664 results on '"F. Gaillard"'
Search Results
52. Corrélations des profils TEP au 18 F-FDG, IRM et clinico-biologiques des encéphalites dysimmunitaires
- Author
-
J. Boucraut, Laurent Boyer, B. Dufournet, E Kaphan, F. Gaillard Bigot, Eric Guedj, H. Bou Ali, J. Pelletier, V. Arnould, and Olivier Mundler
- Subjects
03 medical and health sciences ,0302 clinical medicine ,Radiological and Ultrasound Technology ,Biophysics ,Radiology, Nuclear Medicine and imaging ,030217 neurology & neurosurgery ,030218 nuclear medicine & medical imaging - Abstract
Resume Introduction Les encephalites dysimmunitaires (ED) sont des pathologies rares et graves. Leur diagnostic repose sur un faisceau d’arguments, car il n’existe pas de gold standard. La decouverte d’un anticorps anti-neuronal est specifique mais inconstante. La TEP FDG presente une sensibilite elevee dans cette indication. Sa place est grandissante dans le diagnostic et le suivi des ED. Neanmoins, les correlations entre profil TEP 18FDG et les caracteristiques cliniques, biologiques et morphologiques des ED sont inconnues ; nous les avons etudiees sur une serie de cas. Materiel et methodes Nous avons recueilli retrospectivement les donnees des dossiers medicaux de 30 patients diagnostiques ED, ayant beneficie d’une TEP cerebrale au 18FDG et d’une ponction lombaire, de janvier 2010 a septembre 2015, au CHU de La Timone (Marseille). Les profils TEP ont ete analyses et correles aux profils biologiques et cliniques. Resultats Une association statistiquement significative a ete retrouvee entre la presence d’hypermetabolismes cerebraux et celle d’une synthese intrathecale, de meme qu’entre la presence d’un hypometabolisme cerebral et la presence de pathologies plus bruyantes (avec des IRM plus souvent pathologiques, des anticorps plus frequemment mis en evidence dans le LCR et sur le plan clinique). Il a par ailleurs ete retrouve que les profils TEP, bien que pathologiques le plus souvent, etaient tres variables. Discussion Il semble exister des associations preferentielles entre les patterns pathologiques en TEP et ceux de la biologie ; une etude de leur valeur pronostique permettrait d’aider davantage le clinicien.
- Published
- 2017
53. Synovialosarcome du pied : à propos d'un cas
- Author
-
Jean Paul Eschard, M. Fauconier, Jean-Hugues Salmon, F. Gaillard, L. Pauvele, and Matthias Michel
- Subjects
03 medical and health sciences ,0302 clinical medicine ,030220 oncology & carcinogenesis ,030211 gastroenterology & hepatology ,Orthopedics and Sports Medicine ,Surgery - Abstract
Nous rapportons une observation originale de synovialosarcome du pied survenu chez une patiente âgee de 74 ans. Le synovialosarcome est une tumeur qui concerne habituellement l'adulte jeune et qui touche preferentiellement les grosses articulations. Ce cas clinique met l'accent sur une tumeur rare au pronostic potentiellement defavorable qu'il faut savoir evoquer devant une douleur inexpliquee, evoluant de maniere insidieuse, contrastant avec un examen clinique pauvre.
- Published
- 2018
54. Characterisation and Behaviour of Various Ceramic Coatings in Seawater. Influence of the Surface Preparation on the Adhesion and Corrosion Control
- Author
-
C. Jouanny, A. Giroud, F. Gaillard, and P. Guiraldenq
- Subjects
Materials science ,Surface preparation ,visual_art ,Metallurgy ,visual_art.visual_art_medium ,Seawater ,Ceramic ,Adhesion ,Corrosion - Published
- 2019
55. Self-Heating Effect in FDSOI Transistors Down to Cryogenic Operation at 4.2 K
- Author
-
Mikael Casse, K. Triantopoulos, F. Gaillard, Gerard Ghibaudo, Sebastien Haendler, Maud Vinet, Sylvain Barraud, Emmanuel Vincent, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), STMicroelectronics [Crolles] (ST-CROLLES), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), and Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])
- Subjects
010302 applied physics ,Work (thermodynamics) ,Materials science ,Condensed matter physics ,Silicon ,Thermal resistance ,Transistor ,Silicon on insulator ,chemistry.chemical_element ,Atmospheric temperature range ,01 natural sciences ,Temperature measurement ,Electronic, Optical and Magnetic Materials ,law.invention ,Thermal conductivity ,chemistry ,law ,0103 physical sciences ,Electrical and Electronic Engineering ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,ComputingMilieux_MISCELLANEOUS - Abstract
Self-heating in fully depleted silicon-on-insulator (FDSOI) metal–oxide–semiconductor field-effect transistors (MOSFETs) is experimentally studied using the gate resistance thermometry technique, in a wide temperature range from 300 down to 4.2 K. We demonstrate that below 160 K, the channel temperature increase ( $\Delta {T}$ ) due to self-heating starts to deviate significantly from the linear variation with the dissipated power, leading to an apparent power dependent thermal resistance. This power dependence is interpreted in terms of temperature dependent thermal conductivity. The thermal resistance dependence on the active device temperature ( ${T}_{\text {Device}}$ ) indicates that the former one is mainly driven by the thermal conductivity of the oxide layer. Moreover, based on this dependence we reconstructed the channel temperature increase for each dissipated power and ambient temperature, and we found that the calculated values were in a good agreement with the experimental ones. Results indicate that even at low temperatures, thermal resistance does not depend significantly on the silicon channel thickness (ranging from 7 up to 24 nm), whereas the buried-oxide thinning (145 and 25 nm) strongly reduces the magnitude of the thermal resistance. Finally, this paper intends to fill the gap of experimental data concerning self-heating in advanced FDSOI transistors at low temperatures, revealing limitations and perspectives that should be taken into account for future work.
- Published
- 2019
56. Ferroelectric HfO2 for Memory Applications: Impact of Si Doping Technique and Bias Pulse Engineering on Switching Performance
- Author
-
Philippe Boivin, Jean-Paul Barnes, Jean Coignus, Mickael Gros-Jean, S. Jeannot, F. Gaillard, I. Bottala-Gambetta, Nicolas Vaxelaire, Laurent Grenouillet, J. Ferrand, Etienne Nowak, T. Francois, Marc Bocquet, P. Chiquet, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), STMicroelectronics [Crolles] (ST-CROLLES), Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS), and Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU)
- Subjects
Materials science ,Silicon ,chemistry.chemical_element ,02 engineering and technology ,01 natural sciences ,memory ,Atomic layer deposition ,0103 physical sciences ,component ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,HfO2 ,010302 applied physics ,endurance ,FeRAM ,business.industry ,Doping ,021001 nanoscience & nanotechnology ,Polarization (waves) ,Ferroelectricity ,Ion implantation ,chemistry ,Ferroelectric RAM ,Optoelectronics ,0210 nano-technology ,business ,Tin - Abstract
International audience; A clear comparison between Atomic Layer Deposition and Ion Implantation Si doping techniques is established. Comparable remnant polarization and coercive fields are obtained at lower Si content (%Si) for Ion Implantation, with a slight decrease of endurance performance. Switching signal engineering demonstrates a wide range of performance achievable with HfO2:Si ferroelectric layer.
- Published
- 2019
57. Impact of Passive & Active Load Gate Impedance on Breakdown Hardness in 28nm FDSOI Technology
- Author
-
Xavier Federspiel, F. Gaillard, Florian Cacho, Mustapha Rafik, X. Garros, A.-P. Nguyen, and David Roy
- Subjects
Materials science ,business.industry ,Gate dielectric ,Transistor ,Time-dependent gate oxide breakdown ,Active load ,law.invention ,CMOS ,law ,MOSFET ,Optoelectronics ,Device under test ,business ,Electrical impedance - Abstract
The impact of integrated gate impedances, passive (polycomb, R G ) and active (Input/Output MOSfet, Z load ), on the breakdown (BD) behaviors of 28nm Fully-Depleted Silicon-On-Insulator (FDSOI) transistors is discussed. It has been shown that R G and Z load affect directly the BD hardness of the devices. By reducing the BD hardness, a catastrophic failure of gate dielectric meaning complete loss of device functionalities can be avoided. Many configurations of R G , Z load are considered to obtain the best compromise in terms the BD hardness and functionalities of Device Under Test (DUT).
