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1. In situcharacterization of residues formed on a plasma-etching chamber

Author

Miyuki Yamane, Hiroyuki Kitsunai, Hiroki Kawada, and Shinichi Suzuki

Subjects
inorganic chemicals, Plasma etching, Chemistry, technology, industry, and agriculture, Analytical chemistry, Infrared spectroscopy, chemistry.chemical_element, Surfaces and Interfaces, respiratory system, Condensed Matter Physics, Mass spectrometry, complex mixtures, Electron cyclotron resonance, Surfaces, Coatings and Films, Reactive-ion etching, Spectroscopy, Boron, Quartz
Abstract

The chemical reaction of residues formed on a quartz surface in an electron cyclotron resonance plasma during the etching of Al and resist film by Cl2 and BCl3 plasma was characterized in situ by infrared reflection absorption (IRA) spectroscopy and quadrupole mass spectrometry (QMS). The plasma was generated in a chamber with a structure similar to a conventional production machine. Incident ions and molecules impacting onto a quartz surface at the chamber wall were analyzed by QMS. Then the residue formed on a quartz film on a sample mounted on the chamber wall was analyzed by IRA spectroscopy. The residue was identified as B2O3 which is formed by incident boron chloride ions that diffuse down through the B2O3 residue to the quartz surface and, there, thermally react with OH in the quartz. The residue film produced on the quartz surface could be identified by etching a 1-μm-thick Al film ten times at the etching rate of 12 nm/s. This combination of IRA and QMS is a promising technique for refining on-li...

Published
2001

2. [Untitled]

