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Recent advances in the fabrication of segmented silicon mirrors make it possible to build large-area, lightweight, high-resolution x-ray telescopes with arc-second angular resolution. To build such a telescope, we fabricate accurate silicon mirrors and develop alignment and bonding techniques to precisely align and integrate these silicon mirror segments into modular units. In this way, the processes of mirror fabrication, mirror alignment and bonding, and subsequent integration into units of successive larger scale are completely independent, and their technologies can be developed independently. In this paper, we present recent improvement in the precision of optical alignment and mirror bonding. We discuss the measurement of the mirror’s focusing in a parallel optical beam and address the practical challenges in bonding these mirrors into modules as an intermediate step to build up a full-scale telescope for space missions.

Progress within the field of x-ray astronomy depends on astronomical x-ray observations of ever-increasing quality and speed. Fast and high-resolution x-ray observations over a broad spectral range promise amazing new discoveries. These observations, however, require a spaceborne x-ray telescope of unprecedented imaging power. Of the numerous technological concerns associated with the design and construction of such a telescope, the x-ray focusing optics present a particularly complex and arduous set of challenges. An x-ray optical assembly comprises many thousands of x-ray mirrors, a most critical element. Our group at NASA Goddard Space Flight Center (GSFC) pursues the development of an x-ray mirror manufacturing process capable of meeting the stringent quality, production time, and cost requirements of the next-generation of x-ray telescopes. The manufacturing process employs monocrystalline silicon: a lightweight, stiff, thermally conductive, and readily available material which is free of internal stress; it is a nearly ideal material for a thin mirror substrate. The process involves various traditional optical fabrication techniques adapted to x-ray mirror geometry. Presently, our process is capable of fabricating sub-arcsecond half-powerdiameter (HPD) resolution mirror pairs (primary and secondary) at a mirror thickness of 0.5 mm and of virtually any x-ray optical design (e.g. Wolter-I, Wolter-Schwarzschild, etc.). The mirror substrate surface quality is comparable to, and sometimes exceeding, that of the mirrors on the Chandra X-ray Observatory. This paper describes the various manufacturing steps involved in the production of x-ray mirror substrates and a present status report.

At NASA Goddard Space Flight Center, we consistently produce affordable lightweight sub-arcsecond X-ray mirrors made of directly polished single crystal silicon. Silicon is favored for its high stiffness, low density, high thermal conductivity, zero internal stress, and commercial availability. Our manufacturing process includes traditional grinding, lapping, and polishing methods adapted to X-ray mirror geometry. These mirrors promise to meet the stringent requirements of various planned X-ray telescope missions. Presently, we are refining the many steps involved in our manufacturing process. This paper reports an overview of our mirror manufacturing process and the most recent results.

Recent advances in the fabrication of silicon mirrors and their alignment and integration methods make it possible to build large-area, lightweight, high-resolution x-ray telescopes with arc-second angular resolution. Such a telescope, having simultaneously arc-second resolution and large (> 1 m 2 ) collecting area, has never been built before and it will revolutionize high energy astronomy. For such optics, the challenges are twofold: fabrication of high quality mirror segments and precise integration of thousands of these mirrors to a common sharp focus. In this paper, we address the technology for the mirror integration carried out at Goddard Space Flight Center and report the recent result of making such high-resolution optics. We address the crucial technology components: positioning a mirror, measuring its focus, adjusting its mount pointsto optimize the focus, bonding the mirror, and co-alignment of mirrors. We also present the latest x-ray test results that demonstrate the efficacy of such methods and address areas for further improvement. Presently, mirrors built this way have a resolution of 2²-3² HPD (half-ower diameter).

We present the development of the reflective coating by magnetron sputtering deposition onto precisely-fabricated thin X-ray mirrors. Our goal is to remove distortion induced by the coating and then keep their surface pro les. We first addressed the uniform coating to minimize the distortion by introducing a mask to control the spatial distribution of the coating thickness. The uniformity was finally achieved within 1%. We next tried a platinum single-layer coating on a glass substrate with a dimension of 200 mm 125 mm. The distortion caused by the frontside coating with a thickness of 320 A was found to be at most 1 m, smaller than the previous results obtained from the non-uniform coating. We then carried out the platinum coating with the same amount of the thickness on the backside surface of the glass substrate. The surface pro le of the glass substrate was fully recovered, indicating that the residual stress was successfully balanced by the backside coating. Furthermore, we tried to an iridium single-layer coating with a thickness of 150 Aon the silicon mirrors. The frontside coating caused the degradation of the imaging quality by 7:5 arcsec in half-power width. However, the backside coating with the same amount of the thickness reduced this degradation to be 3:4 arcsec. Finally, an additional backside coating with a thickness of 100 A and the annealing to relax the residual stress were found to eliminate the distortion completely; the final degradation of the imaging quality was only 0:4 arcsec.

Single crystal silicon is an excellent X-ray mirror substrate material due to its high stiffness, low density, high thermal conductivity, zero internal stress, and commercial availability. At NASA Goddard Space Flight Center, we have been developing a process for producing high resolution and lightweight X-ray mirror segments at low cost and with high throughput. Previously we demonstrated the possibility of producing X-ray mirrors which meet the high demands of a future X-ray mission. Presently, we are producing lightweight X-ray mirror segments of unprecedented quality. This paper presents results from these recent investigations.