- Published
- 2019
58. Performance Improvement on HfO2-Based 1T Ferroelectric NVM by Electrical Preconditioning
- Author
-
Sven Beyer, Thomas Melde, S. Wittek, L. Perniola, S. Duenkel, C. Cagli, M. Trentzsch, F. Gaillard, and B. Mueller
- Subjects
Data stability ,Hardware_MEMORYSTRUCTURES ,Materials science ,business.industry ,Bit error rate ,Optoelectronics ,Field-effect transistor ,Performance improvement ,business ,Stability (probability) ,Ferroelectricity - Abstract
Novel HfO 2 -based non-volatile ferroelectric field effect transistors (FeFETs) are revolutionizing the field of ferroelectric memories and have the potential to be a solution for eNVM in advanced scaled nodes (
- Published
- 2019
59. Influence of Gate Length on pBTI in GaN-on-Si E-Mode MOSc-HEMT
- Author
-
William Vandendaele, A. G. Viey, Marie-Anne Jaud, Gerard Ghibaudo, F. Gaillard, A. Torres, R. Modica, Marc Plissonnier, Ferdinando Iucolano, Matteo Meneghini, Gaudenzio Meneghesso, and R. Gwoziecki
- Subjects
010302 applied physics ,Materials science ,business.industry ,020208 electrical & electronic engineering ,Mode (statistics) ,Gate length ,02 engineering and technology ,High-electron-mobility transistor ,01 natural sciences ,E-mode GaN ,Threshold voltage ,GaN-on-Si HEMT reliability ,DC pBTI ,Ultrafast pBTI ,0103 physical sciences ,0202 electrical engineering, electronic engineering, information engineering ,Optoelectronics ,Transient (oscillation) ,business ,Degradation (telecommunications) - Abstract
In this paper, we explore the influence of the fully recessed gate length on threshold voltage instabilities. The study has been performed by the use of ultra-fast pBTI measurements on GaN-on-Si E-mode MOSc-HEMTs, as well as TCAD simulations. It reveals that gate length reduction tends to decrease the pBTI degradation. Transient analyses (degradation/relexation) reveal same dynamics whatever the gate length while the value of the initial V TH directly influences BTI. TCAD simulations highlight that the full recess gate configuration creates a short-channel effect responsible for this peculiar Vth degradation.
- Published
- 2019
60. Investigation of nBTI degradation on GaN-on-Si E-mode MOSc-HEMT
- Author
-
A. G. Viey, Gerard Ghibaudo, A. Krakovinsky, Steve W. Martin, Gaudenzio Meneghesso, Ferdinando Iucolano, Matteo Meneghini, F. Gaillard, J. Cluzel, Enrico Zanoni, William Vandendaele, Marc Plissonnier, R. Modica, R. Gwoziecki, Marie-Anne Jaud, and J.-P. Barnes
- Subjects
010302 applied physics ,education.field_of_study ,Materials science ,business.industry ,Population ,02 engineering and technology ,High-electron-mobility transistor ,021001 nanoscience & nanotechnology ,01 natural sciences ,Acceptor ,Threshold voltage ,Stress (mechanics) ,Gate oxide ,0103 physical sciences ,Optoelectronics ,Dry etching ,0210 nano-technology ,education ,business ,Voltage - Abstract
In this paper, we investigate the influence of negative gate stress on threshold voltage V TH instabilities in GaN-on-Si devices. This study has been carried out by using ultra-fast Measurement-Stress-Measurement (MSM) procedure on GaN-on-Si E-mode MOSc-HEMTs (Enhancement-mode MOS-channel HEMTs) for different gate lengths L G . NBTI transients at different temperatures and complementary ToF-SIMS analysis reveal the influence of two trap populations involved on V TH instabilities, both of them are related to the C N acceptor traps. The first one is close to the interface between GaN and Al 2 O 3 gate oxide due to N-vacancies induced by the dry etching process, the second one is likely to be related to GaN:C layer. NBTI transients also exhibit a dependence with L G , which is consistent with the E-field distribution of the gate region obtained by TCAD simulations at different gate stress voltages, and confirm the proximity of a C N trap population to the gate oxide.
- Published
- 2019
61. An investigation of the influence of thermal process on the electrical conductivity of LIFT printed Cu structures
- Author
-
P Gergaud, G Bernstein Toker, F Gaillard, Ofer Fogel, Gili Cohen-Taguri, Zeev Zalevsky, Zvi Kotler, Bar-Ilan University [Israël], Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
- Subjects
Materials science ,Acoustics and Ultrasonics ,Scanning electron microscope ,laser induced forward transfer ,chemistry.chemical_element ,02 engineering and technology ,01 natural sciences ,[SPI]Engineering Sciences [physics] ,Electrical resistivity and conductivity ,0103 physical sciences ,Thermal ,Composite material ,010302 applied physics ,LIFT ,3D printing ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Microstructure ,Copper ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Lift (force) ,chemistry ,copper ,X-ray crystallography ,Grain boundary ,annealing ,0210 nano-technology - Abstract
International audience; The electrical properties of copper tracks printed by laser-induced-forward-transfer (LIFT) are typically inferior to the bulk values. Several limiting factors have been indicated such as oxidation, droplet boundaries and grain boundaries. However, the relative contribution of each of these factors has not been determined. To improve the electrical properties of LIFT printed structures, an analysis of various factors is essential. Here, we concentrate on the effect of post-printing thermal treatment on LIFT printed copper structures. A reduction in electrical resistivity by a factor of similar to 3 is obtained resulting in a value lower than 3 times the bulk copper value (1.68 mu Omega.cm). Real time resistance measurements indicate that an efficient thermal annealing can be achieved at 200 degrees C-300 degrees C within a couple of minutes. The morphological changes associated with such thermal treatment were analyzed using HR-SEM and XRD and highlight the role of stress relief, grain growth and formation of new grains primarily at the inter-droplet interfaces.
- Published
- 2019
62. Quantitative System Pharmacology (QSP): An Integrative Framework for paradigm change in the treatment of the first-episode schizophrenia
- Author
-
J. Micallef, R. Guilhaumou, E. Fakra, J.-M. Azorin, O. Blin, Xavier Zendjidjian, F. Gaillard-Bigot, C. Casse-Perrot, F. Kheloufi, Institut de Neurosciences des Systèmes (INS), and Aix Marseille Université (AMU)-Institut National de la Santé et de la Recherche Médicale (INSERM)
- Subjects
First episode ,Emerging technologies ,Schizophrenia (object-oriented programming) ,[SCCO.NEUR]Cognitive science/Neuroscience ,Pharmacology ,First episode schizophrenia ,medicine.disease ,Mental illness ,030227 psychiatry ,03 medical and health sciences ,Psychiatry and Mental health ,0302 clinical medicine ,Neurodevelopmental disorder ,Arts and Humanities (miscellaneous) ,Paradigm shift ,medicine ,Age of onset ,Psychology ,030217 neurology & neurosurgery ,ComputingMilieux_MISCELLANEOUS - Abstract
Despite the lack of progress in the curative treatment of mental illness, especially schizophrenia, the accumulation of neuroscience data over the past decade suggests the re-conceptualization of schizophrenia. With the advent of new biomarkers and cognitive tools, new neuroscience technologies such as functional dynamic connectivity and the identification of subtle clinical features; it is now possible to detect early stages at risk or prodromes of a first psychotic episode. Current concepts reconceptualizes schizophrenia as a neurodevelopmental disorder at early onset, with polygenic risk and only symptomatic treatment for positive symptoms at this time. The use of such technologies in the future suggests new diagnostic and therapeutic options. Next steps include new pharmacological perspectives and potential contributions of new technologies such as quantitative system pharmacology brain computational modeling approach.
- Published
- 2018
63. Development of X-ray Photoelectron Spectroscopy under bias and its application to determine band-energies and dipoles in the HKMG stack
- Author
-
Eugénie Martinez, Pushpendra Kumar, Jean-Michel Pedini, Florian Domengie, F. Gaillard, Charles Leroux, Denis Guiheux, Claude Tabone, Gerard Ghibaudo, Virginie Loup, and Yves Morand
- Subjects
Work (thermodynamics) ,Dipole ,Materials science ,X-ray photoelectron spectroscopy ,Stack (abstract data type) ,business.industry ,Band diagram ,Optoelectronics ,Biasing ,business ,Metal gate ,Threshold voltage - Abstract
In this paper, we present for the first time specific methodology and test structures authorizing an accurate analysis of XPS under bias measurements. Such analysis which identifies effective biasing across the device, allows to determine the absolute energy levels of the different layers in the HKMG stack at any bias. This enables an accurate band diagram identification and it is applied to analyze the physical mechanisms at work in the threshold voltage (V T ) engineering of HKMG stacks. We demonstrate that V T shift induced by La and Al additives or metal gate thickness variations originates by the modifications of the dipole at SiO 2 /high-k interface.
- Published
- 2018
64. Evaluation of Ferroelectricity in Si-implanted HfO2 along Cycling
- Author
-
T. Francois, J. Coignus, L. Grenouillet, M. Barlas, B. Bessif, N. Vaxelaire, H. Boutry, M. Coig, E. Vilain, N. Rambal, Y. Morand, J.M. Pedini, F. Mazen, E. Nowak, and F. Gaillard
- Subjects
Materials science ,business.industry ,Optoelectronics ,business ,Cycling ,Ferroelectricity - Published
- 2018
65. Performance and Reliability of a Fully Integrated 3D Sequential Technology
- Author
-
M. Vinet, M. Casse, F. Gaillard, Perrine Batude, Gerard Ghibaudo, A. Tsiara, C. Fenouillet-Beranger, K. Triantopoulos, Laurent Brunet, X. Garros, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Nano 2017, ANR-10-EQPX-0030,FDSOI11,Plateforme FDSOI pour le node 11nm(2010), and ANR-10-LABX-0055,MINOS Lab,Minatec Novel Devices Scaling Laboratory(2010)
- Subjects
010302 applied physics ,Computer science ,Transistor ,Process (computing) ,02 engineering and technology ,01 natural sciences ,020202 computer hardware & architecture ,PMOS logic ,law.invention ,Reliability engineering ,Reliability (semiconductor) ,law ,0103 physical sciences ,0202 electrical engineering, electronic engineering, information engineering ,Inverter ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,NMOS logic - Abstract
session T7: Process and Material Technology; International audience; We investigate in detail, for the first time, both performance and reliability of a 3D sequential integration process. It is clearly demonstrated that the top level transistor can be successfully processed at 630°C with almost no impact on the performance and reliability of the bottom level. It is also highlighted that top level devices meet the P&NBTI reliability requirements. Finally an example of successful and robust 3D logic integration is proposed based on a 3D inverter combining a top-level PMOS with a bottom-level NMOS.
