Composition, residual stress, and structural properties of thin tungsten nitride films deposited by reactive magnetron sputtering.

Authors :: Shen, Y. G.
Mai, Y. W.
McKenzie, D. R.
Zhang, Q. C.
McFall, W. D.
McBride, W. E.
Source :: Journal of Applied Physics; 8/1/2000, Vol. 88 Issue 3, p1380, 9p, 2 Black and White Photographs, 7 Graphs
Publication Year :: 2000
Abstract: Reports that thin tungsten nitride films were produced by reactive dc magnetron sputtering of tungsten in an Ar-N2 gas mixture. Effects of the variation of nitrogen partial pressure on the composition, residual stress and structural properties of the thin films; Analysis of the films in situ by a cantilever beam technique.

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