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Controlling and engineering the particle composition of semiconductor alloys is one of the topmost targets in the field of semiconductor materials science and technology. Quantum dot (QD) nanocrystals offer an unmatched opportunity to obtain a wide range of composition-controlled alloys and have captivated a great deal of interest recently. Herein, we report on band gap engineering via tuning and controlling the sulphur molar fraction (ternary shell layer) of quaternary/ternary core/shell alloyed CdZnSeS/ZnSeS QDs. Varying optical properties were exhibited by the alloyed QDs but a uniform particle size distribution was maintained across all the compositions. The alloyed QDs displayed bright emission colours under UV irradiation, whereas the photoluminescence quantum yields (PL QY) were in a remarkable range of 36–98%. Non-linearity of the lattice parameter was an indication of gradient alloying of the nanocrystals, whereas the kinetics of the optical properties unravelled the effect of intrinsic optical bowing. Displacement of bond length and anion mismatch influenced the optical properties of the QDs with respect to the variation in the PL QY. Alloyed CdZnSeS/ZnSe1.0S1.3 QDs with a spectacular PL QY were exploited as an ultrasensitive fluorescence reporter in a conjugated molecular beacon (MB) assay to detect influenza virus H1N1 RNA. Our detection system was rapid and highly sensitive for detecting extremely low concentrations of H1N1 RNA (down to 2 copies per mL), specific and versatile (detects H1N1 RNA in human serum). For proof of concept, the alloyed CdZnSeS/ZnSe1.0S1.3 QD-MB bioprobe exhibited a superior 12-fold sensitivity over an alloyed CdZnSeS-MB probe, while a conventional CdSe/ZnS-MB probe could not detect extremely low concentrations of influenza virus H1N1 RNA.

A programmable sub-nanosecond time-gated four-tap CMOS lock-in pixel (LIP) image sensor that uses an in-pixel pulse generator (PG) is developed for time-resolved (TR) biomedical imaging applications, such as a fluorescence lifetime imaging microscopy (FLIM). We demonstrate the system’s effectiveness with simulations and measurements. Using pixel-level PG circuits, very narrow time windows (TWs) that are less than 0.8 ns can be used for charge modulation. This rapid gating allows very weak signals from living cells to be captured with a high signal-to-noise ratio (SNR). The prototype CMOS imaging system displays a fast intrinsic response of 170 ps at 472 nm and a very low temporal random noise of 0.85 e-rms at 45 frames/s under truly correlated-double-sampling operation using two-stage charge transfer. Four outputs from the LIPs allow real-time fluorescence lifetimes (FLTs) measurement, even from samples with multiple FLT components.

In this paper, a wide dynamic range (WDR) CMOS image sensor (CIS) with a charge splitting gate (SG) and two storage diodes (SDs) is presented. By using single-gate on/off control with the SG, photocurrent path to the first (SD1) or second storage diodes (SD2) is switched alternatively and periodically during exposure and signal electrons generated in a photodiode (PD) are transferred to and accumulated in the SD1 or SD2. By setting a large ratio of the off-time to on-time of the SG, two different sensitivity signals, which are originated by the same photodiode, are generated and a WDR image signal is obtained. This technique has a distinct advantage on mitigating the problem of motion artifact in WDR imaging with high and low sensitivity signals and flexible dynamic control of the dynamic range. An experimental WDR CMOS image sensor with 280 (H) &times, 406 (V)-pixel array consisting of 14 sub-arrays, each of which have 20 (H) &times, 406 (V) pixels, was implemented and tested. For the SG on/off-time ratio of 30 and 279, the DR of 93 dB and 104 dB, respectively, was demonstrated. The effect of the proposed WDR imaging operation on the reduced motion artifact was experimentally confirmed.

A CMOS lock-in pixel image sensor with embedded storage diodes and lateral electric field modulation (LEFM) of photo-generated charge is developed for fluorescence lifetime imaging. The time-resolved CMOS image sensor (CIS) with two-tap lock-in pixels achieves a very high time resolution of 10 ps when images are averaged over 30 frames, a very short intrinsic response time of 180 ps at 374 nm, and a low temporal random noise of $1.75{\text{e}}^{-}_{\text{rms}}$ with true correlated double sampling (CDS) operation. In addition, by using the LEFM and optimized process, a very high extinction ratio of approximately 94% at 472 nm laser diode is achieved. The usefulness of the proposed CIS is demonstrated for fluorescence lifetime imaging with the simulation and measurement results.

We propose a novel full-electronically controlled laser confocal microscope in which a liquid-crystal-on-silicon spatial light modulator and a custom CMOS imaging sensor are synchronized for performing multi-beam confocal imaging. Adaptive wavefront modulation for functional multi-beam excitation can be achieved by displaying appropriate computer generated holograms on the spatial light modulator, in consideration of the numerical aperture of the focusing objective. We also adopted a custom CMOS imaging sensor to realize multi-beam confocal microscopy without any physical pinhole. The confocality of this microscope was verified by improvements in transverse and axial resolutions of fluorescent micro-beads.

