26 results on '"Anne Delobbe"'
Search Results
2. Nanoscale multiply charged focused ion beam platform for surface modification, implantation, and analysis
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Mathieu Lalande, Pierre Salou, Arnaud Houel, Thierry Been, Thierry Birou, Charles Bourin, Amine Cassimi, Arthur Keizer, Jean-Baptiste Mellier, Jean-Marc Ramillon, Anthony Sineau, Anne Delobbe, Stéphane Guillous, Centre de recherche sur les Ions, les MAtériaux et la Photonique (CIMAP - UMR 6252), Université de Caen Normandie (UNICAEN), Normandie Université (NU)-Normandie Université (NU)-École Nationale Supérieure d'Ingénieurs de Caen (ENSICAEN), Normandie Université (NU)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Institut de Recherche sur les Matériaux Avancés (IRMA), Normandie Université (NU)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université de Rouen Normandie (UNIROUEN), Normandie Université (NU)-Institut national des sciences appliquées Rouen Normandie (INSA Rouen Normandie), Institut National des Sciences Appliquées (INSA)-Normandie Université (NU)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université de Rouen Normandie (UNIROUEN), Institut National des Sciences Appliquées (INSA)-Normandie Université (NU)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS), Matériaux, Défauts et IRradiations (MADIR), Institut National des Sciences Appliquées (INSA)-Normandie Université (NU)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS)-Université de Caen Normandie (UNICAEN), and Orsay Physics
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[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] ,[PHYS.PHYS.PHYS-INS-DET]Physics [physics]/Physics [physics]/Instrumentation and Detectors [physics.ins-det] ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,Instrumentation - Abstract
International audience; The PELIICAEN (Platform for the Study of Ion Implantation Controlled and Analyzed at the Nanometric Scale) setup is a unique device, both for all of its in situ ultra-high vacuum equipment (focused ion beams (FIB) column, Secondary Electron Microscope (SEM), Atomic Force and Scanning Tunnelling Microscope (AFM/STM)), and for its nanostructuration performances on material. The setup has been recently equipped with its own electron cyclotron resonance ion sources, a new position-controlled platform using pneumatic vibration insulators and a fast pulsing device. Its performances were then deeply improved, providing access to a large choice of ions, an adjustable ion implantation depth up to few hundreds of nanometres, an image resolution down to 25 nm and an ion beam size on sample down to 100 nm. With all these equipment, the PELIICAEN setup is in the international foreground to perform and analyse ion implantation and surface modification.
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- 2022
3. A New Generation Plasma FIB Column with Higher Probe Current and Improved Imaging Resolution
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Olivier Salord, Lukáš Hladík, Anne Delobbe, Dušan Nešpor, Zsolt Radi, Tomáš Hrnčíř, and Jaroslav Jiruše
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Materials science ,Optics ,business.industry ,Resolution (electron density) ,Plasma ,Current (fluid) ,business ,Instrumentation ,Column (database) - Published
- 2020
4. Deterministic three-dimensional self-assembly of Si through a rimless and topology-preserving dewetting regime
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Meher Naffouti, Marco Salvalaglio, Thomas David, Jean-Benoît Claude, Monica Bollani, Axel Voigt, Abdelmalek Benkouider, Luc Favre, Antoine Ronda, Isabelle Berbezier, Anne Delobbe, Arnaud Houel, Marco Abbarchi
- Abstract
Capillary-driven mass transport in solids is typically understood in terms of surface-diffusion limited kinetics, leading to conventional solid-state dewetting of thin films. However, another mass transport mechanism, so-called surface-attachment and detachment limited kinetics, is possible. It can shrink a solid film, preserving its original topology without breaking it in isolated islands, and leads to faster dynamics for smaller film curvature in contrast with the opposite behavior observed for surface-diffusion limited kinetics. In this work, we present a rimless dewetting regime for Si, which is ascribed to effective attachment-limited kinetics mediated by the coexistence of crystalline and amorphous Si phases. Phase-field numerical simulations quantitatively reproduce the experimental observations, assessing the main mass transport mechanism at play. The process can be exploited to obtain in a deterministic fashion monocrystalline islands (with 95% probability) pinned at ≈500 nm from a hole milled within closed patches.
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- 2019
5. Deterministic three-dimensional self-assembly of Si through a rimless and topology-preserving dewetting regime
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Thomas David, Monica Bollani, Axel Voigt, Isabelle Berbezier, Marco Salvalaglio, Arnaud Houel, Antoine Ronda, Luc Favre, Anne Delobbe, Meher Naffouti, Jean-Benoît Claude, Abdelmalek Benkouider, and Marco Abbarchi
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Work (thermodynamics) ,Materials science ,Phase Field Analysis ,Physics and Astronomy (miscellaneous) ,SiGe ,Kinetics ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Curvature ,Topology ,01 natural sciences ,SALK ,Amorphous solid ,Monocrystalline silicon ,0103 physical sciences ,dewetting ,General Materials Science ,Dewetting ,Thin film ,010306 general physics ,0210 nano-technology ,Topology (chemistry) - Abstract
Capillary-driven mass transport in solids is typically understood in terms of surface-diffusion limited kinetics, leading to conventional solid-state dewetting of thin films. However, another mass transport mechanism, so-called surface-attachment/detachment limited kinetics, is possible. It can shrink a solid film, preserving its original topology without breaking it in isolated islands, and leads to faster dynamics for smaller film curvature in contrast with the opposite behavior observed for surface-diffusion limited kinetics. In this work, we present a rimless dewetting regime for Si, which is ascribed to effective attachment-limited kinetics mediated by the coexistence of crystalline and amorphous Si phases. Phase-field numerical simulations quantitatively reproduce the experimental observations, assessing the main mass transport mechanism at play. The process can be exploited to obtain in a deterministic fashion monocrystalline islands (with $95%$ probability) pinned at $\ensuremath{\approx}500$ nm from a hole milled within closed patches.
