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1. Characterisation of polystyrene coatings after plasma immersion ion implantation and adsorption of protein

8. The mechanical response of glassy carbon recovered from high pressure.

18. Graphitization of Glassy Carbon after Compression at Room Temperature

23. Pulsed external magnetic fields increase the deposition rate in reactive HiPIMS while preserving stoichiometry: An application to amorphous HfO2.

24. Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization.

25. Reaction paths of phosphine dissociation on silicon (001).

26. The shear-driven transformation mechanism from glassy carbon to hexagonal diamond

30. Graphitization of Glassy Carbon after Compression at Room Temperature

32. Microstructural investigation supporting an abrupt stress induced transformation in amorphous carbon films.

33. Oriented graphite layer formation in Ti/C and TiC/C multilayers deposited by high current pulsed cathodic arc.

34. Single P and As dopants in the Si(001) surface.

35. Amorphous and crystalline phases in thermal quench simulations of alumina.

36. Effects of layer patterns on magnetic and other properties of single and multilayered Fe–C films.

37. The microstructure and stability of Al/AlN multilayered films.

38. All particle simulations of cathodic arc plasmas.

39. Effect of intrinsic stress on preferred orientation in AlN thin films.

40. Relation between microstructure and stress in titanium nitride films grown by plasma immersion ion implantation.

41. Ab initio study of structure in boron nitride, aluminum nitride and mixed aluminum boron nitride amorphous alloys.

42. Composition, residual stress, and structural properties of thin tungsten nitride films deposited by reactive magnetron sputtering.

43. Metal ion implantation using a filtered cathodic vacuum arc.

48. Depth Resolved Structural and Compositional Characterization of Ion-Implanted Polystyrene that Enables Direct Covalent Immobilization of Biomolecules

49. Properties of TiN films deposited at low temperature in a new plasma-based deposition system.

50. Effect of ion energy on the optical and structural properties of SiO2 grown by plasma-enhanced chemical-vapor deposition.

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