Author

Michiru NISHIWAKI, Akihiro YAMAMOTO, Shigeki KATO, Yusuke SUETSUGU, Susumu KATO, Hirohisa TAKAHASHI, Tatsuo ASAMAKI, Mina YAGIHARA, Takashi ADACHI, Takao SEKI, Akio ABE, Hiroto KURIYAMA, Takato HIRAYAMA, Ichiro ARAKAWA, Teronobu MIYAZAKI, Naoto KIKUCHI, Yoshihiro SAWAHIRA, Eiji KUSANO, Hidehito NANTO, Akira KINBARA, Makoto MATSUI, Yukio INOKUTI, Kazuhiro SUZUKI, Michimasa KIKUCHI, Toshiyuki HIGASHINO, Katsuto TANAHASHI, Jiro OSAKA, Yuichi KAWAMURA, Naohisa INOUE, Yoshikazu HOMMA, Kunio TAKAYANAGI, Masahiro HIRATA, Nobuhiko OTA, Shinji SHINABE, Yuto FUKUMA, Yoshiro SHIOKAWA, Masakazu ICHIKAWA, Ken-ichi KANAZAWA, Hiromi HISAMATSU, Masayuki SHIMAMOTO, Masayuki SATO, Mitsuru SHIRAI, Osamu KONNO, Yuuki WATANABE, Shinichi KOBAYASHI, Yoshio SAITO, Kentarou SEKIKAWA, Kiyomitsu ASANO, Hiroki ASARI, Hideharu MATSUSHIMA, Hiroshi MIMA, Kazutugu MURAKAMI, Atushi KAWAHARA, Toshio MASUOKA, Soichi OGAWA, Shigemi SUGINUMA, S.S. HONG, K.H. CHUNG, Kouichi HAMADA, Masaki HESAKA, Hiroki KURISU, Setuo YAMAMOTO, Mituru MATSUURA, Yasunori YANAGISAWA, Akira KASAHARA, Masatoshi TOSA, Young-Sung Kim, Kazuhiro YOSHIHARA, Yuden TERAOKA, Akitaka YOSHIGOE, Mutsumi SANO, Hiroko KAJI, Kiminori KAKITANI, Yoichiro YAGI, Akio YOSHIMORI, Hiroshi TSUJI, Hitoshi SASAKI, Hiroko SATO, Yasuhito GOTOH, Junzo ISHIKAWA, Shunsuke KIDO, Michiko YOSHITAKE, Yarrama-Reddy APARNA, Hiroaki TANAKA, Kimio OKUNO, Minoru NAGAI, Masahiko TOMITORI, Kaoru ABE, Takayuki TSUGUEDA, Kazuya SAITO, Masamichi MATSUURA, Toshiyuki OHYA, Hiroyuki NAGAHAMA, Tetsuo SHIMOMURA, Seiichiroh YOKOYAMA, Masahiko MITSUHASHI, Seishiro OHYA, Kotaro SHINOHARA, Ichiro SENBA, Kunio OKIMURA, Tomohiro ARAKAWA, Hideaki TAKEZAWA, Tadashi NAKAMURA, Chikanori INO, Yasuhiro ARAKI, Yasuhiro IGASAKI, Nobuo SAITO, Isamu NAKAAKI, Hiromu IWATA, Sigeaki NAKAMURA, Shoji YOSHIOKA, Tomuo YAMAGUCHI, Ryuta AI, Kiyotaka WASA, Yoshiki MORIKAWA, Tetsuya NISHIGUCHI, Masaharu MIYAMOTO, Shingo ICHIMURA, Hidehiko NONAKA, Masakuni KAWADA, Hiroshi MURAKAMI, Hideo HASEGAWA, Ayako HIOKI, Kazuki NATSUKAWA, Shinichi NISHIZAWA, Kazuo MACHIDA, Akiko N. ITAKURA, Tetsuya NARUSHIMA, Masahiro KITAJIMA, Ruediger BERGER, Christoph GERBER, James K. GIMZEWSKI, Tetsu MIENO, Hiroaki ITO, Hiroki KAWADA, Miyuki YAMANE, Hiroyuki KITSUNAI, Nobuo TSUMAKI, Manabu YAMASHITA, Shinichi SUZUKI, Yoshitaka NAITOH, Yoshifumi OHSHIMA, Hiroyuki HIRAYAMA, Ken-ichi TANAKA, Masamichi IKAI, Shigehiko YAMAMOTO, Toru KANAJI, Takashi MORII, Masatomo NISHIURA, Makoto TANAKA, Yukio Yasuda, Hiroya Ikeda, Shigeaki Zaima, Yasuo KIMURA, Daisei SHOJI, Masanori SHINOHARA, Michio NIWANO, Takeshi KITAHARA, Hideki TANAKA, Hiroyuki WAKIMOTO, Goro MIZUTANI, Sukekatsu USHIODA, Koichiro MITSUKE, Makoto SAKURAI, Sin-ichi IGARASHI, Aki TOSAKA, Daisuke IGUCHI, Tomomi HIRAOKA, Shinjiro YAGYU, Takahiro KONDO, Toshiyuki IKEUCHI, Da-ling Lu, Takayoshi SAITOH, Suguru SAIKI, Kazuhiro FUKUSHIMA, Shigeru MIZUNO, Shin-ichiro TAGUCHI, Hideki SATO, Masao SASAKI, Makoto SATO, Yukito NAKAGAWA, K.Hassan Bhuiyan, Hideaki Inoue, Yoshikazu TAKAHASHI, Yoshihiro IKEDA, Masato KIUCHI, Takaomi MATSUTANI, Takae TAKEUCHI, Takashi MATSUMOTO, Kazuhiko MIMOTO, and Seiichi GOTO

Subjects
Electrical and Electronic Engineering, Condensed Matter Physics, Surfaces, Coatings and Films
Published
2000

3. In Situ Analysis of Incident Ions on Chamber Surface in Electron Cyclotron Resonance Etching

Author

Hiroki Kawada, Hiroyuki Kitsunai, Miyuki Yamane, Manabu Yamashita, Shinichi Suzuki, and Nobuo Tsumaki

Subjects
Materials science, Etching (microfabrication), In situ analysis, Analytical chemistry, Electrical and Electronic Engineering, Reactive-ion etching, Atomic physics, Condensed Matter Physics, Ion cyclotron resonance, Electron cyclotron resonance, Surfaces, Coatings and Films, Ion
Published
2000