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- 2019
6. When Ion or Electron Channeling Meets Crystal Orientation Mapping
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Anne Delobbe, Sophie Cazottes, Thierry Douillard, Clément Lafond, Sébastien Dubail, Jérémie Silvent, Cyril Langlois, Centre Eugène Marquis (CRLCC), Matériaux, ingénierie et science [Villeurbanne] (MATEIS), Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Institut National des Sciences Appliquées de Lyon (INSA Lyon), Université de Lyon-Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS), Axon Square SAS, and Orsay Physics (ZAC Saint Charles)
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010302 applied physics ,Materials science ,Crystal orientation ,02 engineering and technology ,Electron ,021001 nanoscience & nanotechnology ,01 natural sciences ,Molecular physics ,Ion ,[SPI]Engineering Sciences [physics] ,0103 physical sciences ,0210 nano-technology ,Instrumentation ,ComputingMilieux_MISCELLANEOUS - Abstract
International audience
- Published
- 2019
7. 'Angular resolution expected from iCHORD orientation maps through a revisited ion channeling model'
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Anne Delobbe, Sophie Cazottes, Thierry Douillard, Cyril Langlois, Sébastien Dubail, Jérémie Silvent, Clément Lafond, Philippe Steyer, Matériaux, ingénierie et science [Villeurbanne] (MATEIS), Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Institut National des Sciences Appliquées de Lyon (INSA Lyon), Université de Lyon-Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS), Axon Square SAS, and Orsay Physics (ZAC Saint Charles)
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Diffraction ,Materials science ,Microscope ,02 engineering and technology ,Electron ,01 natural sciences ,Focused ion beam ,Secondary electrons ,law.invention ,[SPI.MAT]Engineering Sciences [physics]/Materials ,Optics ,law ,0103 physical sciences ,[CHIM.CRIS]Chemical Sciences/Cristallography ,Angular resolution ,Instrumentation ,010302 applied physics ,Orientation (computer vision) ,business.industry ,021001 nanoscience & nanotechnology ,Atomic and Molecular Physics, and Optics ,Electronic, Optical and Magnetic Materials ,Characterization (materials science) ,[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] ,0210 nano-technology ,business - Abstract
International audience; Crystalline orientation maps are obtained in a Focused Ion Beam (FIB) microscope using the ion CHanneling ORientation Determination (iCHORD) method, which relies on the channeling phenomenon observed in ion-induced secondary electron images. The current paper focuses on the angular resolution that can be expected from such orientation maps, obtained using a revisited ion channeling model. A specific procedure was developed to evaluate the angular resolution, based on the distribution of orientation errors when evaluating controlled sample disorientation. The main advantage is that no external reference is required. An angular resolution of 1° is obtained on a nickel based sample using standard acquisition conditions. This value fulfills most of the needs in terms of microstructural characterization usually carried out by Electron Back Scattered Diffraction.
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- 2019
8. Picosecond laser micromachining prior to FIB milling for electronic microscopy sample preparation
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V. Goubier, Antoine Corbin, L. Fares, A. Sikora, Thierry Sarnet, Marc Sentis, Anne Delobbe, Jérôme Adrian, Laboratoire Lasers, Plasmas et Procédés photoniques (LP3), Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU), and Aix Marseille Université (AMU)-Centre National de la Recherche Scientifique (CNRS)
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Materials science ,Silicon ,General Physics and Astronomy ,Polishing ,chemistry.chemical_element ,02 engineering and technology ,Engraving ,01 natural sciences ,Fluence ,Focused ion beam ,Optics ,[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph] ,0103 physical sciences ,ComputingMilieux_MISCELLANEOUS ,010302 applied physics ,[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics] ,Laser ablation ,business.industry ,Surfaces and Interfaces ,General Chemistry ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Surfaces, Coatings and Films ,Surface micromachining ,chemistry ,visual_art ,visual_art.visual_art_medium ,[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] ,Ion milling machine ,0210 nano-technology ,business - Abstract
In order to check the manufacturing quality of electronic components using electron microscopy, the area of interest must be exposed. This requires the removal of a large quantity of matter without damaging the surrounding area. This step can be accomplished using ion milling but the processing can last a few hours. In order to accelerate the preparation of the samples, picosecond laser micromachining prior to Focused Ion Beam polishing is envisioned. Laser ablation allows the fast removal of matter but induces damages around the ablated area. Therefore the process has to be optimized in order to limit the size of both the heat affected zone and induced dislocation zone. For this purpose, cavities have been engraved in silicon and in electronic components, using a linearly polarized picosecond laser (∼50 ps) at three different wavelengths (343, 515 and 1030 nm). Results showed that the cross sectional shapes and the surface topologies can be tuned by the laser fluence and the number of pulses. Clear cross sections of bumps and cavity openings, exposing multilayer interfaces, are demonstrated. The silicon removal rates, tuned by the applied energy density, have been measured. Removal rates achieved at 200 kHz were typically hundred times higher than those achieved by ion milling and the best efficiency was obtained at 343 nm.
