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51. A Very Robust and Reliable 2.7GHz +31dBm Si RFSOI Transistor for Power Amplifier Solutions

52. Corrélations des profils TEP au 18 F-FDG, IRM et clinico-biologiques des encéphalites dysimmunitaires

53. Synovialosarcome du pied : à propos d'un cas

55. Self-Heating Effect in FDSOI Transistors Down to Cryogenic Operation at 4.2 K

56. Ferroelectric HfO2 for Memory Applications: Impact of Si Doping Technique and Bias Pulse Engineering on Switching Performance

57. Impact of Passive & Active Load Gate Impedance on Breakdown Hardness in 28nm FDSOI Technology

58. Performance Improvement on HfO2-Based 1T Ferroelectric NVM by Electrical Preconditioning

59. Influence of Gate Length on pBTI in GaN-on-Si E-Mode MOSc-HEMT

60. Investigation of nBTI degradation on GaN-on-Si E-mode MOSc-HEMT

61. An investigation of the influence of thermal process on the electrical conductivity of LIFT printed Cu structures

62. Quantitative System Pharmacology (QSP): An Integrative Framework for paradigm change in the treatment of the first-episode schizophrenia

63. Development of X-ray Photoelectron Spectroscopy under bias and its application to determine band-energies and dipoles in the HKMG stack

64. Evaluation of Ferroelectricity in Si-implanted HfO2 along Cycling

65. Performance and Reliability of a Fully Integrated 3D Sequential Technology

66. Performance & reliability of 3D architectures (πfet, Finfet, Ωfet)

67. A new method for quickly evaluating reversible and permanent components of the BTI degradation

68. A novel insight of pBTI degradation in GaN-on-Si E-mode MOSc-HEMT

69. Extinction du lupus en dialyse

70. Reply

71. Full 300 mm electrical characterization of 3D integration using High Aspect Ratio (10:1) mid-process through silicon vias

72. Study of oxygen desorption from substituted perovskites: New possibilities through fast intermittent temperature-programmed desorption

73. Effect of elaboration parameters on ionic conductivity for PECVD fuel cell electrolyte

74. Study of Oxygen Desorption from SnO2: New Possibilities through Fast Intermittent Temperature-Programmed Desorption

75. Advanced Cu interconnects using air gaps

76. Aging of plasma-deposited carbon layers: effect of their thickness and material structure

77. Copper Decontamination Ability of Supercritical-CO2/Additives on CVD and Spin-On Porous MSQ Materials

78. Compositional changes between free coatings and surface coating layers during mechanochemical process

79. Characterisation of Pt/Ceria Catalysts by One-Pass TPD Analysis

80. Principe et technique de la tomographie par émission de positons (TEP)

81. Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film

82. Multimodal anatomic, functional, and metabolic brain imaging for tumor resection

83. [Untitled]

84. In situ monitoring of optical characteristics of pulsed picosecond laser-irradiated diamond-like carbon thin films using an optical parametric generator and amplifier

85. A disruptive technology for thermal to electrical energy conversion

86. Alteration of bacterial adhesion induced by the substrate stiffness

87. Intérêt de la tomographie à émission de positons au 18fluoro-déoxy-glucose dans la définition des champs de radiothérapie : exemple de la radiothérapie thoracique

88. PA—Precision Agriculture

89. Influence of the Surface Pressure on the Organization of Mixed Langmuir−Blodgett Films of Octadecylamine and Butyrylcholinesterase. 2. Film Transferred onto Silica Support

90. A Spectroscopic Technique for Studies of Water Transport Along the Interface and Hydrolytic Stability of Polymer/Substrate Systems

91. Natrémie, tonicité et conductivité plasmatique pendant la séance d’hémodialyse

92. Place de l'anatomie dans la cartographie fonctionnelle du cerveau

93. STI process steps for sub-quarter micron CMOS

94. Polysulfides in dimethylformamide: only the redox couples S−n/S2−n are involved

95. Physical and optical properties of an antireflective layer based on SiOxNy

96. Effect of plasma and thermal annealing on chemical vapor deposition dielectrics grown using SIH4–H2O2 gas mixtures

97. Polysulfides in dimethylformamide: Only the radical anions S3− and S4− are reducible

99. On the understanding of the reduction of sulfur (S8) in dimethylformamide (DMF)

100. Electrochemical and spectroelectrochemical study of the oxidation of S2−4 and S2−6 ions in liquid ammonia

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