4. [Untitled]

Author

Satoshi KUROKOUCHI, Masayuki OKABE, Mitsuyoshi SAITO, Shinsaku MORITA, Yoshiro SHIOKAWA, Masakazu ICHIKAWA, Seiichiro KANNO, Tatehito USUI, Koichi SUDOH, Tatsuo YOSHINOBU, Hiroshi IWASAKI, Hiroaki TANAKA, Kimio OKUNO, Tadao MIURA, Touru SUMIYA, Katsuya HONDA, Shun-ichiro TANAKA, Yukio INOKUTI, Kazuhiro SUZUKI, Nastuki TAKAHASHI, Osamu OHKUBO, Yoshihiro SAWAHIRA, Akishige SATO, Naoto KIKUCHI, Eiji KUSANO, Hidehito NANTO, Akira KINBARA, Tetsuya NARUSHIMA, Akiko ITAKURA, Takaya KAWABE, Masahiro KITAJIMA, Masaru KITAGAWA, Toshiyuki OHYA, Hiroyuki NAGAHAMA, Sei-ichiroh YOKOYAMA, Ichiro ARAKAWA, Takashi ADACHI, Takato HIRAYAMA, Koichiro MITSUKE, Makoto SAKURAI, Sin-ichi IGARASHI, Yukiko ABE, Yasuo IRIE, Miyuki KAMBE, Aki TOSAKA, Satoko HAMAMATSU, Satoshi ISHII, Yoshiyuki NORIMITSU, Toshimi SUTOU, Noriyuki UBUKATA, Yoshihiro OINUMA, Shigeru SAITO, Masaaki KATOH, Kenichi TAJIMA, Daisuke HORIMOTO, Takeo OHTE, Akira KOJIMA, Seiya OHI, Takashi SHIOYA, Kazuhiko KOBAYASHI, Hidefumi NAKAJIMA, Satoshi YOKOYAMA, Hiroyuki OBARA, Hajime SAKAI, Yasuhiro OGOSHI, Takuro KOIKE, Koichiro UCHIMURA, Hitoshi TABATA, Tomoji KAWAI, Yutaka HIBINO, Guochun XU, Yasuo SUZUKI, Masao TANIHARA, Yukio IMANISHI, Shigemi SUGINUMA, Masahiro HIRATA, Hitoshi AKIMICHI, Kyoko TAKEUCHI, Yutaka TUZI, Masahiro TOSA, Akira KASAHARA, Kyung Sub LEE, Kazuhiro YOSHIHARA, Tomonari TANAKA, Tadashi SAWADA, Wataru SUGIYAMA, Koyu OTA, Daisuke YAMAUCHI, Shinobu SATO, Masatoshi TANAKA, Masaaki KISHIDA, Masahiko TOMITORI, Kiyotaka ASAKURA, Wang-Jae CHUN, Yasuhiro IWASAWA, Kiminori KAKITANI, Hiroko KAJI, Yoichiro YAGI, Akio YOSHIMORI, Akio OKAMOTO, Toshikazu NOSAKA, Masaaki YOSHITAKE, Souichi OGAWA, Shigeaki NAKAMURA, Nobuo SAITO, Shoji YOSHIOKA, Isamu NAKAAKI, Hideo HASEGAWA, Toshiyuki