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- 2017
9. All-Dielectric Color Filters Using SiGe-Based Mie Resonator Arrays
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Thomas David, Jean-Benoît Claude, Thomas E. Wood, Marco Abbarchi, Isabelle Berbezier, Luc Favre, Meher Naffouti, Johann Berthelot, Antoine Ronda, Anne Delobbe, Leo Metayer, Nicolas Bonod, Imperial College London, Institut des Matériaux, de Microélectronique et des Nanosciences de Provence ( IM2NP ), Aix Marseille Université ( AMU ) -Université de Toulon ( UTLN ) -Centre National de la Recherche Scientifique ( CNRS ), Laboratoire Interdisciplinaire Carnot de Bourgogne ( LICB ), Université de Bourgogne ( UB ) -Centre National de la Recherche Scientifique ( CNRS ), Laboratoire de physique de la matière condensée et nanostructures, Université de Lille, Sciences Humaines et Sociales, CLARTE ( CLARTE ), Institut FRESNEL ( FRESNEL ), Aix Marseille Université ( AMU ) -Ecole Centrale de Marseille ( ECM ) -Centre National de la Recherche Scientifique ( CNRS ) -Aix Marseille Université ( AMU ) -Ecole Centrale de Marseille ( ECM ) -Centre National de la Recherche Scientifique ( CNRS ), Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU), Laboratoire Interdisciplinaire Carnot de Bourgogne (LICB), Université de Bourgogne (UB)-Centre National de la Recherche Scientifique (CNRS), Orsay Physics, CLARTE (CLARTE), Institut FRESNEL (FRESNEL), Centre National de la Recherche Scientifique (CNRS)-École Centrale de Marseille (ECM)-Aix Marseille Université (AMU)-Centre National de la Recherche Scientifique (CNRS)-École Centrale de Marseille (ECM)-Aix Marseille Université (AMU), Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS), Laboratoire Interdisciplinaire Carnot de Bourgogne (ICB), and Aix Marseille Université (AMU)-École Centrale de Marseille (ECM)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU)-École Centrale de Marseille (ECM)-Centre National de la Recherche Scientifique (CNRS)
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Materials science ,Fabrication ,surface functionalisation ,Nanotechnology ,02 engineering and technology ,Dielectric ,01 natural sciences ,010309 optics ,Resonator ,0103 physical sciences ,Microelectronics ,Dewetting ,Electrical and Electronic Engineering ,Nanoscopic scale ,business.industry ,021001 nanoscience & nanotechnology ,Atomic and Molecular Physics, and Optics ,Electronic, Optical and Magnetic Materials ,Finite Difference – Time Domain simulations ,colour-filters ,SiGe alloys ,[SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic ,Optoelectronics ,Surface modification ,Color filter array ,Mie resonator ,[ SPI.OPTI ] Engineering Sciences [physics]/Optics / Photonic ,0210 nano-technology ,business ,solid-state dewetting ,Biotechnology - Abstract
International audience; Dielectric Mie resonators have attracted a great deal of attention over the past few years thanks to their remarkable capabilities in manipulating light propagation at the nanoscale. However, the practical implementation of technological products is still elusive. One of the important limits is the absence of a high-performing material and a fabrication method that can be easily integrated into modern microelectronic devices at affordable costs. Here, we provide theoretical and experimental evidence of an alternative semiconductor material, SiGe alloys, for dielectric Mie resonator applications. As a material compatible with the processing requirements of the semiconductor industry, it possesses comparable optical properties to its conventional Si-based counterpart at visible frequencies in spite of its higher optical losses. These dielectric resonant 18 particles can be obtained over very large surfaces on arbitrary silica substrates via spontaneous solid state dewetting of ultrathin (
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- 2017
10. Templated Solid-State Dewetting of Thin Silicon Films
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Isabelle Berbezier, Abdelmalek Benkouider, Antoine Ronda, Luc Favre, Marco Abbarchi, Anne Delobbe, Thomas David, Meher Naffouti, Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS), and Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU)
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Materials science ,Fabrication ,Silicon ,Nucleation ,Silicon on insulator ,chemistry.chemical_element ,Nanotechnology ,02 engineering and technology ,General Chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,Biomaterials ,Nanocrystal ,chemistry ,Quantum dot ,0103 physical sciences ,General Materials Science ,Dewetting ,Thin film ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,010306 general physics ,0210 nano-technology ,Biotechnology - Abstract
International audience; Thin film dewetting can be efficiently exploited for the implementation of functionalized surfaces over very large scales. Although the formation of sub-micrometer sized crystals via solid-state dewetting represents a viable method for the fabrication of quantum dots and optical meta-surfaces, there are several limitations related to the intrinsic features of dewetting in a crystalline medium. Disordered spatial organization, size, and shape fluctuations are relevant issues not properly addressed so far. This study reports on the deterministic nucleation and precise positioning of Si-and SiGe-based nanocrystals by templated solid-state dewetting of thin silicon films. The dewetting dynamics is guided by pattern size and shape taking full control over number, size, shape, and relative position of the particles (islands dimensions and relative distances are in the hundreds nm range and fluctuate approximate to 11% for the volumes and approximate to 5% for the positioning).
