282 results on '"Zelsmann, M."'
Search Results
102. Fluorinated mold treatment regeneration and low-reactivity resists in UV-nanoimprint lithography
103. Chemical degradation of fluorinated anti-sticking treatments in UV nanoimprint lithography
104. Double-anchoring fluorinated molecules for anti-adhesion mold treatment in UV nanoimprint lithography
105. Fabrication of nanoimprinted functionnalized photonic crystals
106. Dramatic light extraction enhancement by plasmon and exciton coupling in nanoimprinted photonic crystal polymer films
107. Losses compensation in metallic nanocomposite polymer by optical gain: application to nanoimprinted microcavities
108. Towards the fabrication of two-dimensional plasmonic metamaterials in the visible range by nanoimprint lithography
109. Comparison of monomer and polymer resists in thermal nanoimprint lithography
110. Plasma etching behaviour of photocured nanoimprint resists
111. On the degradation of anti-sticking layers during nanoimprint lithography
112. 2D and 3D polymer photonic devices fabricated by nanoimprint lithography
113. Nanoscale patterning using imprint lithographies
114. X-ray photoelectron spectroscopy analysis of fluorinated antisticking layers on nanoimprint lithography templates
115. Modification of spontaneous emission of (CdSe)ZnS nanocrystals embedded in nanoimprinted photonic crystals
116. Photo-polymerisation kinetic study of UV-NIL dedicated resists
117. Low viscosity UV-NIL material development
118. Enhanced light emission from nanoimprinted photonic crystals via surface plasmon
119. Photopolymerisation kinetic study of UV-NIL dedicated resists
120. Nanoimprinted photonic component for light extraction applications
121. Nanoimprint lithography for 3D surface nanostructuring and photonic devices
122. Improved release strategy for UV nanoimpreint lithography
123. Fabrication and characterisation of nanoimprinted band edge lasers
124. Structure and stability characterizations of anti-adhesion self-assembled monolayers formed by vapor deposition for NIL use
125. 3D nanofabrication by reverse contact UV nanoimprint lithography
126. Template flatness issue for UV curing Nanoimprint Lithography
127. Anti-sticking issues in step and repeat UV nanoimprint lithography process
128. Embedded nano channels fabricated by reverse contact UV nanoimprint lithography
129. UV curing Nanoimprint Lithography
130. Evaluation of an alternative mold fabrication process
131. Nanoimprint lithography for three-dimensional nanopatterning
132. Photoluminescence enhancement via nanoimprinted photonic crystals and coupled surface plasmons
133. Low-k epoxy silsesquioxane resists for UV nanoimprint lithography
134. Light extraction enhancement of nanoimprinted photonic crystals via coupled surface plasmons
135. Diffractive optical element for sensor applications, fabricated by reverse contact UV Nanoimprint Lithography
136. Reverse UV nanoimprint lithography technique for 3D nanofabrication
137. High resolution UV-Nanoimprinting using thin hard quartz moulds
138. High Resolution silica molds fabrication for UV-Nanoimprint
139. UV-NIL step & repeat technology assessment
140. Impact of the cycle time on the pattern filling and uniformity in thermal Nanoimprint lithography
141. Erbium doped photonic crystal micro-cavity for light extraction enhancement at 300K
142. Spontaneous emission of nanocrystals in nanoimprinted photonic structures
143. Fabrication of high density, large area conducting polymer nanostructures
144. UV-Nanoimprint process using home-developed resist and multi-scale molds
145. The impact of the cycle time on the pattern filling and uniformity in thermal Nanoimprint lithography
146. Enhancement of light extraction using a nanoimprinted photonic crystal with colloidal nanocrystals
147. High sensitive and etch-resistant material for UV-nanoimprint
148. High UV-sensitive and etch resistant material for UV-Nanoimprint
149. Toward a simple nanofabrication method of conductive polymers on large area: A combination of nanoimprint lithography and a copolymer strategy
150. 3D device-like structures fabricated by reversal UV-curing lithography
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