Nanoscale multiply charged focused ion beam platform for surface modification, implantation, and analysis

International audience; The PELIICAEN (Platform for the Study of Ion Implantation Controlled and Analyzed at the Nanometric Scale) setup is a unique device, both for all of its in situ ultra-high vacuum equipment (focused ion beams (FIB) column, Secondary Electron Microscope (SEM), Atomic Force and Scanning Tunnelling Microscope (AFM/STM)), and for its nanostructuration performances on material. The setup has been recently equipped with its own electron cyclotron resonance ion sources, a new position-controlled platform using pneumatic vibration insulators and a fast pulsing device. Its performances were then deeply improved, providing access to a large choice of ions, an adjustable ion implantation depth up to few hundreds of nanometres, an image resolution down to 25 nm and an ion beam size on sample down to 100 nm. With all these equipment, the PELIICAEN setup is in the international foreground to perform and analyse ion implantation and surface modification.