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- 2016
11. Technical Refinement of the Orage Ga-FIB column and Optimizing its Control for Routine Analytical Tasks
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Miroslav Rudolf, Mikuláš Kocman, Jean-Baptiste Mellier, Tomáš Hrnčíř, Laurent Alcaraz, and Anne Delobbe
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010302 applied physics ,Materials science ,business.industry ,0103 physical sciences ,02 engineering and technology ,021001 nanoscience & nanotechnology ,0210 nano-technology ,Process engineering ,business ,01 natural sciences ,Instrumentation ,Column (database) - Published
- 2018
12. Electroless selective deposition of gold nano-array for silicon nanowires growth
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Cyril Herrier, Abdelmalek Benkouider, Antoine Ronda, P. Sudraud, A. Gouyé, Anne Delobbe, Isabelle Berbezier, and E. Ruiz-Gomes
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Materials science ,Nanostructure ,Silicon ,Science ,Nanowire ,silicon ,chemistry.chemical_element ,Nanotechnology ,gold ,Focused ion beam ,nanowires ,chemistry ,nanostructures ,Nano ,Galvanic cell ,lithography ,Silicon nanowires ,galvanic displacement ,Lithography ,fib patterning - Abstract
Nanopatterns of gold clusters on a large surface of oriented Si(111) substrates, from the galvanic displacement of gold salt (via the spontaneous reduction of AuCl4 -), are demonstrated in this work. The Si substrate is patterned by Focused Ion Beam (FIB) prior to being dipped in a gold solution. Here, we show that these patterns lead to successful control of the position and size of gold clusters. Sequential patterning reveals a powerful maskless alternative to surface preparation prior to Si nanowire growth.
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- 2013
13. Maskless and targeted creation of arrays of colour centres in diamond using focused ion beam technology
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Sébastien Pezzagna, Patrick Happel, Jan Meijer, Olivier Salord, Bernard Rasser, Alexandre Tallaire, Piernicola Spinicelli, Pierre Sudraud, Vincent Jacques, Anne Delobbe, Jean-François Roch, and Margarita Lesik
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Physics ,Ion beam ,business.industry ,Scanning electron microscope ,Diamond ,Surfaces and Interfaces ,engineering.material ,Condensed Matter Physics ,Focused ion beam ,Electron cyclotron resonance ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Materials Chemistry ,engineering ,Optoelectronics ,Electrical and Electronic Engineering ,business ,Beam (structure) ,Electron-beam lithography ,Photonic crystal - Abstract
The creation of nitrogen-vacancy centres in diamond is nowadays well controlled using nitrogen implantation and annealing. Although the high-resolution placement of NV centres has been demonstrated using either collimation through pierced AFM tips or masks with apertures made by electron beam lithography, a targeted implantation into pre-defined structures in diamond may not be achieved using these techniques. We show that a beam of nitrogen ions can be focused to approximately 100 nm using focused ion beam (FIB) technology. The nitrogen ion beam is produced using an electron cyclotron resonance (ECR) plasma source. Combined with a scanning electron microscope, the nitrogen-FIB offers new possibilities for the targeted creation of single defects in diamond. This maskless technology is suitable for example for the creation of optical centres in the cavities of photonic crystals or in diamond tips for scanning magnetometry. Finally, we further show that by changing the gas source from nitrogen to xenon, standard FIB milling capabilities are also available within the same tool.