MIHARA, Shoichi MOCHIZUKI, Shigeharu TAMURA, Hironori KOBAYASHI, Ryoji MAKABE, Tadashi ISHIDA, Yoshiyuki SATO, Masanori ANDO, Tetsuhiko KOBAYASHI, Ayako HIOKI, Kazuki NATSUKAWA, Koji INOUE, Yoshikazu NAKAYAMA, Takayuki SATO, Shinichiro MICHIZONO, Yoshio SAITO, Shinichi KOBAYASHI, Kiyohide KOKUBUN, Yuuki WATANABE, Heizo TOKUTAKA, Kikuo FUJIMURA, Tatsuo SHIMIZU, Yasushiro NISHIOKA, Hideki TANAKA, Hiroyuki WAKIMOTO, Toshihiko MIYAZAKI, Goro MIZUTANI, Sukekatsu USHIODA, Yoshitake YAMAGUCHI, Satoru TAKAKUSAGI, Makoto KATO, Yuji SAKAI, Akira KUROKAWA, Shingo ICHIMURA, Ken NAKAMURA, Takanori AOKI, Syogo TODA, Akio SUZUKI, Tatsuhiko MATSUSHITA, Masahiro OKUDA, Kazuaki HAMAJI, Yoshiharu KAKEHI, Tsutom YOTSUYA, Norihiro MATSUOKA, Yoshitsugu TSUTSUMI, Hideki TOMIOKA, Yoshio OKAMOTO, Kensuke MURAI, Masato YASUMOTO, Norimasa UMESAKI, Hirohiko NAKANO, Toshiaki TATSUTA, Jiro MATSUO, Isao YAMADA, Hiroyuki MAGARA, Osamu TABATA, Touichi HATANO, Masatoshi KOTERA, Kiyoshi YAMAGUCHI, Naohiro HORII, Kunio OKIMURA, Akira SHIBATA, Hiroshi MURAKAMI, Ikuya KAMEYAMA, Satoru SUKENOBU, Kazuhiko MIMOTO, Takashi MATSUMOTO, Takafumi YOSHIKAWA, Masato KIUCHI, Seiichi GOTO, Masatoshi OHBA, Yoshiaki AGAWA, Kazuma SHIBUTANI, Hiroshi TSUJI, Yasuhito GOTOH, Junzo ISHIKAWA, Hiroki KAWADA, Hiroyuki KITSUNAI, Nobuo TSUMAKI, Masanori KATSUYAMA, Shinichi SUZUKI, Katsuto TANAHASHI, Yuichi KAWAMURA, Naohisa INOUE, Yoshikazu HOMMA, Michimasa KIKUCHI, Kazumasa ISHIKAWA, Teiichi HOMMA, Yoshinori SUGANUMA, Nan LI, Katsuyoshi KOBAYASHI, Nobuyoshi SAKAKIBARA, Yoshiki UENO, Masayuki AOKI, Toshiaki YASUI, Keito MORIMOTO, Hirokazu TAHARA, Takao YOSHIKAWA, Hidekazu KODERA, Masahiko UOTA, Yoshihiro SATOH, Tomio KUBO, Kozo MOCHIJI, Naoshi ITABASHI, Hiroshi SHIMIZU, Shunsuke OHTANI, Kazuhiko OKUNO, and Nobuo KOBAYASHI

