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6. Recovery and characterization of Neptune's near-polar stratospheric hot spot

11. New combination of damage control techniques using SEN's single-wafer implanters

12. Advanced yield-growth method: MIND+ (plus) system

17. Non-Uniform Dose Mapping Controlled by Modulated Vertical and Horizontal Scans

24. 55nm gate CMOS technology using sub-keV ion implantation without through surface oxide

36. Relationship between degradation of wood and production of H2O2-producing or one-electron oxidases by brown-rot fungi

38. The effect of recoiled oxygen on the annealing properties of Si surface layer implanted with As through SiO 2films

42. SCC (Surrounded Capacitor Cell) Structure for DRAM

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