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- 2013
14. Ordered arrays of Au catalysts by FIB assisted heterogeneous dewetting
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Luc Favre, Marco Abbarchi, J. Osmond, P. Sudraud, Thomas David, Meher Naffouti, Isabelle Berbezier, Abdelmalek Benkouider, Anne Delobbe, Antoine Ronda, Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS), Institut de Ciencies Fotoniques [Castelldefels] (ICFO), Orsay Physics (ZAC Saint Charles), Institut des Matériaux, de Microélectronique et des Nanosciences de Provence ( IM2NP ), Aix Marseille Université ( AMU ) -Université de Toulon ( UTLN ) -Centre National de la Recherche Scientifique ( CNRS ), Institut de Ciencies Fotoniques [Castelldefels] ( ICFO ), Orsay Physics ( ZAC Saint Charles ), and Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU)
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Materials science ,Fabrication ,business.industry ,Annealing (metallurgy) ,Mechanical Engineering ,Nucleation ,Nanowire ,Bioengineering ,General Chemistry ,Activation energy ,Nanomaterial-based catalyst ,Semiconductor ,Mechanics of Materials ,Chemical physics ,General Materials Science ,Dewetting ,Electrical and Electronic Engineering ,[PHYS.COND]Physics [physics]/Condensed Matter [cond-mat] ,business ,[ PHYS.COND ] Physics [physics]/Condensed Matter [cond-mat] - Abstract
International audience; Synthesizing Au 0.8 Si 0.2 nanocatalysts that are homogeneous in size and have controlled position is becoming a challenging and crucial prequisite for the fabrication of ordered semiconductor nanowires. In this study, Au 0.8 Si 0.2 nanocatalysts are synthesized via dewetting of Au layers on Si(111) during thermal annealing in an ultra-high vacuum. In the first part of the paper, the mechanism of homogeneous dewetting is analyzed as a function of the Au-deposited thickness ( h Au ). We distinguish three different dewetting regimes: (I) for a low thickness ( ##IMG## [http://ej.iop.org/images/0957-4484/26/50/505602/nano514960ieqn1.gif] \h_\\rmAu\\leqslant 0.4\\;\\mathrmnm\ ), a submonolyer coverage of Au is stabilized and there is no dewetting. (II) For an intermediate thickness ( ##IMG## [http://ej.iop.org/images/0957-4484/26/50/505602/nano514960ieqn2.gif] \0.4\\;\\mathrmnm\\lt h_\\mathrmAu\\leqslant 5\\;\\mathrmnm\ ), there is both dewetting and Au 0.8 Si 0.2 phase formation. The size and density of the Au 0.8 Si 0.2 clusters are directly related to h Au . When cooling down to room temperature, the clusters decompose and reject the Si at the Au/Si substrate interface. (III) For a large thickness ( ##IMG## [http://ej.iop.org/images/0957-4484/26/50/505602/nano514960ieqn3.gif] \h_\\rmAu\\gt 5\\;\\mathrmnm\ ), only dewetting takes place, without forming AuSi clusters. In this regime, the dewetting is kinetically controlled by the self-diffusion of Au (activation energy ∼0.43 eV) without evidence of an Si-alloying effect. As a practical consequence, when relying solely on the homogeneous dewetting of Au/Si(111) to form the Au 0.8 Si 0.2 catalysts (without a supply of Si atoms from vapor), regime II should be used to obtain good size and density control. In the second part of the paper, a process for ordering the catalysts using focused ion beam-(FIB) assisted dewetting (heterogeneous dewetting) is developed. We show that no matter what the FIB milling conditions and the Au nominal thickness are, dewetting is promoted by ion beam irradiation and is accompanied by the formation of Au 0.8 Si 0.2 droplets. The droplets preferentially form on the patterned areas, while in similar annealing conditions, they do not form on the unpatterned areas. This behavior is attributed to the larger Au-Si interdiffusion in the patterned areas, which results from the Si amorphization induced by the FIB. A systematic analysis of the position of the nanodroplets shows their preferential nucleation inside the patterns, while thicker platelets of almost pure Au are observed between the patterns. The evolutions of the size homogeneity and the occupancy rate of the patterns are quantified as a function of the FIB dose and annealing temperature. Nice arrays of perfectly ordered AuSi catalysts are obtained after optimizing the FIB and dewetting conditions.
- Published
- 2015
15. Andromede project: Surface analysis and modification with probes from hydrogen to nano-particles in the MeV energy range
- Author
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X. Donzel, Elodie Verzeroli, Benoit Agnus, Michael J. Eller, Gabriel Gaubert, Serge Della-Negra, Anne Delobbe, Bernard Rasser, E. Cottereau, Institut de Physique Nucléaire d'Orsay (IPNO), Université Paris-Sud - Paris 11 (UP11)-Institut National de Physique Nucléaire et de Physique des Particules du CNRS (IN2P3)-Centre National de la Recherche Scientifique (CNRS), Orsay Physics (ZAC Saint Charles), PANTECHNIK S.A., and Pantechnik
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010302 applied physics ,Nuclear and High Energy Physics ,Ion beam analysis ,Ion beam ,Chemistry ,Liquid metal ion source ,[PHYS.NEXP]Physics [physics]/Nuclear Experiment [nucl-ex] ,Ion gun ,7. Clean energy ,01 natural sciences ,Ion source ,law.invention ,Secondary ion mass spectrometry ,Ion beam deposition ,law ,0103 physical sciences ,Van de Graaff generator ,Physics::Accelerator Physics ,Atomic physics ,010306 general physics ,Instrumentation - Abstract
International audience; The Andromede project is the center of a multi-disciplinary team which will build a new instrument for surface modification and analysis using the impact of probes from hydrogen to nano-particles (Au400+4) in the MeV range. For this new instrument a series of atomic, polyatomic, molecular and nano-particle ion beams will be delivered using two ion sources in tandem, a liquid metal ion source and an electron cyclotron resonance source. The delivered ion beams will be accelerated to high energy with a 4 MeV van de Graaff type accelerator. By using a suite of probes in the MeV energy range, ion beam analysis techniques, MeV atomic and cluster secondary ion mass spectrometry can all be performed in one location. A key feature of the instrument is its ability to produce an intense beam for injection into the accelerator. The commissioning of the two sources shows that intense beams from atomic ions to nano-particles can be delivered for subsequent acceleration. The calculations and measurements for the two sources are presented.
