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Newly Designed Electrostatic Wafer Chuck Resulting in Less Particle Contamination on Back Side of Wafers

Authors :
Nobuo Tsumaki
Hiroyuki Kitsunai
Tadashi Otaka
Azusa Simamura
Source :
SHINKU. 41:139-142
Publication Year :
1998
Publisher :
The Vacuum Society of Japan, 1998.

Subjects

Subjects :
Particle contamination
Materials science
business.industry
Optoelectronics
Wafer
Electrical and Electronic Engineering
Condensed Matter Physics
business
Surfaces, Coatings and Films

Details

ISSN :
18809413 and 05598516
Volume :
41
Database :
OpenAIRE
Journal :
SHINKU
Accession number :
edsair.doi...........fbd6ec5d8ed4df4cdf935f6dc7f6afc3

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