- Published
- 2018
66. Performance & reliability of 3D architectures (πfet, Finfet, Ωfet)
- Author
-
Xavier Federspiel, Gerard Ghibaudo, J. Pelloux-Prayer, Emmanuel Vincent, X. Garros, F. Gaillard, David Roy, Sylvain Barraud, A. Laurent, M. Casse, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), STMicroelectronics [Crolles] (ST-CROLLES), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), and nano 2017
- Subjects
Boosting (machine learning) ,Computer science ,SiGe ,Silicon on insulator ,02 engineering and technology ,01 natural sciences ,7. Clean energy ,Square (algebra) ,law.invention ,Performances ,law ,0103 physical sciences ,Finfet ,πfet ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,Reliability (statistics) ,010302 applied physics ,HCI ,sSOI ,Transistor ,Ωfet ,BTI ,021001 nanoscience & nanotechnology ,Reliability ,Reliability engineering ,Improved performance ,CESL ,0210 nano-technology - Abstract
session 6F: Process Integration; International audience; The impact of 3D architectures and boosters on the trade-off performance/reliability is deeply investigated in this paper. “Finfet” transistor presents a slight superior trade-off than square shaped “πfet” device because of little improved performance and similar BTI&HC reliability. “Ωfet” also offers a better compromise than πfet due to improved BTI reliability. Finally strained SOI & SiGeOI devices are highly suitable since they allow boosting the transistor performance without any reliability penalty.
- Published
- 2018
67. A new method for quickly evaluating reversible and permanent components of the BTI degradation
- Author
-
C. Diouf, A. Subirats, G. Reimbold, F. Gaillard, Xavier Federspiel, X. Garros, Vincent Huard, Mustapha Rafik, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), STMicroelectronics [Crolles] (ST-CROLLES), This work has been partially supported by the French Public Autorities through the NANO2017 program, and IEEE
- Subjects
010302 applied physics ,Normalization (statistics) ,Computer science ,NBTI ,Time constant ,new method ,compact modeling ,01 natural sciences ,permanent component ,[SPI]Engineering Sciences [physics] ,0103 physical sciences ,recoverable component ,010306 general physics ,Biological system - Abstract
International audience; A new method denoted SRP is proposed to quicklyevaluate reversible and permanent components responsible forBTI degradation. It is based on a particular normalization ofNBTI drifts measured during DC stress and recovery. The originof this SRP is then highlighted by a complete modeling of NBTIdataset. It actually arises from the presence of two trappopulations with much different capture and emission timeconstants. The technique which can only be seen as $a\mathematical\ trick$ is very suitable to address the sensitivity ofseveral process steps like nitridation to BTI. It can also provide asimple analytical compact model easy to implement in a SPICElike simulator to analyze BTI reliability at circuit level.
- Published
- 2018
68. A novel insight of pBTI degradation in GaN-on-Si E-mode MOSc-HEMT
- Author
-
F. Gaillard, Erwan Morvan, A. Torres, Marc Plissonnier, Marie-Anne Jaud, T. Lorin, Xavier Garros, Rene Escoffier, William Vandendaele, Savelli, Bruno, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
- Subjects
Materials science ,[SPI] Engineering Sciences [physics] ,02 engineering and technology ,High-electron-mobility transistor ,[SPI.MAT] Engineering Sciences [physics]/Materials ,01 natural sciences ,AC pBTI ,[SPI.MAT]Engineering Sciences [physics]/Materials ,Stress (mechanics) ,[SPI]Engineering Sciences [physics] ,Acceleration ,pBTI ,0103 physical sciences ,010302 applied physics ,ultrafast pBTI ,business.industry ,Relaxation (NMR) ,Mode (statistics) ,021001 nanoscience & nanotechnology ,Gate voltage ,E-mode GaN ,GaN on Si ,Optoelectronics ,Degradation (geology) ,0210 nano-technology ,business ,Ultrashort pulse - Abstract
International audience; For the first time, ultrafast AC pBTI measurements are applied to GaN on Si E-mode MOSc-HEMT and compared to DC pBTI. Full recess Al$_2$ O$_3$ /GaN MOS gate is submitted to AC signals with various frequencies, duty factors and stress times. The degradation and relaxation characteristics are then modeled through a RC model combined to a CET map and fitted to experimental data. This map reveals the presence of two trap populations, also observed through $\Delta$Vth degradation kinetics. Acceleration factors (gate voltage and temperature) are estimated as well as TTF (Time to Failure) under AC conditions and show an extended lifetime compared to DC stress conditions. Finally dynamic variability is studied and indicates that our devices are ruled by normal distributions.
- Published
- 2018
69. Extinction du lupus en dialyse
- Author
-
C. Couchoud, Eric Daugas, I. Hoffmann, C. Laouenan, and F. Gaillard
- Subjects
Nephrology - Abstract
Introduction Les nephropathies lupiques (NL) surviennent chez 30 % des patients et conduisent a l’insuffisance renale terminale (IRT) dans 17 a 25 % des cas. A ce stade, l’activite du lupus diminue pour s’eteindre durablement. Les etudes epidemiologiques sur l’extinction du lupus en dialyse sont rares, et aucune n’a decrit les consequences de l’extinction du lupus sur le devenir des patients. Methodes Decrire l’evolution de l’activite du lupus au stade d’IRT, comprendre les consequences de l’activite du lupus sur le devenir et la survie des patients. A partir du registre REIN, identification d’une cohorte de patients lupiques incidents en dialyse entre 2008 et 2011. Collecte des donnees du SNDS (hospitalisations, traitements et biologie) sur les 12 mois precedents le debut de la dialyse puis pendant 5 ans. Nous avons defini l’inactivite du lupus par l’absence de traitement immunosuppresseur et une corticotherapie inferieure a 5 mg/jour. Resultats obtenus ou attendus Nous avons identifie 181 patients lupiques incidents en dialyse. Nous avons obtenu les donnees du SNDS pour 151 d’entre eux. La majorite des patients sont de sexe feminin (86,2 %), l’âge median est de 43,6 ± 14,4 ans. La majorite (78,4 %) sont en hemodialyse. Parmi les patients en hemodialyse, 67,5 % debutent sur un catheter central et 33,1 % dans un contexte d’urgence. La probabilite de poussee de la maladie est de 9 % apres 18 mois d’inactivite. Nous avons defini l’extinction du lupus par une inactivite pendant 18 mois. Le delai median d’extinction apres le debut de la dialyse est de 17 mois. L’activite du lupus dans les 12 mois precedents le debut de la dialyse est associee a une meilleure survie des patients apres ajustement sur l’ensemble des facteurs confondants. Conclusion L’extinction du lupus correspond a une inactivite pendant 18 mois. En dialyse les patients presentent une extinction du lupus a une mediane de 17 mois.
- Published
- 2019
70. Reply
- Author
-
T.T. Winton-Brown, A. Ting, R. Mocellin, D. Velakoulis, and F. Gaillard
- Subjects
Radiology, Nuclear Medicine and imaging ,Neurology (clinical) ,Article - Published
- 2016
71. Full 300 mm electrical characterization of 3D integration using High Aspect Ratio (10:1) mid-process through silicon vias
- Author
-
Christophe Aumont, T. Mourier, L. Religieux, D. Bouchu, C. Ribiere, V. Mevellec, Stephane Minoret, M. Gottardi, Gilles Romero, and F. Gaillard
- Subjects
Materials science ,Diffusion barrier ,Silicon ,business.industry ,chemistry.chemical_element ,Nanotechnology ,Characterization (materials science) ,chemistry ,Physical vapor deposition ,Optoelectronics ,Deposition (phase transition) ,Metalorganic vapour phase epitaxy ,Tin ,business ,Layer (electronics) - Abstract
In this paper, we present an innovative solution to successfully metallize Through Silicon Vias (TSV) with High Aspect Ratio (10:1). These structures represent a key element in the 3D mid-process integration approach. The metallization consists in depositing, respectively, a diffusion barrier and a seed layer, using two different conformal deposition techniques. The technique used for the barrier material is based on a MOCVD TiN process while the second one involves a copper electrografting method. An additional copper Physical Vapor Deposition (PVD) layer is temporarily deposited to fulfill the requested properties and finalize a viable TSV integration on double sided 300mm design architecture. Further electrical characterizations of Kelvin TSVs and daisy chains are obtained. On a first hand, a 33mOhm resistance value is measured for a single 10×100μm via structure. This measurement is consistent with the theoretical value expected for this particular TSV design. On a second hand, contact continuity of up to 754 via chain structures validates the potential viability of this integration architecture for 3D device manufacturing.