- Published
- 2014
16. Selective growth and ordering of SiGe nanowires for band gap engineering
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David J. Lockwood, Abdelmalek Benkouider, Nelson Rowell, Luc Favre, Cyril Herrier, Isabelle Berbezier, Anne Delobbe, A. Gouyé, P. Sudraud, Antoine Ronda, Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU), Measurement Science and Standards [Ottawa], National Research Council of Canada (NRC), Orsay Physics (ZAC Saint Charles), Institut des Matériaux, de Microélectronique et des Nanosciences de Provence ( IM2NP ), Aix Marseille Université ( AMU ) -Université de Toulon ( UTLN ) -Centre National de la Recherche Scientifique ( CNRS ), Measurement Science and Standards, National Research Council of Canada ( NRC ), Orsay Physics ( ZAC Saint Charles ), and Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)
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Materials science ,Aqueous solution ,Mechanical Engineering ,Nanowire ,Nucleation ,Bioengineering ,Nanotechnology ,General Chemistry ,Substrate (electronics) ,nanowires (NWs) ,7. Clean energy ,Focused ion beam ,molecular beam epitaxy (MBE) ,Catalysis ,Mechanics of Materials ,Band-gap engineering ,photoluminescence ,General Materials Science ,Electrical and Electronic Engineering ,[PHYS.COND]Physics [physics]/Condensed Matter [cond-mat] ,Luminescence ,[ PHYS.COND ] Physics [physics]/Condensed Matter [cond-mat] ,ordering ,selective growth ,focused ion beam (FIB) patterning - Abstract
Selective growth and self-organization of silicon-germanium (SiGe) nanowires (NWs) on focused ion beam (FIB) patterned Si(111) substrates is reported. In its first step, the process involves the selective synthesis of Au catalysts in SiO2-free areas; its second step involves the preferential nucleation and growth of SiGe NWs on the catalysts. The selective synthesis process is based on a simple, room-temperature reduction of gold salts (Au3+Cl?/4 ) in aqueous solution, which provides well-organized Au catalysts. By optimizing the reduction process, we are able to generate a bidimensional regular array of Au catalysts with self-limited sizes positioned in SiO2 -free windows opened in a SiO /Si2 (111) substrate by FIB patterning. Such Au catalysts subsequently serve as preferential nucleation and growth sites of well-organized NWs. Furthermore, these NWs with tunable position and size exhibit the relevant features and bright luminescence that would find several applications in optoelectronic nanodevices.
- Published
- 2014
17. Structural study of a thermally diffused Al/Ni bilayer via x-ray absorption spectroscopy and x-ray photoelectron spectroscopy
- Author
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France Chevrier, Anne Delobbe, Agnés Traverse, and Didier Zanghi
- Subjects
Crystallography ,X-ray absorption spectroscopy ,Materials science ,Absorption spectroscopy ,X-ray photoelectron spectroscopy ,Annealing (metallurgy) ,Bilayer ,Analytical chemistry ,Intermetallic ,General Physics and Astronomy ,Thermal treatment ,Thin film - Abstract
Ni thin films deposited on (111) Al thick samples have been submitted to annealing treatment. The goal is to identify the phases formed in the early stage of mixing between Ni and Al. Combining complementary techniques such as x-ray absorption spectroscopy and x-ray photoelectron spectroscopy, we characterized two different systems depending on the temperature conditions. For a thermal treatment at 110 °C, a system formed of small AlNi3 clusters embedded in the Al matrix was identified. This was interpreted as due to the existence of a spontaneous Al/Ni interface mixed layer acting as a seed for the AlNi3 cluster formation. After annealing at 300 °C, the Al3Ni intermetallic compound was detected, in agreement with results in the literature.
- Published
- 2001
18. Nanocrystals: Templated Solid-State Dewetting of Thin Silicon Films (Small 44/2016)
- Author
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Abdelmalek Benkouider, Marco Abbarchi, Thomas David, Isabelle Berbezier, Luc Favre, Meher Naffouti, Antoine Ronda, and Anne Delobbe
- Subjects
Materials science ,Silicon ,Solid-state ,chemistry.chemical_element ,Silicon on insulator ,Nanotechnology ,02 engineering and technology ,General Chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,010309 optics ,Biomaterials ,Nanocrystal ,chemistry ,0103 physical sciences ,General Materials Science ,Dewetting ,0210 nano-technology ,Biotechnology - Published
- 2016
19. Ultimate nanopatterning of Si substrate using filtered liquid metal alloy ion source-focused ion beam
- Author
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Abdelmalek Benkouider, P. Sudraud, Anne Delobbe, Isabelle Berbezier, E. Ruiz Gomes, I.C. Marcus, Antoine Ronda, I. Alonso, Luc Favre, Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS), Institut de Ciència de Materials de Barcelona (ICMAB), Consejo Superior de Investigaciones Científicas [Madrid] (CSIC), Orsay Physics (ZAC Saint Charles), Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU), Institut des Matériaux, de Microélectronique et des Nanosciences de Provence ( IM2NP ), Aix Marseille Université ( AMU ) -Université de Toulon ( UTLN ) -Centre National de la Recherche Scientifique ( CNRS ), Institut de Ciència de Materials de Barcelona ( ICMAB ), Consejo Superior de Investigaciones Científicas [Spain] ( CSIC ), and Orsay Physics ( ZAC Saint Charles )
- Subjects
Materials science ,Ion beam ,Ion beam mixing ,Nanotechnology ,02 engineering and technology ,01 natural sciences ,Focused ion beam ,Ion ,Ion beam deposition ,0103 physical sciences ,Materials Chemistry ,[PHYS.COND]Physics [physics]/Condensed Matter [cond-mat] ,Milling ,LMAIS-FIB ,010302 applied physics ,business.industry ,Metals and Alloys ,Nanopatterning ,Surfaces and Interfaces ,021001 nanoscience & nanotechnology ,Isotropic etching ,Ion source ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Nanostructures ,Optoelectronics ,Ion milling machine ,0210 nano-technology ,business ,[ PHYS.COND ] Physics [physics]/Condensed Matter [cond-mat] - Abstract
International audience; Abstract In this work we study the influence of the major focused ion beam operating parameters: ion chemical species, beam current, lens voltage and ion dose on the ultimate nanopatterning resolution. We propose a two-step process based on first ion milling of a SiO2 sacrificial layer and second SiO2 chemical etching for the fabrication of nanopatterns with ultimate size/density and ad libitum shape. Examples of resulting patterns are presented.
