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Properties of TiN films deposited at low temperature in a new plasma-based deposition system.
- Source :
-
Journal of Applied Physics . 12/1/1996, Vol. 80 Issue 11, p6279. 7p. 1 Diagram, 2 Charts, 6 Graphs. - Publication Year :
- 1996
-
Abstract
- Presents a study which examined the properties of titanium nitride films deposited at low temperature in a plasma-based chemical vapor deposition system. Application of stoichiometry in deposition techniques; Advantages of the configuration; Optical properties of the thin films.
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 80
- Issue :
- 11
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7658840
- Full Text :
- https://doi.org/10.1063/1.363704