- Published
- 2015
72. Study of oxygen desorption from substituted perovskites: New possibilities through fast intermittent temperature-programmed desorption
- Author
-
J. P. Joly, Ning Li, F. Gaillard, J. P. Deloume, Antoinette Boreave, Institut de recherches sur la catalyse et l'environnement de Lyon (IRCELYON), Université Claude Bernard Lyon 1 (UCBL), and Université de Lyon-Université de Lyon-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)
- Subjects
"ITPD" ,"Perovskite" ,Thermal desorption spectroscopy ,Analytical chemistry ,chemistry.chemical_element ,02 engineering and technology ,Activation energy ,Perovskite ,010402 general chemistry ,"Oxygen" ,01 natural sciences ,Oxygen ,Adsorption ,Desorption ,General Materials Science ,ITPD ,Perovskite (structure) ,"TPD" ,Frequency factor ,[CHIM.CATA]Chemical Sciences/Catalysis ,General Chemistry ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,[SDE.ES]Environmental Sciences/Environmental and Society ,0104 chemical sciences ,chemistry ,"Temperature-programmed desorption" ,Temperature-programmed desorption ,TPD ,0210 nano-technology - Abstract
A differential desorption technique, named intermittent temperature-programmed desorption (ITPD), has been used to get new insights into the properties of La 1 − x Sr x Co 0.8 Fe 0.2 O 3 − δ perovskites. The apparent activation energy of desorption ( E app ) and the frequency factor ( ν ) were calculated from ITPD data, for the two distinct oxygen species desorbing from perovskite at temperatures lower than 400 °C. The low values (about 10 7 –10 8 s − 1 ) obtained for ν app indicated that re-adsorption occurred during the TPD process and therefore that E app is equal to the Heat of adsorption ( E = − Δ H ). The first oxygen species, related to lower desorption temperatures, exhibits a distribution of E from 105 to 125 kJ mol − 1 . The second one, related to higher desorption temperatures, corresponds to E = 146 ± 4 kJ mol − 1 and 139 ± 5 kJ mol − 1 , for x = 0.2 and x = 0.3, respectively. The relative amounts of these species contributing to the desorption peak are dependent upon Sr content in the perovskite.
- Published
- 2008
73. Effect of elaboration parameters on ionic conductivity for PECVD fuel cell electrolyte
- Author
-
F. Gaillard, S. Martin, and L. Le Van-Jodin
- Subjects
Materials science ,General Chemical Engineering ,Conformal coating ,General Engineering ,General Physics and Astronomy ,Electrolyte ,Active surface ,Electrochemistry ,Chemical engineering ,Plasma-enhanced chemical vapor deposition ,Ionic conductivity ,General Materials Science ,Thin film ,Layer (electronics) - Abstract
Integration of fuel cells for nomad applications (like cell phone or notebook) is characterized by small dimensions and high performances of the component. To obtain theses properties, one of possibilities is to increase the active surface with patterned substrate. Then, the actual planar batteries must be replaced by 3D batteries. Most of deposition methods, used in the actual fuel cell process flow, are not compatible with the 3D deposition because they did not provide conformal coating. That is why we develop a PECVD electrolyte because this method is known to be compatible with 3D depositions. The PECVD electrolyte is based on a fluorocarboxylic acid, which is able to conduct protons. The obtained layer is a protonic conductor that can absorb water and stop hydrogen. Effects of elaboration parameters like pressure, power, or acid concentration on the ionic conductivity will be presented.
- Published
- 2007
74. Study of Oxygen Desorption from SnO2: New Possibilities through Fast Intermittent Temperature-Programmed Desorption
- Author
-
J.-P. Joly, A. Perrard, and F. Gaillard
- Subjects
Induction heating ,Thermal desorption spectroscopy ,Chemistry ,General Chemical Engineering ,Analytical chemistry ,Oxide ,chemistry.chemical_element ,02 engineering and technology ,Surfaces and Interfaces ,General Chemistry ,010501 environmental sciences ,01 natural sciences ,Oxygen ,Ion ,chemistry.chemical_compound ,Adsorption ,020401 chemical engineering ,Desorption ,Monolayer ,0204 chemical engineering ,0105 earth and related environmental sciences - Abstract
A differential desorption technique called intermittent temperature-programmed desorption (ITPD) was used to gain new information on the superficial oxygen species of SnO2, a solid used extensively for the preparation of sensors and redox catalysts. The use of an original device involving an induction heating system enabled the time necessary for ITPD determination to be decreased by a factor of 20 or so, compared to that with a classical apparatus. TPD and ITPD studies carried out in vacuum showed the existence of at least two distinct states desorbing at temperatures higher than 700 K. The corresponding amount of adsorbed oxygen was less than 10% of that necessary for the formation of a compact monolayer of oxide ions. These two states exhibited apparent activation energies of desorption, Eapp, equal to 285 ± 10 kJ/mol and 334 ± 8 kJ/mol, respectively. The corresponding frequency factors, v, were far higher than 1013 s−1, indicating that re-adsorption was unlikely and that Eapp was equal to the activati...
- Published
- 2007
75. Advanced Cu interconnects using air gaps
- Author
-
Alexis Farcy, D. Bouchu, F. Gaillard, Romano Hoofman, L.G. Gosset, Joaquim Torres, Pascal Bancken, V. Nguyen Hoang, Greja Johanna Adriana Maria Verheijden, J. Michelon, T. Vandeweyer, Ph. Lyan, Roel Daamen, J. de Pontcharra, and Vincent Arnal
- Subjects
Interconnection ,Materials science ,business.industry ,Copper interconnect ,Low-k dielectric ,Nanotechnology ,Integrated circuit ,Condensed Matter Physics ,Engineering physics ,Atomic and Molecular Physics, and Optics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,law.invention ,Plasma-enhanced chemical vapor deposition ,law ,Chemical-mechanical planarization ,Microelectronics ,Electrical and Electronic Engineering ,business ,Air gap (plumbing) - Abstract
The integration of air gaps for advanced Cu interconnects is mandatory to achieve the performances required for high performance integrated circuits (ICs). The interest of their introduction as a function of the chosen architecture, i.e. hybrid (i.e. air cavities at metal levels with a low-K material at via level) or full homogenous air gaps with an effective relative constant close to 1, is discussed in terms of signal propagation requirements for delay, crosstalk and delay increased by crosstalk. The different approaches currently investigated within the microelectronic community are classified into two main categories depending on the use of a non-conformal plasma enhanced chemical vapor deposition (PE-CVD) including innovative alternatives or the removal of a sacrificial material during a specific technological operation. While the first technique,, faces many integration issues that can be alleviated at the detriment of the global performances, the second approach may be all the more promising as well-known materials such as USG or SiOC are now introduced as sacrificial dielectrics as an alternative to degradable polymers. However, it is evidenced from published results that air gaps integration maturity permits their introduction for the 32nm technology node high performance ICs.
- Published
- 2005
76. Aging of plasma-deposited carbon layers: effect of their thickness and material structure
- Author
-
S. Martin, Patrice Raynaud, Richard Clergereaux, D. Escaich, and F. Gaillard
- Subjects
Chemistry ,Metals and Alloys ,Analytical chemistry ,Surfaces and Interfaces ,Substrate (electronics) ,Chemical vapor deposition ,Cathode ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Anode ,law.invention ,Carbon film ,Chemical engineering ,Plasma-enhanced chemical vapor deposition ,law ,Materials Chemistry ,Thin film ,Fourier transform infrared spectroscopy - Abstract
Carbon layers are frequently deposited by plasma-enhanced chemical vapor deposition (PE-CVD). This technology is very promising because of its highly efficient control of film quality, easy integration in current microelectronic technologies, low cost, high efficiency, and reproducibility. Here, we report a study on carbon layer aging under different conditions: photochemical, 400 K in air or N2 atmosphere, O2, H2O, and NaCl. We focus specifically on infrared (Fourier transform infrared, or FTIR) and spectroscopic ellipsometry (SE) analyses. Thin films were deposited in a capacitively coupled radiofrequency (RF) plasma in CH4. Six different plasma conditions were used: three different RF plasma powers (20, 80, and 150 W) used on both electrodes [on the polarized one (cathode) and on the floating one (anode)]. Furthermore, films with three different thicknesses (10, 100, and 1000 nm) were deposited. First of all, an interface of about 50 nm on the anode and of about 200 nm on the cathode at 20 W increasing with the RF plasma power appears at the interface between the substrate and the film. Next, the film composition in the ternary diagram Csp2–Csp3–H shows that thicker films deposited on the anode are rather apparently polymer-like, in contrast with the ones deposited on the cathode, which are rather graphite-like (a-CH⇒a-C). Moreover, these films show different aging mechanisms in air. This paper will thus concentrate on the study of the aging mechanisms based on the comparison of films that underwent aging under different conditions. In the case of polymer-like films, aging mechanisms are attributed to oxidation. In contrast, for the films formed at the cathode, these phenomena are attributed to film oxidation and hydrolysis. As aging leads to modifications in electrical and optical properties, a method to avoid these causes is suggested.
