff ratio of ~45 mA/W and ~103, respectively, are demonstrated.

This study reports a method to reuse GaAs substrates with a batch process for thin film light emitting diode (TF-LED) production. The method is based on an epitaxial lift-off technique. With the developed reclaim process, it is possible to get an epi-ready GaAs surface without additional time-consuming and expensive grinding/polishing processes. The reclaim and regrowth process was investigated with a one layer epitaxial test structure. The GaAs surface was characterized by an atomic force microscope directly after the reclaim process. The crystal structure of the regrown In0.5(Ga0.45Al0.55)0.5P (Q55) layer was investigated by high resolution x-ray diffraction and scanning transmission electron microscopy. In addition, a complete TF-LED grown on reclaimed GaAs substrates was electro-optically characterized on wafer level. The crystal structure of the epitaxial layers and the performance of the TF-LED grown on reclaimed substrates are not influenced by the developed reclaim process. This process would result in reducing costs for LEDs and reducing much arsenic waste for the benefit of a green semiconductor production.

We report a detailed structure and defect characterization study on gallium phosphide (GaP) layers integrated on silicon (Si) (001) via silicon-germanium (SiGe) buffer layers. The presented approach uses an almost fully relaxed SiGe buffer heterostructure of only 400 nm thickness whose in-plane lattice constant is matched to GaP—not at room but at GaP deposition temperature. Single crystalline, pseudomorphic 270 nm thick GaP is successfully grown by metalorganic chemical vapour deposition on a 400 nm Si0.85Ge0.15/Si(001) heterosystem, but carries a 0.08% tensile strain after cooling down to room temperature due to the bigger thermal expansion coefficient of GaP with respect to Si. Transmission electron microscopy (TEM) studies confirm the absence of misfit dislocations in the pseudomorphic GaP film but growth defects (e.g., stacking faults, microtwins, etc.) especially at the GaP/SiGe interface region are detected. We interpret these growth defects as a residue of the initial 3D island coalescence phase o...

To develop a III/V wide bandgap collector concept for future SiGe heterobipolar transistor performance increase, a heterostructure growth study of GaP on pseudomorphic 4° off-oriented Si0.8Ge0.2/Si(001) substrates was performed. For pseudomorphic GaP/Si0.8Ge0.2/Si(001) heterostructure growth, critical thickness of GaP on Si and maximum thermal budget for GaP deposition were evaluated. A detailed structure and defect characterization study by x-ray diffraction, atomic force microscopy, and transmission electron microscopy is reported on single crystalline 170 nm GaP/20 nm Si0.8Ge0.2/Si(001). Results show that 20 nm Si0.8Ge0.2/Si(001) can be overgrown by 170 nm GaP without affecting the pseudomorphism of the Si0.8Ge0.2/Si(001) layer. The GaP layer grows however partially relaxed, mainly due to defect nucleation at the GaP/Si0.8Ge0.2 interface during initial island coalescence. The achievement of 2D GaP growth conditions on Si0.8Ge0.2/Si(001) systems is thus a crucial step for achieving fully pseudomorphic h...

Employing electronic transitions in the conduction band of semiconductor heterostructures paves a way to integrate a light source into silicon-based technology. To date all electroluminescence demonstrations of Si-based heterostructures have been p-type using hole-hole transitions. In the pathway of realizing an n-type Ge/SiGe terahertz quantum cascade laser, we present electroluminescence measurements of quantum cascade structures with top diffraction gratings. The devices for surface emission have been fabricated out of a 4-well quantum cascade laser design with 30 periods. An optical signal was observed with a maximum between 8-9 meV and full width at half maximum of roughly 4 meV.