- Published
- 2013
20. Engineered core-shell Si1−xGex/Ge nanowires fabricated by focused ion beam and oxido-reduction
- Author
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Anne Delobbe, Isabelle Berbezier, Luc Favre, Mansour Aouassa, P. Sudraud, Antoine Ronda, Institut des Matériaux, de Microélectronique et des Nanosciences de Provence ( IM2NP ), Aix Marseille Université ( AMU ) -Université de Toulon ( UTLN ) -Centre National de la Recherche Scientifique ( CNRS ), Orsay Physics ( ZAC Saint Charles ), Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU), Orsay Physics (ZAC Saint Charles), and Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)
- Subjects
Materials science ,Ion beam ,business.industry ,Condensation ,Nanowire ,General Physics and Astronomy ,chemistry.chemical_element ,Germanium ,Nanotechnology ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,Focused ion beam ,Aspect ratio (image) ,0104 chemical sciences ,Ion ,Nanolithography ,chemistry ,Optoelectronics ,[PHYS.COND]Physics [physics]/Condensed Matter [cond-mat] ,0210 nano-technology ,business ,[ PHYS.COND ] Physics [physics]/Condensed Matter [cond-mat] - Abstract
International audience; We demonstrate that perfectly reproducible and homogeneous core-shell Si1−xGex/Ge nanowires can be produced by a two step nanofabrication process. The process makes use of a combination of Liquid Metal Alloy Ion Source–Focused Ion Beam (LMAIS-FIB) nanomilling and condensation. In a first step, we fabricate arrays of SiGe wires by LMAIS-FIB milling of fully relaxed Si1−xGex pseudo-substrates. The use of Ge2+ ions during this step avoids any metallic contamination of the nanowires. In a second step, we both reduce the diameter of the wires and form the core-shell configuration by oxido-reduction of the wires. Large arrays of core-shell nanowires with extended aspect ratio (length over diameter), small diameters and ultra-thin shell thickness are fabricated. Multilayer core-shell configurations with tunable arrangements could also be produced by repeated condensation cycles.
- Published
- 2013
21. Design of free patterns of nanocrystals with ad hoc features via templated dewetting
- Author
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Luc Favre, Isabelle Berbezier, P. Sudraud, Antoine Ronda, Mansour Aouassa, Monica Bollani, Roman Sordan, Anne Delobbe, Institut des Matériaux, de Microélectronique et des Nanosciences de Provence ( IM2NP ), Aix Marseille Université ( AMU ) -Université de Toulon ( UTLN ) -Centre National de la Recherche Scientifique ( CNRS ), Politecn Milan, LNESS Dipartimento Fis, I-22100 Como, Italy, Orsay Physics ( ZAC Saint Charles ), Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS), Orsay Physics (ZAC Saint Charles), and Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU)
- Subjects
010302 applied physics ,Materials science ,Nanostructure ,Physics and Astronomy (miscellaneous) ,Nanotechnology ,02 engineering and technology ,Liquid metal ion source ,021001 nanoscience & nanotechnology ,01 natural sciences ,Focused ion beam ,Monocrystalline silicon ,Nanolithography ,Nanoelectronics ,0103 physical sciences ,Dewetting ,Thin film ,[PHYS.COND]Physics [physics]/Condensed Matter [cond-mat] ,0210 nano-technology ,[ PHYS.COND ] Physics [physics]/Condensed Matter [cond-mat] - Abstract
International audience; Design of monodisperse ultra-small nanocrystals (NCs) into large scale patterns with ad hoc features is demonstrated. The process makes use of solid state dewetting of a thin film templated through alloy liquid metal ion source focused ion beam (LMIS-FIB) nanopatterning. The solid state dewetting initiated at the edges of the patterns controllably creates the ordering of NCs with ad hoc placement and periodicity. The NC size is tuned by varying the nominal thickness of the film while their position results from the association of film retraction from the edges of the lay out and Rayleigh-like instability. The use of ultra-high resolution LMIS-FIB enables to produce monocrystalline NCs with size, periodicity, and placement tunable as well. It provides routes for the free design of nanostructures for generic applications in nanoelectronics.
