301. Reliability of charge trapping memories with high-k control dielectrics (Invited Paper)
- Author
-
Molas, G., Bocquet, M., Vianello, E., Perniola, L., Grampeix, H., Colonna, J.P., Masarotto, L., Martin, F., Brianceau, P., Gély, M., Bongiorno, C., Lombardo, S., Pananakakis, G., Ghibaudo, G., and De Salvo, B.
- Subjects
- *
RELIABILITY in engineering , *COMPUTER storage devices , *DIELECTRIC devices , *ELECTRIC properties of metals , *CHARGE transfer , *HAFNIUM compounds , *SILICON crystals , *FLASH memory - Abstract
Abstract: In this paper, we evaluate the potentiality of high-k materials (Al2O3, HfO2 and HfAlO) for interpoly application in non-volatile memories. A study of the leakage currents of high-k based capacitors allowed to discuss the retention performances at room and high temperatures of high-k interpoly dielectrics. High-k materials are then integrated as control dielectrics in silicon nanocrystal and SONOS (Si/SiO2/Si3N4/SiO2/Si) memories. The role of the high-k layer on the memory performances is discussed; a particular attention being devoted to the retention characteristics. Analytical models, combined with experimental results obtained on various structures allowed to analyze the mechanisms involved during retention. [Copyright &y& Elsevier]
- Published
- 2009
- Full Text
- View/download PDF