Subjects
Electrical and Electronic Engineering, Condensed Matter Physics, Surfaces, Coatings and Films
Published
1999

6. [Untitled]

Author

Michio MINATO, Yoshio ITOH, Shingo ICHIMURA, Kiyohide KOKUBUN, Masahiro HIRATA, Sonoko TSUKAHARA, Kazuya SAITO, Yoshinao IKEDA, Yoshio SAITO, Kowashi WATANABE, Hiroshi SAEKI, Mitsuhiro MASAKI, Yasuaki SUZUKI, Yukiko TANIUCHI, Takashi NODA, Michio MAENO, Suck Hee BE, Haruo OHKUMA, Masahiro TOSA, Akira KASAHARA, Kazuhiro YOSHIHARA, Seiichiro KANNO, Hiroyuki KITSUNAI, Nobuo TSUMAKI, Masaaki NAKAYAMA, Hitoshi NISHIMURA, Kenji SHIRAI, Shinichi KOBAYASHI, Norio OGIWARA, Keiichi OHIRA, Takayuki SATO, Shinichiro MICHIZONO, Shigemi SUGINUMA, Migaku TAKAHASHI, Akio OKAMOTO, Toshikazu NOSAKA, Masaaki YOSHITAKE, Souichi OGAWA, Kazuhiko KOBAYASHI, Masatoshi NOGUCHI, Hidefumi NAKAJIMA, Hiroyuki OBARA, Hajime SAKAI, Yasuhiro OGOSHI, Takuro KOIKE, Hideo HASEGAWA, Yukio INOKUTI, Kazuhiro SUZUKI, Osamu OHKUBO, Natsuki TAKAHASHI, Masayuki TERAI, Norichika HASEGAWA, Masahiko OKUZAWA, Chuhei OSHIMA, Shigeki OTANI, Kenji ODAKA, Osamu SATOH, Yoshiro SHIOKAWA, Masakazu ICHIKAWA, Kenya AKAISHI, Kazuhiro EZAKI, Yusuke KUBOTA, Osamu MOTOJIMA, Masakatsu KITANI, Akira KUROKAWA, Hiroko KAJI, Kiminori KAKITANI, Yoichiro YAGI, Akio YOSHIMORI, Takanori AOKI, Shogo TODA, Kazuaki HAMAJI, Akio SUZUKI, Tatsuhiko MATSUSHITA, Masahiro OKUDA, Daisuke TANAKA, Takeshi FUJIWARA, Mituaki MAEDA, Nobuhiko TAKEHARA, Mitsutaka HIKIDA, Yasuhiro IGASAKI, Akishige SATO, Masaru KITAGAWA, Yasunobu KURODA, Eiji KUSANO, Akira KINBARA, Taizo KAWAUCHI, Katsuyuki FUKUTANI, Tatsuo OKANO, Shunji KISHIMOTO, Xiaowei ZHANG, Toyosei KAWASAKI, Daisuke SAKAI, Hiroshi ITOH, Takeo ICHINOKAWA, Toshuu AN, Hiroshi KUBO, Yasuhito GOTOH, Hiroshi TSUJI, Junzo ISHIKAWA, Youiti YAMAMOTO, Toshiaki MIYOKAWA, Nobuaki TAMURA, Tadao MIURA, Touru SUMIYA, Haruko FUJINUMA, Shun-ichiro TANAKA, Hiroyuki YOSHIKI, Teruhiko TSUTSUI, Tetsu OKAMOTO, Seiichi WATANABE, Yukio OKAMOTO, Hiroki KAWADA, Kaoru IJIMA, Seigi MIZUNO, Saburo SHIMIZU, Koh FUWA, Seiji SEKI, Kazunobu HAYAKAWA, Heizo TOKUTAKA, Kazuyuki IWAMOTO, Kikuo FUJIMURA, Toru WATANABE, Satoru KISHIDA, Ken NAKAMURA, Yoshiyuki IGARI, Shinji ISHIDZUKA, Tetsuroh MINE, Tsuyoshi TAKAOKA, Tomohide TAKAMI, Isao KUSUNOKI, Akira HAYAMA, Kazuyoshi IMOTO, Takato HIRAYAMA, Ichiro ARAKAWA, Takashi ADACHI, Koichiro MITSUKE, Makoto SAKURAI, Takashi MOMOSE, Eishuu HAYASAKA, Katsuhiro SAITOU, Katsuya NAGAYAMA, Sin'ya ABE, Kunio OKIMURA, Naoki YASUMARU, Yukiko ABE, Sin-ichi IGARASHI, Yasuo IRIE, Katsumi SUZUKI, Eiji ROKUTA, Tomohiro HAYASHI, Atsushi ITO, Toshio SAKURAI, Masuaki MATSUMOTO, Natsuo TATSUMI, Tadashi ITOYAMA, and Masaomi UMEZAWA

Subjects
Electrical and Electronic Engineering, Condensed Matter Physics, Surfaces, Coatings and Films
Published
1998

