71 results on '"Crouse, Michael"'
Search Results
2. ArFi speckle reduction and impact on local CDU
3. Affordable optical proximity correction runtime for EUV curvilinear mask tape-out flow
4. Physical dose modeling and throughput optimization in EUV computational lithography
5. A holistic approach to model-based stochastic-aware computational lithography
6. Y-12 NCS Program Health Model: Development, Use and Benefits
7. A novel solution on KrF pixel layer with thick photo resist (PR) by single exposure multi-focal imaging (MFI) technique
8. Y-12 Nuclear Criticality Safety Program Health Model: Development, Use and Benefits
9. Physical dose modeling and throughput optimization in EUV computational lithography
10. A holistic approach to model-based stochastic-aware computational lithography
11. Full chip computational lithography for KrF multi-focal imaging (MFI) (Conference Presentation)
12. Design and numerical modeling of normal-oriented quantum wire infrared photodetector array
13. Broadband Antireflecting Conductive Metamaterial Films
14. A Data-Driven Approach to Localization for High Frequency Wireless Mobile Networks
15. Millimeter-Wave Field Experiments with Many Antenna Configurations for Indoor Multipath Environments
16. A Survey of Phosphorus and Nitrogen Levels in Treated Municipal Wastewater
17. A Structured Deep Neural Network for Data Driven Localization in High Frequency Wireless Networks
18. Design intent optimization at the beyond 7nm node: the intersection of DTCO and EUVL stochastic mitigation techniques
19. Nested Buddy System: A New Block Address Allocation Scheme for ISPs and IaaS Providers
20. Vehicle-Solar-Grid Integration: Concept and Construction
21. Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs
22. A holistic approach to model-based stochastic-aware computational lithography.
23. Physical dose modeling and throughput optimization in EUV computational lithography.
24. Probabilistic Performance Analysis of Moving Target and Deception Reconnaissance Defenses
25. Taming Wireless Fluctuations by Predictive Queuing Using a Sparse-Coding Link-State Model
26. A holistic methodology to drive process window entitlement and its application to 20nm logic
27. Analysis of network address shuffling as a moving target defense
28. Lens heating challenges for negative tone develop layers with freeform illumination: a comparative study of experimental vs. simulated results
29. Design intent optimization at the beyond 7nm node: the intersection of DTCO and EUVL stochastic mitigation techniques
30. Bio-Inspired Enterprise Security
31. A moving target environment for computer configurations using Genetic Algorithms
32. Using swarming agents for scalable security in large network environments
33. PN junction fabrication of solar cells and integration with metamaterials
34. Towards manufacturing of advanced logic devices by double-patterning
35. Improved model predictability by machine data in computational lithography and application to laser bandwidth tuning
36. Engine for characterization of defects, overlay, and critical dimension control for double exposure processes for advanced logic nodes
37. Electrochemical fabrication of cadmium telluride quantum dots using porous anodized aluminum on a silicon substrate
38. Fabrication, characterization of II-VI semiconductor nanowires and applications in infrared focal plane arrays
39. Separable OPC models for computational lithography
40. Enabling 35nm double patterning contact imaging using a novel CD shrink process
41. The use of EUV lithography to produce demonstration devices
42. Experimental demonstration of dark field illumination using contact hole features
43. Design and fabrication of novel II-IV semiconductor quantum wire infrared detectors/sensors
44. Nanoporous Alumina Template with In Situ Barrier Oxide Removal, Synthesized from a Multilayer Thin Film Precursor
45. Colorprint U.S.A.
46. Engine for characterization of defects, overlay, and critical dimension control for double exposure processes for advanced logic nodes.
47. Improved model predictability by machine data in computational lithography and application to laser bandwidth tuning.
48. A novel solution on KrF pixel layer with thick photo resist (PR) by single exposure multi-focal imaging (SE MFI) technique.
49. Separable OPC models for computational lithography.
50. Silicon containing polymer in applications for 193 nm high NA lithography processes.
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