Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors

Authors :: Yoshiaki Kanamori
Ikuyuki Mitsuishi
Tomohiro Ogawa
Hitomi Yamaguchi
Kazuhisa Mitsuda
Raul E. Riveros
Takaya Ohashi
Yuichiro Ezoe
Teppei Moriyama
Source :: 16th International Conference on Optical MEMS and Nanophotonics.
Publication Year :: 2011
Publisher :: IEEE, 2011.
Abstract: A taper angle and X-ray reflectivity of MEMS-Based silicon X-ray mirrors is quantitatively measured using a parallel X-ray beam at Al K α 1.49 keV.

Subjects :: Microelectromechanical systems
Materials science
Silicon
Annealing (metallurgy)
business.industry
X-ray optics
chemistry.chemical_element
Reflectivity
X-ray reflectivity
Optics
chemistry
Deep reactive-ion etching
Optoelectronics
Photonics
business

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