Optics for the next generation's high-resolution, high throughput x-ray telescope requires fabrication of well-formed lightweight mirror segments and their integration at arc-second precision. Recent advances in the fabrication of silicon mirrors developed at NASA/Goddard prompted us to develop a new method of mirror alignment and integration. In this method, stiff silicon mirrors are aligned quasi-kinematically and are bonded in an interlocking fashion to produce a "meta-shell" with large collective area. We address issues of aligning and bonding mirrors with this method and show a recent result of 4 seconds-of-arc for a single pair of mirrors tested at soft x-rays.

著者人数：16名, Accepted: 2009-12-07, 資料番号: SA1001029000

Monocrystalline silicon as an x-ray mirror substrate material promises significant improvements over the x- ray mirror technologies used to date, since it is mechanically stiff, stress-free, highly thermally conductive, and widely commercially available. Producing highly accurate and lightweight x-ray mirrors from monocrystalline silicon requires a unique and specialized manufacturing process capable of producing mirrors quickly and cost effectively. The identification, development, and testing of this process is the focus of the work described in this proceeding. Monocrystalline silicon blocks were obtained, and a variety of processes (wire electro-discharge machining, etching, polishing) were applied to generate an accurate and stress-free cylindrical or Wolter-I mirror surface. The mirror surface is then sliced off at a thickness of

The advancement of X-ray astronomy largely depends on technological advances in the manufacturing of X-ray optics. Future X-ray astronomy missions will require thousands of nearly perfect mirror segments to produce an X-ray optical assembly with < 5 arcsecond resolving capability. Present-day optical manufacturing technologies are not capable of producing thousands of such mirrors within typical mission time and budget allotments. Therefore, efforts towards the establishment of a process capable of producing sufficiently precise X-ray mirrors in a time-efficient and cost-effective manner are needed. Single-crystal silicon is preferred as a mirror substrate material over glass since it is stronger and free of internal stress, allowing it to retain its precision when cut into very thin mirror substrates. This paper details our early pursuits of suitable fabrication technologies for the mass production of sub-arcsecond angular resolution single-crystal silicon mirror substrates for X-ray telescopes.

A magnetic field-assisted finishing (MAF) process has been developed to reduce the sidewall surface roughness of the 5–20 μm wide curvilinear pores of microelectromechanical systems micropore X-ray optics to

Microelectromechanical systems (MEMS) micropore X-ray optics were proposed as an ultralightweight, high- resolution, and low cost X-ray focusing optic alternative to the large, heavy and expensive optic systems in use today. The optic's monolithic design which includes high-aspect-ratio curvilinear micropores with minimal sidewall roughness is challenging to fabricate. When made by either deep reactive ion etching or X-ray LIGA, the micropore sidewalls (re ecting surfaces) exhibit unacceptably high surface roughness. A magnetic eld-assisted nishing (MAF) process was proposed to reduce the micropore sidewall roughness of MEMS micropore optics and improvements in roughness have been reported. At this point, the best surface roughness achieved is 3 nm Rq on nickel optics and 0.2 nm Rq on silicon optics. These improvements bring MEMS micropore optics closer to their realization as functional X-ray optics. This paper details the manufacturing and post-processing of MEMS micropore X-ray optics including results of recent polishing experiments with MAF.

A taper angle and X-ray reflectivity of MEMS-Based silicon X-ray mirrors is quantitatively measured using a parallel X-ray beam at Al K α 1.49 keV.

We report a novel micromachined X-ray optics using DRIE formed micro mirrors for future space astronomical missions. We have fabricated a test optics and measured its imaging quality using X-rays. We have successfully verified the X-ray focusing using this type of optics for the first time in the world. The obtained angular resolution was about 20 arcmin and 3.1 mm. This result was consistent with the expected angular resolution based on the surface roughness of the DRIE formed side walls. To achieve a better angular resolution, we will condition annealing and magnetic field assisted finishing processes.

An alternating magnetic field assisted finishing (MAF) technique has been developed to finish the 5–20 μm wide pore sidewalls of micro-pore X-ray focusing optics fabricated using micro-electro-mechanical systems (MEMS) techniques. To understand the material removal mechanism, this MAF technique is used to finish a silicon MEMS micro-pore X-ray optic that had previously undergone a hydrogen annealing treatment. Compared to the unfinished surface, distinctive surface features are observed on the finished surfaces using scanning electron microscopy, optical profilometry, and atomic force microscopy. This demonstrates the finishing characteristics and reveals the material removal mechanism on the nanometer scale. Moreover, the representative unfinished and finished micro-pore sidewall surfaces show a reduction in roughness due to finishing from 1.72 to 0.18 nm Rq.Copyright © 2010 by ASME

We have been developing ultra light-weight X-ray optics using MEMS (Micro Electro Mechanical Systems) technologies.We utilized crystal planes after anisotropic wet etching of silicon (110) wafers as X-ray mirrors and succeeded in X-ray reflection and imaging. Since we can etch tiny pores in thin wafers, this type of optics can be the lightest X-ray telescope. However, because the crystal planes are alinged in certain directions, we must approximate ideal optical surfaces with flat planes, which limits angular resolution of the optics on the order of arcmin. In order to overcome this issue, we propose novel X-ray optics based on a combination of five recently developed MEMS technologies, namely silicon dry etching, X-ray LIGA, silicon hydrogen anneal, magnetic fluid assisted polishing and hot plastic deformation of silicon. In this paper, we describe this new method and report on our development of X-ray mirrors fabricated by these technologies and X-ray reflection experiments of two types of MEMS X-ray mirrors made of silicon and nickel. For the first time, X-ray reflections on these mirrors were detected in the angular response measurements. Compared to model calculations, surface roughness of the silicon and nickel mirrors were estimated to be 5 nm and 3 nm, respectively.