7. Development of A Wafer Transportation Apparatus for Ultra-High Vacuums

Author

Nobuo Tsumaki, Hiroyuki Kitsunai, and Seiichiro Kanno

Subjects
Coupling, Materials science, business.industry, Stiffness, Condensed Matter Physics, Inductive coupling, Surfaces, Coatings and Films, Outgassing, Optics, Magnet, medicine, Torque, Wafer, Development (differential geometry), Electrical and Electronic Engineering, medicine.symptom, business
Abstract

A wafer transportation apparatus with an advanced rotary magnetic coupling system for ultra-high vacuums has been developed. In this magnetic coupling system, the gap between the magnets and the yokes can be reduced to less than 1 mm, which enables a much larger coupling force than that of conventional systems.The apparatus has been evaluated. After a series of experiments, we found the following : 1) The rotational stiffness is more than 4.3 Nm/deg and the maximum rotational torque is more than 7.6 Nm.2) The positioning accuracy (±3δ) is ±0.048 deg in the circumferential direction and ±0.04 mm in extension and retraction.3) The outgassing rate from the wafer transportation apparatus is 6×10-8 Pam3/s after baking (120°C, 48 hr.).

Published
1998

8. Transitions of microscopic wear mode of silicon carbide coatings by chemical vapor deposition during repeated sliding observed in a scanning electron microscope tribosystem

Author

Hiroyuki Kitsunai and Kazuo Hokkirigawa

Subjects
Friction coefficient, Materials science, Scanning electron microscope, Metallurgy, Fracture mechanics, Surfaces and Interfaces, Chemical vapor deposition, Tribology, Condensed Matter Physics, Surfaces, Coatings and Films, Wear resistance, chemistry.chemical_compound, chemistry, Mechanics of Materials, Materials Chemistry, Silicon carbide, Sliding wear
Abstract

The purpose of this investigation is to analyze microscopic wear mechanisms of silicon carbide coatings by chemical vapor deposition (CVD). For this purpose, the wear processes during one hundred sliding cycles were observed successively in a scanning electron microscope (SEM) tribosystem. The results were compared with those of uncoated silicon carbide. The following results were obtained. (1) Wear modes are classified into four, they are ploughing, powder formation, crack formation and flake formation. These wear modes except for ploughing are mainly caused by surface crack propagation. (2) Silicon carbide coatings showed higher wear resistance than uncoated silicon carbide, because there are less initial surface cracks in the silicon carbide coatings. (3) The condition for wear mode transition can be explained theoretically by using the parameters of severity of contact, Sc, Sc, S*c, and the friction coefficient μ, where Sc=Pmax(Rmax)1/2/K1c and Sc*=Hv(Rmax)1/2/K1c.

Published
1995

10. In Situ Infrared Reflection Absorption Spectroscopy of Materials Formed on SiO2 in Inductively Coupled Plasma Etching Chamber

Author

Hiroki Kawada, Nobuo Tsumaki, and Hiroyuki Kitsunai

Subjects
Plasma etching, Absorption spectroscopy, Renewable Energy, Sustainability and the Environment, Chemistry, Analytical chemistry, Infrared spectroscopy, Condensed Matter Physics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Etching (microfabrication), Materials Chemistry, Electrochemistry, Reactive-ion etching, Inductively coupled plasma, Thin film, Spectroscopy
Abstract

In situ infrared reflection absorption (IRA) spectroscopy was used to investigate materials formed on SiO 2 film coated on samples mounted on the inner surface of a process chamber for inductively coupled plasma etching. Aluminum wafers partially covered with photoresist film were etched using BCl 3 and Cl 2 plasma generated in a quartz chamber surrounded by a radio frequency (rf) coil. RF bias was applied to the aluminum wafers at the same time. This is the first time that, in order to predict the IRA spectra, the reflectivities of various inorganic multiple layers formed on metal substrates have been calculated using the optical constants of the materials. The experimental spectra for SiO 2 film and for the materials formed on it during a 2 μm deep etching process were well characterized by the calculated spectra of SiO 2 film and a B 2 O 3 layer on it, respectively.

Published
1999

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