- Published
- 2005
77. Copper Decontamination Ability of Supercritical-CO2/Additives on CVD and Spin-On Porous MSQ Materials
- Author
-
C. Millet, Lucile Broussous, Adrien Danel, Didier Louis, Jerome Daviot, F. Gaillard, and V. Perrut
- Subjects
Materials science ,Inorganic chemistry ,chemistry.chemical_element ,Chemical vapor deposition ,Human decontamination ,Dielectric ,Blanket ,Condensed Matter Physics ,Copper ,Atomic and Molecular Physics, and Optics ,Supercritical fluid ,chemistry ,Chemical engineering ,General Materials Science ,Chelation ,Porosity - Abstract
The paper focused on the development of very dilute mixtures of chelating agents, acids and organic solvents for post etch residue (PER) removal and copper (Cu) low-k decontamination under supercritical CO 2 (SCCO 2 ) foradvanced nodes (< 65nm) BEOL integration. The Cu low-k decontamination ability of each mixture was carried out on Spin-On Dielectric (SOD) and Chemical Vapor Deposition (CVD) porous low-k. The copper decontamination ability of SCCO 2 /additives systems were also studied on ashed and unashed low-k blanket wafers. Finally, the paper presented the Cu decontamination performance and Cu PER removal ability of SCCO 2 /additive systems compared to conventional wet chemistries.
- Published
- 2005
78. Compositional changes between free coatings and surface coating layers during mechanochemical process
- Author
-
V Roucoules, N Baskali, F Gaillard, and Pierre Lanteri
- Subjects
Analytical chemistry ,Infrared spectroscopy ,engineering.material ,Biochemistry ,Analytical Chemistry ,Chemometrics ,Surface coating ,chemistry.chemical_compound ,chemistry ,Coating ,Scientific method ,Attenuated total reflection ,engineering ,Environmental Chemistry ,Stearic acid ,Spectroscopy - Abstract
By mid-IR analysis, mixtures of stearic acid, a paraffinic compound and a fluorinated compound were analyzed using attenuated total reflection (ATR) spectroscopy and reflection–absorption infrared spectroscopy (RAIRS). The precision of the partial least square (PLS) models created for each of these two techniques were compared in order to work out a quality control process of the mixtures which are involved in mechanochemical coating technology. We obtained a good relationship between spectral data and concentration with ATR spectroscopy. However, RAIRS spectroscopy allows to observe the affinity of long-chain organic acids for steel surfaces, and to determine the actual composition of coatings.
- Published
- 2004
79. Characterisation of Pt/Ceria Catalysts by One-Pass TPD Analysis
- Author
-
F. Gaillard
- Subjects
Cerium oxide ,Inorganic chemistry ,chemistry.chemical_element ,Precious metal ,General Chemistry ,Oxygen ,Catalysis ,chemistry.chemical_compound ,chemistry ,Desorption ,Carbon dioxide ,One pass ,Organometallic chemistry - Abstract
Temperature-programmed desorption of oxygen and carbon dioxide was performed in a single experiment to characterise ceria-based catalysts. The amount of desorbed oxygen provides data on the amount of surface precious metal and their close vicinity. The amount of desorbed CO2 is related to ceria surface area.
- Published
- 2004
80. Principe et technique de la tomographie par émission de positons (TEP)
- Author
-
O. De Dreuille, J. F. Gaillard, P. Maszelin, G. Bonardel, and H. Foehrenbach
- Subjects
Radiology, Nuclear Medicine and imaging - Abstract
Resume La tomographie par emission de positons (TEP) est une modalite d'imagerie medicale qui mesure la distribution tridimensionnelle d'une molecule marquee par un emetteur de positons. L'acquisition est realisee par un ensemble de detecteurs repartis autour du patient. Les detecteurs sont constitues d'un scintillateur qui est choisi en fonction de nombreuses proprietes, pour ameliorer l'efficacite et le rapport signal sur bruit. Le circuit de coincidences mesure les deux photons gamma de 511 keV emis dans des directions opposees qui resultent de l'annihilation du positon. Les coupes sont reconstruites par des algorithmes de plus en plus complexes pour s'adapter a des geometries d'acquisition tridimensionnelles. La correction des phenomenes physiques fournit une image representative de la distribution du traceur. Un examen TEP entraine pour le patient une dose efficace de l'ordre de 8 mSv. L'installation d'un TEP necessite un amenagement des locaux pour assurer la radioprotection du personnel. Cette technique est en evolution permanente, tant du point de vue du detecteur que de celui des algorithmes. Une nouvelle generation d'appareils TEP/tomodensitometre (TDM) offre des informations complementaires qui permettent de corriger l'attenuation, de localiser les lesions et d'optimiser les procedures therapeutiques. Tous ces developpements font de la TEP un outil pleinement operationnel, qui a toute sa place au sein de l'imagerie medicale.
- Published
- 2004
81. Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
- Author
-
Y Travaly, B Eyckens, L Carbonel, A Rothschild, Q.T Le, S.H Brongersma, I Ciofi, H Struyf, Y Furukawa, M Stucchi, M Schaekers, H Bender, E Rosseel, S Vanhaelemeersch, K Maex, F Gaillard, L Van Autryve, and P Rabinzohn
- Subjects
Materials science ,Low-k dielectric ,Dielectric ,Substrate (electronics) ,Chemical vapor deposition ,Condensed Matter Physics ,Atomic and Molecular Physics, and Optics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Resist ,Chemical-mechanical planarization ,Electrical and Electronic Engineering ,Composite material ,Material properties ,Porosity - Abstract
The impact of material/process interactions on low temperature CVD-O3 low-k dielectric film properties are presented. The film under investigation is deposited following a three-step process consisting of a low temperature chemical vapor deposition (CVD), an ex situ high temperature cure in a controlled ambient and a plasma treatment to seal the porous surface of the dielectric. In this paper, the extent to which the air break exposure, the cure, the nature of the plasma and the substrate can affect the material properties is investigated. The influence of the resist stripping plasmas on the material sealing and the mechanical properties during integration is also discussed. Finally, the dielectric k-value as extracted from damascene structures using Raphael™ simulations is presented and discussed.
- Published
- 2002
82. Multimodal anatomic, functional, and metabolic brain imaging for tumor resection
- Author
-
H. Foehrenbach, T Faillot, C. Lévêque, M Desgeorges, Jean-François Mangin, P. Sabbah, N. Bellegou, O DeDreuille, G. Dutertre, Y.-S. Cordoliani, J. F. Gaillard, and Christophe Nioche
- Subjects
Adult ,Male ,Neuronavigation ,Oligodendroglioma ,Brain tumor ,Metastasis ,Central nervous system disease ,Neuroimaging ,Image Processing, Computer-Assisted ,medicine ,Humans ,Radiology, Nuclear Medicine and imaging ,Electrocorticography ,Aged ,Tomography, Emission-Computed, Single-Photon ,medicine.diagnostic_test ,Brain Neoplasms ,business.industry ,Brain ,Magnetic resonance imaging ,Middle Aged ,medicine.disease ,Magnetic Resonance Imaging ,Temporal Lobe ,Frontal Lobe ,Thallium Radioisotopes ,Female ,Occipital Lobe ,Glioblastoma ,business ,Nuclear medicine ,Follow-Up Studies - Abstract
Objective: Improvement of neurosurgical techniques with a more detailed description of brain tumors and their functional environment. Methods: We performed: (1) anatomical magnetic resonance imaging (MRI) for reference, (2) functional sequences dedicated to the adjacent cortical structures (sensorimotor, visual, language paradigms), and (3) thallium 201 cerebral tomoscintigraphy to visualize active tumor invasion. Data were transferred to a workstation for automatic registration. Results: All data were combined into one synthetic image showing the foci of high proliferative activity, which have to be completely resected, and the peritumoral functional structures, which have to be spared in order to minimize postoperative sequelae. This trimodal image is entered into a surgical neuronavigation computer for preoperative planning in order to outline tumoral target and functional risk areas. All this information is displayed in the operative microscope (Zeiss MKM) optically linked to MR images. This multimodality technique diminishes operative time by reducing electrocorticography and improves the operative short-term outcome. Conclusion: Multimodal imaging is useful for optimization of neurosurgical tumor resection.
- Published
- 2002
83. [Untitled]
- Author
-
E. Raibon, D. A. Carter, F. Gaillard, and Y. Sauvé
- Subjects
Pathology ,medicine.medical_specialty ,Retina ,Histology ,Microglia ,General Neuroscience ,Tuftsin ,Nerve guidance conduit ,Retinal ,Cell Biology ,Biology ,chemistry.chemical_compound ,medicine.anatomical_structure ,Retinal ganglion cell ,chemistry ,medicine ,Optic nerve ,Sciatic nerve ,Anatomy ,Neuroscience - Abstract
Intravitreal injection of the microglia inhibitor tuftsin 1-3 leads to an increase in retinal ganglion cell axonal regeneration into peripheral nerve grafts and a decrease in phagocytic cells in the retina. However, the relation of phagocytic cells and particularly microglia towards axonal regeneration remains unclear. Initially, to assess this, tuftsin 1-3's effect on axonal regeneration was reexamined by doing a dose-response study. Optimal doses were found to be 2.5 μg/ml and 250 μg/ml in rats and hamsters respectively. We then studied retinal phagocytic cells in rats. Microglial cells were classified as resting or activated based on their morphology following OX42 immunolabelling. In controls, most microglial cells were in the resting state. Optic nerve cut led to an increase in the total number of microglia and a ten-fold elevation in the proportion of activated cells; changes were more pronounced at the optic nerve stump. Anastomosis of an autologous segment of sciatic nerve to the stump of the freshly cut optic nerve minimized the overall increase in microglia, and combined with 2.5 μg/ml tuftsin 1-3, lead to a marked blunting of activation. Preservation within the retina of a higher proportion of resting over active form of microglia, and not the prevention of microglial proliferation per se, may be a crucial factor in allowing additional retinal ganglion cell axons to regenerate into peripheral nerve grafts.
