Search

Your search keyword '"Zelsmann, M."' showing total 282 results

Search Constraints

Start Over You searched for: Author "Zelsmann, M." Remove constraint Author: "Zelsmann, M."
282 results on '"Zelsmann, M."'

Search Results

101. Multi-scale lithography for fabricating extremely periodic micro/nano-droplets and concentric nano-rings by combining block copolymer self-assembly and nano-imprint lithography

102. Fluorinated mold treatment regeneration and low-reactivity resists in UV-nanoimprint lithography

103. Chemical degradation of fluorinated anti-sticking treatments in UV nanoimprint lithography

104. Double-anchoring fluorinated molecules for anti-adhesion mold treatment in UV nanoimprint lithography

105. Fabrication of nanoimprinted functionnalized photonic crystals

106. Dramatic light extraction enhancement by plasmon and exciton coupling in nanoimprinted photonic crystal polymer films

107. Losses compensation in metallic nanocomposite polymer by optical gain: application to nanoimprinted microcavities

108. Towards the fabrication of two-dimensional plasmonic metamaterials in the visible range by nanoimprint lithography

109. Comparison of monomer and polymer resists in thermal nanoimprint lithography

110. Plasma etching behaviour of photocured nanoimprint resists

111. On the degradation of anti-sticking layers during nanoimprint lithography

112. 2D and 3D polymer photonic devices fabricated by nanoimprint lithography

113. Nanoscale patterning using imprint lithographies

114. X-ray photoelectron spectroscopy analysis of fluorinated antisticking layers on nanoimprint lithography templates

115. Modification of spontaneous emission of (CdSe)ZnS nanocrystals embedded in nanoimprinted photonic crystals

116. Photo-polymerisation kinetic study of UV-NIL dedicated resists

117. Low viscosity UV-NIL material development

118. Enhanced light emission from nanoimprinted photonic crystals via surface plasmon

119. Photopolymerisation kinetic study of UV-NIL dedicated resists

120. Nanoimprinted photonic component for light extraction applications

121. Nanoimprint lithography for 3D surface nanostructuring and photonic devices

122. Improved release strategy for UV nanoimpreint lithography

123. Fabrication and characterisation of nanoimprinted band edge lasers

124. Structure and stability characterizations of anti-adhesion self-assembled monolayers formed by vapor deposition for NIL use

125. 3D nanofabrication by reverse contact UV nanoimprint lithography

126. Template flatness issue for UV curing Nanoimprint Lithography

127. Anti-sticking issues in step and repeat UV nanoimprint lithography process

128. Embedded nano channels fabricated by reverse contact UV nanoimprint lithography

129. UV curing Nanoimprint Lithography

130. Evaluation of an alternative mold fabrication process

131. Nanoimprint lithography for three-dimensional nanopatterning

132. Photoluminescence enhancement via nanoimprinted photonic crystals and coupled surface plasmons

133. Low-k epoxy silsesquioxane resists for UV nanoimprint lithography

134. Light extraction enhancement of nanoimprinted photonic crystals via coupled surface plasmons

135. Diffractive optical element for sensor applications, fabricated by reverse contact UV Nanoimprint Lithography

136. Reverse UV nanoimprint lithography technique for 3D nanofabrication

137. High resolution UV-Nanoimprinting using thin hard quartz moulds

138. High Resolution silica molds fabrication for UV-Nanoimprint

139. UV-NIL step & repeat technology assessment

140. Impact of the cycle time on the pattern filling and uniformity in thermal Nanoimprint lithography

141. Erbium doped photonic crystal micro-cavity for light extraction enhancement at 300K

142. Spontaneous emission of nanocrystals in nanoimprinted photonic structures

143. Fabrication of high density, large area conducting polymer nanostructures

144. UV-Nanoimprint process using home-developed resist and multi-scale molds

145. The impact of the cycle time on the pattern filling and uniformity in thermal Nanoimprint lithography

146. Enhancement of light extraction using a nanoimprinted photonic crystal with colloidal nanocrystals

147. High sensitive and etch-resistant material for UV-nanoimprint

148. High UV-sensitive and etch resistant material for UV-Nanoimprint

149. Toward a simple nanofabrication method of conductive polymers on large area: A combination of nanoimprint lithography and a copolymer strategy

150. 3D device-like structures fabricated by reversal UV-curing lithography

Catalog

Books, media, physical & digital resources