- Published
- 2012
22. High Speed TEM Sample Preparation by Xe FIB
- Author
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P. Sudraud, Anne Delobbe, Tomas Hrncir, Olivier Salord, A. David, and Filip Lopour
- Subjects
Materials science ,Analytical chemistry ,Sample preparation ,Instrumentation - Published
- 2014
23. Study by X-ray absorption spectroscopy of Si3N4 films after Cu or Fe implantation and thermal treatment
- Author
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Anne Delobbe, Agnès Traverse, T. Girardeau, A.-M. Flank, and Didier Zanghi
- Subjects
Nuclear and High Energy Physics ,X-ray absorption spectroscopy ,Radiation ,Materials science ,Thin layers ,K-edge ,Absorption spectroscopy ,Sputtering ,Shell (structure) ,Analytical chemistry ,Thermal treatment ,Instrumentation ,Amorphous solid - Abstract
Si3N4 amorphous thin layers prepared by sputtering have been implanted either with Cu or with Fe ions. X-ray absorption spectroscopy was performed at the Si K edge to characterise the electronic empty states of p character, the structural state of the initial layers and the modifications around Si induced by implantation and a post-annealing treatment. We show that the energy deposition process mainly leads to a reorganisation of the second coordination shell around Si, i.e. concerns the Si-Si bonds.
- Published
- 2001
24. Atomic surrounding of Co implanted in AlN at high energy
- Author
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Mario Rentería, Anne Delobbe, Marc Gailhanou, Agnès Traverse, and Didier Zanghi
- Subjects
Nuclear and High Energy Physics ,Materials science ,Ciencias Físicas ,Analytical chemistry ,chemistry.chemical_element ,Ion ,purl.org/becyt/ford/1 [https] ,COBALT ,ion implantation ,Ceramic ,Instrumentation ,Ciencias Exactas ,AlN ,Radiation ,Extended X-ray absorption fine structure ,Física ,purl.org/becyt/ford/1.3 [https] ,cobalt ,Fluorescence ,Crystallography ,Ion implantation ,chemistry ,K-edge ,visual_art ,visual_art.visual_art_medium ,Absorption (chemistry) ,ION IMPLANTATION ,Cobalt ,ALN ,CIENCIAS NATURALES Y EXACTAS ,Física de los Materiales Condensados - Abstract
AlN bulk ceramic has been implanted with energetic Co ions. In order to accurately characterise the atomic surrounding of the implanted ions, X-ray absorption measurements were carried out at 80 K in the fluorescence mode at the Co K edge in the as-implanted and annealed states. Simulation of the EXAFS oscillations allowed us to identify a first stage where Co is inserted in the AlN matrix followed by a second stage where Co precipitates form., Facultad de Ciencias Exactas, Instituto de Física La Plata
- Published
- 2001
25. In-Plane Epitaxial Growth of Self-Assembled Ge Nanowires on Si Substrates Patterned by a Focused Ion Beam.
- Author
-
I. Carmen Marcus, Isabelle Berbezier, Antoine Ronda, M. Isabel Alonso, Miquel Garriga, Alejandro R. GonÌi, Elise Gomes, Luc Favre, Anne Delobbe, and Pierre Sudraud
- Published
- 2011
- Full Text
- View/download PDF
26. Magnetic measurements on micrometer-sized samples under high pressure using designed NV centers
- Author
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Margarita Lesik, Olivier Salord, Martin Schmidt, Justine Renaud, Paul Loubeyre, Loïc Rondin, Thomas Plisson, Anne Delobbe, Jean-François Roch, Loïc Toraille, Florent Occelli, and Thierry Debuisschert
- Subjects
Physics ,Superconductivity ,Multidisciplinary ,Condensed matter physics ,Condensed Matter - Mesoscale and Nanoscale Physics ,Magnetometer ,FOS: Physical sciences ,01 natural sciences ,Synchrotron ,Diamond anvil cell ,010305 fluids & plasmas ,law.invention ,Magnetization ,Condensed Matter::Materials Science ,Ferromagnetism ,law ,High pressure ,Condensed Matter::Superconductivity ,0103 physical sciences ,Mesoscale and Nanoscale Physics (cond-mat.mes-hall) ,010306 general physics ,Material properties - Abstract
Pressure is a unique tool to tune the interplay between structural, electronic and magnetic interactions. It leads to remarkable properties of materials such as recent temperature records in superconductivity. Advanced magnetic measurements under very high pressure in the Diamond Anvil Cell (DAC) use synchrotron approaches but these are lacking a formal link to the macroscopic magnetic properties. We report an alternative method consisting in optical magnetometry based on nitrogen-vacancy (NV) centers created at the surface of a diamond anvil. We illustrate the method by two measurements realized at room and low temperature respectively: the pressure evolution of the magnetization of an iron bead up to 30 GPa showing the iron ferromagnetic collapse and the detection of the superconducting transition of MgB2 at 7 GPa., 15 pages, 4 figures
- Full Text
- View/download PDF
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