- Published
- 2002
84. In situ monitoring of optical characteristics of pulsed picosecond laser-irradiated diamond-like carbon thin films using an optical parametric generator and amplifier
- Author
-
Lionel Carrion, Jean-Pierre Girardeau-Montaut, F. Gaillard, and D. Vouagner
- Subjects
Materials science ,Diamond-like carbon ,business.industry ,General Physics and Astronomy ,Surfaces and Interfaces ,General Chemistry ,Condensed Matter Physics ,Laser ,Optical parametric amplifier ,Surfaces, Coatings and Films ,law.invention ,Optics ,Amorphous carbon ,law ,Picosecond ,Irradiation ,Thin film ,Absorption (electromagnetic radiation) ,business - Abstract
In situ reflectivity measurements were carried out at room temperature and atmospheric pressure to follow dynamic structural variations occurring during pulsed laser irradiation of diamond-like carbon (DLC) thin films. Laser irradiation consisted of second harmonic (λ = 532 nm) picosecond pulses of a Nd-YAG laser, leading to a modification of the carbon layer structure. Irradiation at this wavelength usually leads to graphitization, i.e. an increase of the number and/or size of sp 2 clusters dispersed in the amorphous carbon structure of DLC films. One of the consequences of such a transformation is a pronounced change in the optical properties. Upon graphitization, the optical absorption strongly increases in the near-infrared region. In order to monitor such changes we used a probe beam tunable in this wavelength region. An optical parametric generator (OPG) and amplifier (OPG/OPA) with low energy pulses tunable in the near-infrared range between 700 nm and 2 μm was used to record reflectivity changes at several wavelengths. Such an in situ characterization reveals how the structural transformations proceed in the early phase of graphitization.
- Published
- 2002
85. A disruptive technology for thermal to electrical energy conversion
- Author
-
Guillaume Savelli, Onoriu Puscasu, Stephane Monfray, Pascal Ancey, Frederic Boeuf, Daniel Guyomar, Thomas Skotnicki, Christophe Maitre, D. Rapisarda, Pierre-Jean Cottinet, Giulio Ricotti, F. Gaillard, Laboratoire de Génie Electrique et Ferroélectricité (LGEF), Institut National des Sciences Appliquées de Lyon (INSA Lyon), Université de Lyon-Institut National des Sciences Appliquées (INSA)-Université de Lyon-Institut National des Sciences Appliquées (INSA), STMicroelectronics [Crolles] (ST-CROLLES), Institut LITEN (CEA LITEN/DEHT/LCPEM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Thermoelectricity Laboratory (CEA, LITEN), Institut de recherches sur la catalyse et l'environnement de Lyon (IRCELYON), Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC), and Université de Lyon-Université de Lyon-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)
- Subjects
Power gain ,Work (thermodynamics) ,Engineering ,Scaling laws ,business.industry ,General Engineering ,Electrical engineering ,Thermal to electrical conversion ,Mechanical engineering ,7. Clean energy ,[SPI]Engineering Sciences [physics] ,Power electronics ,Heat transfer ,Miniaturization ,Electricity ,Piezoelectric ,business ,Mechanical energy ,Bimetal ,Power density - Abstract
International audience; A disruptive approach to thermal energy harvesting is presented. The new technique can be used for powering ultra-low power electronics. We propose a two-step conversion of heat into electricity: thermal to mechanical accomplished with thermal bimetals and mechanical to electrical accomplished with piezoelectrics. Devices can work in a wide range of temperatures: from -40 degrees C to 300 degrees C and the available mechanical power density is in the order of 1 mW/cm(2). The first electrical results and the first prototype built on a flexible substrate are presented in this work. We evidenced that one of the keys to improve the generated power density is downscaling of individual devices. To demonstrate this point, laws modeling downscaling have been established and show that the miniaturization of the devices by a factor k increases the generated power density by the same factor, due to the higher heat transfer rate. The path followed in order to establish the laws is given in this paper. (C) 2014 Elsevier Ltd. All rights reserved.
- Published
- 2014
86. Alteration of bacterial adhesion induced by the substrate stiffness
- Author
-
M.-N. Bellon Fontaine, Isabelle Linossier, F. Gaillard, Jean-Marie Herry, K. Vallée Réhel, Fabienne Faÿ, Gaël Le Pennec, C. Guégan, Johan Gardères, Laboratoire de Biotechnologie et Chimie Marines (LBCM), Université de Bretagne Sud (UBS)-Université de Brest (UBO)-Institut Universitaire Européen de la Mer (IUEM), Institut de Recherche pour le Développement (IRD)-Institut national des sciences de l'Univers (INSU - CNRS)-Université de Brest (UBO)-Centre National de la Recherche Scientifique (CNRS)-Institut de Recherche pour le Développement (IRD)-Institut national des sciences de l'Univers (INSU - CNRS)-Centre National de la Recherche Scientifique (CNRS), Station biologique de Roscoff [Roscoff] (SBR), Université Pierre et Marie Curie - Paris 6 (UPMC)-Centre National de la Recherche Scientifique (CNRS), MICrobiologie de l'ALImentation au Service de la Santé (MICALIS), Institut National de la Recherche Agronomique (INRA)-AgroParisTech, Université de Brest (UBO)-Institut Universitaire Européen de la Mer (IUEM), Institut de Recherche pour le Développement (IRD)-Université de Brest (UBO)-Centre National de la Recherche Scientifique (CNRS)-Institut de Recherche pour le Développement (IRD)-Centre National de la Recherche Scientifique (CNRS)-Université de Bretagne Sud (UBS), and Université de Brest (UBO)-Université de Bretagne Sud (UBS)-Institut Universitaire Européen de la Mer (IUEM)
- Subjects
Proteomics ,SURFACE ,Movement ,[SDV]Life Sciences [q-bio] ,Colony Count, Microbial ,Bacillus ,Electrons ,Bacillus sp ,Bacterial Adhesion ,Mass Spectrometry ,Microbiology ,FACTOR EXPRESSION ,chemistry.chemical_compound ,Colloid and Surface Chemistry ,Bacterial Proteins ,Stiffness substrate ,Elastic Modulus ,MOTILITY ,Substrate stiffness ,Confocal laser scanning microscopy ,Surface Tension ,Physical and Theoretical Chemistry ,MICROBIAL ADHESION ,Elastic modulus ,Microbial Viability ,Agarose hydrogel ,biology ,Bacteria ,Chemistry ,Biofilm ,technology, industry, and agriculture ,AGAROSE ,Hydrogels ,Surfaces and Interfaces ,General Medicine ,biology.organism_classification ,Pseudoalteromonas ,[CHIM.POLY]Chemical Sciences/Polymers ,Solubility ,Self-healing hydrogels ,Biophysics ,Adhesion ,Agarose ,BIOFILM ,FORCES ,Biotechnology - Abstract
International audience; The aim of this paper is to study the impact of the substrate stiffness on the bacterial adhesion. For this purpose, agarose hydrogels are used as substrates with controlled mechanical properties. Indeed, the elastic modulus of these hydrogels, more precisely the shear storage moduli G', evolves with the agarose concentration (in this study from 0.75% to 3%). Other physico-chemical characteristics of the surface, known to be involved in bacterial adhesion, as hydrophobicity, were confirmed to remain constant. Two marine bacterial strains, a positive Gram Bacillus sp. 4J6 and a negative Gram Pseudoalteromonas sp. D41 were selected. Their retention on the substrates was analysed by confocal laser scanning microscopy and by counting of viable adhered bacteria. It was demonstrated that surface elastic modulus correlated with bacterial retention. Bacteria 041 adhered in higher numbers to rigid surfaces. For 416, bacterial adhesion patterns were changed: clusterings were observed on surfaces with lower elastic modulus. Furthermore, a proteomic study, based on the total soluble proteome of D41 strain, highlights an impact of elastic modulus on proteins synthesis. These data demonstrated an adapted response of adhering bacteria on hydrogels of varying mechanical properties
- Published
- 2014
87. Intérêt de la tomographie à émission de positons au 18fluoro-déoxy-glucose dans la définition des champs de radiothérapie : exemple de la radiothérapie thoracique
- Author
-
O. De Dreuille, P. Maszelin, Pierre L'Her, Jacques Margery, Joël Guigay, H. Foehrenbach, J. F. Gaillard, Fabien Vaylet, and F. Grassin
- Subjects
Oncology ,Lung disease ,business.industry ,Medicine ,Radiology, Nuclear Medicine and imaging ,business ,Nuclear medicine - Abstract
Resume La tomographie a emission de positons realisant une imagerie metabolique fonctionnelle permet d’envisager un staging tumoral tant locoregional que metastatique plus fiable que l’imagerie classique. Ces informations permettent d’obtenir une cartographie de l’envahissement ganglionnaire plus precise et une delimitation plus sure du lit tumoral malin. Associee aux techniques dites conformationnelles, envisager une radiotherapie optimale semble possible. La pathologie maligne broncho-pulmonaire en est un bon exemple.
- Published
- 2001
88. PA—Precision Agriculture
- Author
-
Jean-Marie Paillat and F. Gaillard
- Subjects
Air tightness ,Meteorology ,Thermal resistance ,Air humidity ,0402 animal and dairy science ,04 agricultural and veterinary sciences ,Aquatic Science ,040201 dairy & animal science ,Altitude ,13. Climate action ,Service life ,040103 agronomy & agriculture ,Temperate climate ,0401 agriculture, forestry, and fisheries ,Environmental science ,Composite material - Abstract
Stretch film, used for wrapping bales for silage, reacts very differently in the tropical Reunion Island compared to use in a temperate climate. Tropical climatic conditions have an adverse effect on the physical properties of the polythene film, in particular air-tightness, resistance to radiation and resistance to high temperatures. Modelling air-tightness tests has contributed to a better understanding of the effects of atmospheric conditions on measurements of pressure differences: temperature and air humidity have relatively little effect, while altitude has a major effect. If the measurements are made with a time lapse between wrapping and testing, tests can be used to compare the air-tightness of the bale wrapped with different films. The service life of film exposed on frames and wrapped roll bales provides the information needed to select film that can be stretched and can provide lasting air-tightness. The results contribute to the knowledge base on film that can be stretched under difficult conditions and on a certification methodology.
- Published
- 2001
89. Influence of the Surface Pressure on the Organization of Mixed Langmuir−Blodgett Films of Octadecylamine and Butyrylcholinesterase. 2. Film Transferred onto Silica Support
- Author
-
Nicole Jaffrezic-Renault, and K. Wan, J. M. Chovelon, and F. Gaillard
- Subjects
Materials science ,Silicon ,Atomic force microscopy ,chemistry.chemical_element ,Nanotechnology ,Surfaces and Interfaces ,Condensed Matter Physics ,Surface pressure ,Langmuir–Blodgett film ,chemistry ,Chemical engineering ,Electrochemistry ,General Materials Science ,Spectroscopy - Abstract
We investigate here the structure of mixed octadecylamine/butyrylcholinestase Langmuir−Blodgett films which have already been studied at the air−water interface (part 1). FTIR-ATR and AFM techniques were used to characterize mixed enzymatic LB films transferred onto silanized Ge and oxidized silicon supports, respectively. The structures of the films at 30 and 40 mN m-1 surface pressures are proposed, and a very well-structured film is obtained at 40 mN m-1.
- Published
- 2000
90. A Spectroscopic Technique for Studies of Water Transport Along the Interface and Hydrolytic Stability of Polymer/Substrate Systems
- Author
-
Maurice Romand, Isabelle Linossier, F. Gaillard, and Tinh Nguyen
- Subjects
chemistry.chemical_classification ,Water transport ,Materials science ,Absorption of water ,Aqueous solution ,Analytical chemistry ,Substrate (chemistry) ,Infrared spectroscopy ,Surfaces and Interfaces ,General Chemistry ,Polymer ,Surfaces, Coatings and Films ,Chemical engineering ,chemistry ,Mechanics of Materials ,Materials Chemistry ,Polymer substrate ,Fourier transform infrared spectroscopy - Abstract
Information on water transport along the polymer/substrate interface is valuable for understanding the mechanisms and the controlling factors affecting the water-induced adhesion loss of polymer-coated metals, adhesive-bonded joints, and polymer/fiber composites subjected to aqueous environments. This paper presents data to demonstrate the capability of a technique, which combines a vertical cell with Fourier transform infrared spectroscopy in the multiple internal reflection mode, for studying water transport along the polymer/substrate interface and interfacial hydrolytic stability of polymeric composites and systems exposed to water and high relative humidities. The technique can distinguish water transport through the film from that along the interface; the latter transport is predominant for polymer/untreated substrate systems. Spectroscopic analyses of fractured surfaces of poor and well-bonded polymer/substrate systems after water exposure indicate that the technique is capable of discerni...
- Published
- 1999
91. Natrémie, tonicité et conductivité plasmatique pendant la séance d’hémodialyse
- Author
-
Thierry Petitclerc, F. Gaillard, and H. De Preneuf
- Subjects
Nephrology - Abstract
Introduction Plusieurs moniteurs de dialyse affichent en temps reel la natremie du patient (NaCond) deduite de la valeur de conductivite de l’eau plasmatique calculee a partir de mesures de conductivite du dialysat. Ce travail compare les variations de NaCond durant la seance de dialyse avec celles de la natremie et de la tonicite plasmatiques mesurees au laboratoire. Patients et methodes Cinquante-cinq seances d’hemodialyse ont ete effectuees chez 21 patients sur des moniteurs 5008 (Fresenius) qui affichent en temps reel la valeur (NaCond) de la natremie. Un echantillon sanguin est preleve en debut et fin de seance pour la mesure au laboratoire de la natremie (mmol/L) de la kaliemie (mmol/L) de l’uree sanguine (mmol/L), de la protidemie (g/L) et de l’osmolalite plasmatique (mOsm/kg). Les valeurs de la natremie, de la kaliemie, de l’uree sanguine sont corrigees en fonction de la protidemie afin d’etre exprimees en millimoles par litre (ou kg) d’eau plasmatique. Les variations durant la seance de la natremie exprimee en mmol/kg et de la tonicite (definie comme osmolalite [mOsm/kg] − uree [mmol/kg]) sont comparees a la variation de NaCond. Resultats De facon significative (p Discussion L’isotonicite des seances de dialyse peut etre assuree en depit d’une augmentation de la natremie durant la seance, en partie parce que cette augmentation est compensee par une diminution de la kaliemie. Ce maintien de la tonicite est associe a une tendance (non significative probablement en raison d’un nombre insuffisant de seances) a la diminution de NaCond correspondant a une diminution de la conductivite plasmatique. Ceci peut etre explique, au moins partiellement, par le fait que, durant la seance, le chlorure est remplace par du bicarbonate (moins mobile en raison de sa taille) et le potassium par du sodium (moins mobile en raison de son deplacement sous forme hydratee). Conclusion L’isotonicite d’une seance d’hemodialyse ne requiert pas l’isonatremie.
- Published
- 2015
92. Place de l'anatomie dans la cartographie fonctionnelle du cerveau
- Author
-
Didier Dormont, C. Poupon, Olivier de Dreuille, Olivier Coulon, Dominique Hasboun, Yves Samson, J. F. Gaillard, Olivier Pizzato, Isabelle Bloch, Monica Zilbovicius, Fabrice Poupon, Chris A. Clark, Hervé Foehrenbach, Pascal Belin, Vincent Frouin, Denis Rivière, Jean Régis, Denis LeBihan, Sophie Crozier, Jean-François Mangin, Stéphane Lehéricy, Dimitri Papadopoulos, Fabien Delaye, Philippe Remy, and Jean-Baptiste Poline
- Subjects
media_common.quotation_subject ,General Medicine ,Art ,Anatomy ,Microbiology ,media_common - Abstract
L'essor des techniques d'imagerie fonctionnelle depuis une quinzaine d'annees a profondement modifie la maniere d'aborder la cartographie fonctionnelle du cerveau humain. Il a conduit a l'emergence de vastes projets confrontes a la manipulation d'enormes quantites de donnees anatomo-fonctionnelles. Ces projets impliquent la possibilite de comparer des individus et de thesauriser les resultats obtenus en matiere de localisation anatomique par rapport a un referentiel.
- Published
- 1998
93. STI process steps for sub-quarter micron CMOS
- Author
-
M. Haond, S McClathie, M Rivoire, Maryse Paoli, F Gaillard, and P. Sallagoity
- Subjects
Engineering ,Gap filling ,business.industry ,Transistor ,Process (computing) ,Electrical engineering ,Condensed Matter Physics ,Atomic and Molecular Physics, and Optics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,law.invention ,CMOS ,Gate oxide ,law ,Shallow trench isolation ,Trench ,Optoelectronics ,Field-effect transistor ,Electrical and Electronic Engineering ,Safety, Risk, Reliability and Quality ,business - Abstract
This paper presents Shallow Trench Isolation (STI) process steps for sub-1/4 μm CMOS technologies. Dummy active areas, vertical trench sidewalls, excellent gap filling, counter mask etch step and CMP end point detection, have been used for a 0.18 μm CMOS technology. Electrical results obtained with a 5.5 nm gate oxide thickness show good isolation down to 0.3 μm spacing. Good transistor performances have been demonstrated.
- Published
- 1998
94. Polysulfides in dimethylformamide: only the redox couples S−n/S2−n are involved
- Author
-
J. P. Lelieur, Eric Levillain, and F. Gaillard
- Subjects
chemistry.chemical_classification ,Reaction mechanism ,medicine.diagnostic_test ,General Chemical Engineering ,Inorganic chemistry ,Electrochemistry ,Redox ,Analytical Chemistry ,Solvent ,chemistry.chemical_compound ,chemistry ,Spectrophotometry ,medicine ,Dimethylformamide ,Physical chemistry ,Cyclic voltammetry ,Inorganic compound - Abstract
The redox mechanism of polysulfides in nonaqueous solvents is examined. For that purpose, Li2S6 + DMF solutions have been investigated by using cyclic voltammetry and time-resolved spectroelectrochemical experiments coupling spectrophotometry and cyclic voltammetry. It is shown that the only redox couples involved in these solutions are S−n/S2−n with n = 3,4,6,8 and S8c/S−8c (c for cyclic). The experimental results are interpreted by the following mechanism: S 3 − + e − ⇔ S 3 2 − ( E 3 ) S 6 2 − ⇔ 2 S 3 2 − ( K 3 ) S 4 − + e − ⇔ S 4 2 ( E 4 ) S 8 2 − ⇔ 2 S 4 − ( K 4 ) S 6 − + e − ⇔ S 6 2 − ( E 6 ) S 8 e 2 ⇔ S 8 l − ( K 8 ) S 8 l − + e − ⇔ S 8 2 − ( E 8 ) 2 S 3 2 − ⇔ S 2 2 − + S 4 2 − ( K 3 D ) S 8 e + e − ⇔ S 8 e − ( E 0 ) 2 S 6 2 − ⇔ S 4 2 − ⇔ S 8 2 − ( K 6 D ) with E 3 E 4 E 0 E 6 E 8 S i 2 − + S j − ⇔ S i − + S j 2 − ( K i j r ) with i or j = { 3 , 4 , 6 , 8 } and i ≠ j This mechanism has been simulated and adjusted to the experimental voltammograms in broad temperature (233 to 313 K) and scan rate (50 to 2000 mV/s) ranges, recorded for an initial scan in the positive direction and in the negative direction. We have obtained a complete description of the redox properties of sulfur and polysulfides in this solvent. We have shown that only the radical anions S−n are reducible and that only the dianions S2−n are oxidizable. It is also shown that this mechanism describes the two steps of the reduction mechanism of sulfur in DMF.
- Published
- 1997
95. Physical and optical properties of an antireflective layer based on SiOxNy
- Author
-
F. Gaillard, P. Schiavone, and P. Brault
- Subjects
Materials science ,Silicon oxynitride ,Silicon ,Analytical chemistry ,chemistry.chemical_element ,Surfaces and Interfaces ,Substrate (electronics) ,Condensed Matter Physics ,Silane ,Surfaces, Coatings and Films ,law.invention ,chemistry.chemical_compound ,Anti-reflective coating ,chemistry ,Ellipsometry ,Plasma-enhanced chemical vapor deposition ,law ,Layer (electronics) - Abstract
SiOxNy based materials were deposited at low substrate temperature (300 °C) and low pressure (0.6 Torr) in a plasma enhanced chemical vapor deposition reactor. The precursor gases were nitrous oxide (N2O) and silane (SiH4); the ratio of the two-gas concentration N2O/SiH4=α was a critical determinant of film structure and composition. An extensive analysis of SiOxNy based materials was carried out using Fourier transform infrared, and Rutherford backscattering, and Auger and ellipsometric spectroscopies. The two-phase structure of this material was deduced. This structure favors a high silicon film concentration and provides a sufficiently absorbing layer at photolithographic wavelengths (365, 248, and 193 nm). Thanks to its optical and physical properties silicon oxynitride constitutes a good antireflective layer for photolithographic applications.
- Published
- 1997
96. Effect of plasma and thermal annealing on chemical vapor deposition dielectrics grown using SIH4–H2O2 gas mixtures
- Author
-
F. Gaillard, P. Brouquet, and P. Brault
- Subjects
Materials science ,Annealing (metallurgy) ,Silicon dioxide ,Oxide ,Analytical chemistry ,Infrared spectroscopy ,Surfaces and Interfaces ,Chemical vapor deposition ,Combustion chemical vapor deposition ,Condensed Matter Physics ,Surfaces, Coatings and Films ,chemistry.chemical_compound ,chemistry ,Ellipsometry ,Fourier transform infrared spectroscopy - Abstract
Silicon dioxide has been deposited at low pressure (1 Torr) and low substrate temperature (0 °C) by chemical vapor deposition (CVD) using SiH4 and hydrogen peroxide (H2O2) concentrated at 30% or 60%. The effect of solution concentration on film properties has been investigated: characterization of the deposited films has been carried out by ex situ Fourier transform infrared spectroscopy, ellipsometry, and mechanical stress measurements. For shallow trench isolation applications, the physical and electrical properties of the CVD oxide must be close to those of a thermal oxide. Such properties can be obtained by in situ annealing.
- Published
- 1997
97. Polysulfides in dimethylformamide: Only the radical anions S3− and S4− are reducible
- Author
-
F. Gaillard, Eric Levillain, and J. P. Lelieur
- Subjects
chemistry.chemical_classification ,Horizontal scan rate ,medicine.diagnostic_test ,General Chemical Engineering ,Inorganic chemistry ,chemistry.chemical_element ,Electrochemistry ,Analytical Chemistry ,chemistry.chemical_compound ,chemistry ,Transition metal ,Spectrophotometry ,medicine ,Dimethylformamide ,Cyclic voltammetry ,Platinum ,Inorganic compound - Abstract
The reduction mechanism of polysulfides in dimethylformamide (DMF) is examined. With this aim, Li 2 S 6 + DMF solutions have been investigated by using cyclic voltammetry and time resolved spectroelectrochemical experiments coupling spectrophotometry and cyclic voltammetry. It is shown that the only reducible polysulfides in these solutions are S 3 − and S 4 − . The experimental results are interpreted by the following mechanism: This mechanism has been simulated and adjusted to the experimental voltammograms in a wide temperature (233 to 313 K) and scan rate (50 to 2000 mV/s) range. We discuss the experimental data, the choice of the mechanism and its ability to describe the experimental data. It is shown that this mechanism also describes the second reduction wave observed in solutions of sulfur (S 8 ) in DMF.
- Published
- 1997
98. Frottement et usure de différents composites métal-céramique en milieu eau de mer
- Author
-
A. Giroud, P. Guiraldenq, F. Gaillard, C. Jouanny, and P. Depadova
- Subjects
General Materials Science - Published
- 1997
99. On the understanding of the reduction of sulfur (S8) in dimethylformamide (DMF)
- Author
-
P. Leghie, Eric Levillain, A. Demortier, J. P. Lelieur, and F. Gaillard
- Subjects
chemistry.chemical_classification ,General Chemical Engineering ,Inorganic chemistry ,chemistry.chemical_element ,Disproportionation ,Electrochemistry ,Sulfur ,Analytical Chemistry ,chemistry.chemical_compound ,chemistry ,Transition metal ,Dimethylformamide ,Physical chemistry ,Cyclic voltammetry ,Inorganic compound ,Polysulfide - Abstract
We have re-examined, using cyclic voltammetry, the electrochemical reduction of sulfur in DMF. The main purpose of this work is the determination of the electrochemical mechanism of this reduction and the identification of the opening step of the ring S8. We propose the following electrochemical mechanism which neglects the weak disproportionation of S82−: S 8 c + e − ⇄ S 8 c - ( E c ) S 8 c - ⇄ S 8 1 - ( K 1 ) S 8 1 - + e − ⇄ S 8 1 2 - ( E 1 ) a n d E 1 > E c S 8 c - + S 8 1 - ⇄ S 8 c + S 8 1 2 - ( K 2 = exp [ ( F / R T ) ( E 1 − E c ) ] ) This mechanism (ECE) takes into account the ring character (c) of sulfur in the solution and the linear character (1) of the S82− polysulfide. It has been simulated and adjusted to the experimental data in a wide range of temperatures (233 to 313 K) and scan rates (50 to 2000mV s−1). We shall discuss the choice of this mechanism and the results.
- Published
- 1997
100. Electrochemical and spectroelectrochemical study of the oxidation of S2−4 and S2−6 ions in liquid ammonia
- Author
-
Eric Levillain, F. Gaillard, A. Demortier, and J. P. Lelieur
- Subjects
Absorption spectroscopy ,General Chemical Engineering ,Inorganic chemistry ,chemistry.chemical_element ,Electrochemistry ,Sulfur ,Analytical Chemistry ,Ammonia ,chemistry.chemical_compound ,chemistry ,Transition metal ,Ammonium ,Lithium ,Stoichiometry - Abstract
The electrochemical study of solutions of lithium polysulfides (Li 2 S n ) or ammonium polysulfides ((NH 4 ) 2 S n ) in liquid ammonia allows the specific study of the oxidation of S 2− 4 and S 2− 6 ions. This has been conducted by using cyclic voltammetric experiments and, for the first time in liquid ammonia, time resolved spectroelectrochemical measurements coupling cyclic voltammetric and absorption spectra recording. These experiments have been performed vs. concentration, temperature and the stoichiometry n of the solutions in order to determine the oxidation mechanisms. It is shown that the oxidation of S 2− 4 leads to the S 2− 6 and S − 3 polysulfides. The oxidation of S 2− 6 gives S 2− 8 , unstable in liquid ammonia. However, the lifetime of S 2− 8 allows it to be oxidized into S 8 , soluble in liquid ammonia. It is also shown that the solubilization process of S 8 in liquid ammonia is slow enough to allow the observation of the reduction of S 8 . The reduction wave of S 8 has the characteristics associated with an insoluble species. The spectroelectrochemical experiments also display the solubilization process of sulfur (S 8 ) in liquid ammonia and give evidence for the formation of S 4 N − species resulting from this solubilization. The oxidation processes of polysulfides S 2− 4 and S 2− 6 are discussed.
- Published
- 1996
Catalog
Discovery Service for Jio Institute Digital Library
For full access to our library's resources, please sign in.