We have developed and evaluated the large full well capacity (FWC) for wide signal detection range and low temporal noise for high sensitivity lock-in pixel CMOS image sensor (CIS) embedded with two storage-diodes (SDs). In addition, for fast charge transfer from photodiode (PD) to SDs, a lateral electric field charge modulator (LEFM) is used for the developed lock-in pixel. As a result, the time-resolved CIS achieves a very large FWC of approximately 7000e-, low temporal random noise of 1.17e-rms at 45fps with true correlated double sampling (CDS) operation, and fast intrinsic response less than 500ps at 635nm. The proposed imager has an effective pixel array of 128(H)×256(V) and a pixel size of 11.2×11.2μm2. The sensor chip is fabricated by a Dongbu HiTek 1P4M 0.11μm CIS process.

A CMOS lock-in pixel image sensor with embedded storage diodes in a pixel and lateral electric field modulator (LEFM) is developed for time-resolved measurements such as a fluorescence lifetime imaging microscopy (FLIM) and near-infrared spectroscopy (NIRS). The time-resolved CMOS image sensor (CIS) with two-tap lock-in pixels achieves a very high time resolution of 10ps when images are averaged over 30 frames, a very short intrinsic response time of 180ps at 374nm, and a low temporal random noise of 1.75e-rms with true correlated double sampling (CDS) operation. In addition, by using the LEFM and optimized process, a very high extinction ratio of approximately 94% at 472nm laser diode is achieved. The usefulness of the proposed CIS is demonstrated by the device simulations and the measurements. Then, we confirmed that the developed imager is very suitable for the scientific applications such as a biomedical imaging and multifunctional cameras.

An extremely low temporal noise and wide dynamic range CMOS image sensor is developed using low-noise transistors and high gray-scale resolution (17b) folding-integration/cyclic analog-to-digital converter (ADC). Two types of pixel are designed. One is a high conversion gain (HCG) pixel with removing the coupling capacitance between the transfer gate and the floating diffusion, and the other is a pixel for wide dynamic range (WDR) CMOS imager with a native transistor as a source follower amplifier. The CMOS image sensor that is in combination with the proposed pixels and the high performance column ADC has achieved a low pixel temporal noise of 1.1erms-, a wide dynamic range of 87.5 dB with the video rate operation (30 Hz) and the vertical fixed pattern noise of 1.08-μVrms. The implemented HCG CMOS imager and WDR CMOS imager using 0.18 μm technology have the pixel conversion gain of 73.2- and 22.8-μV/e-, respectively.

In this paper, a pseudo 2-transistor active pixel sensor (APS) has been designed and fabricated by using an n-well/gate-tied p-channel metal oxide semiconductor field effect transistor (PMOSFET)-type photodetector with built-in transfer gate. The proposed sensor has been fabricated using a 0.35 μm 2-poly 4-metal standard complementary metal oxide semiconductor (CMOS) logic process. The pseudo 2-transistor APS consists of two NMOSFETs and one photodetector which can amplify the generated photocurrent. The area of the pseudo 2-transistor APS is 7.1 × 6.2 μm2. The sensitivity of the proposed pixel is 49 lux/(V·s). By using this pixel, a smaller pixel area and a higher level of sensitivity can be realized when compared with a conventional 3-transistor APS which uses a pn junction photodiode.

Wide dynamic range active pixel sensor(APS) using a charge pump circuit has been designed by using 2-poly 4-metal standard CMOS technology. The structure of the proposed APS is similar to the structure of the conventional 3-Tr APS. The proposed unit pixel consists of one photodiode and three MOSFETs. Using a charge pump circuit, the dynamic range of the proposed APS is increased, compared to the conventional 3-Tr APS.

To observe molecular transport in a living cell, a high-speed CMOS image sensor for multi-point fluorescence correlation spectroscopy is developed. To achieve low-noise and high-speed simultaneously, a prototype CMOS image sensor is designed based on a complete pixel-parallel architecture and multi-channel pipelined pixel readout. The prototype chip with 10×10 effective pixels is fabricated in 0.18-μm CMOS image sensor technology. The pixel pitch and the photosensitive area are 56μm and 10μm in diameter without a microlens, respectively. In the experiment, the total sampling rate of 606kS/s is achieved. The measured average random noise is 24.9LSB, which is equivalent to about 2.5 electrons in average.

To achieve subnano-second temporal resolution imaging, we have proposed a compressive multi-aperture high-speed image sensor. We designed a CMOS image sensor with 5×3 apertures and 64×54 pixels aperture. Temporal resolution of 10ns was confirmed experimentally.

Multi-beam laser scanning confocal microscopy with a 256 × 256-pixel custom CMOS imager performing focal-plane pinhole effect, in which any rotating disk is not required, is demonstrated. A specimen is illuminated by 32 × 32 diffraction limited light spots whose wavelength and pitch are 532nm and 8.4 μm, respectively. The spot array is generated by a microlens array, which is scanned by two-dimensional piezo actuator according to the scanning of the image sensor. The frame rate of the prototype is 0.17 Hz, which is limited by the actuator. The confocal effect has been confirmed by comparing the axial resolution in the confocal imaging mode with that of the normal imaging mode. The axial resolution in the confocal mode measured by the full width at half maximum (FWHM) for a planar mirror was 8.9 μm, which is showed that the confocality has been achieved with the proposed CMOS image sensor. The focal-plane pinhole effect in the confocal microscopy with the proposed CMOS imager has been demonstrated at low frame rate. An improvement of the scanning speed and a CMOS imager with photo-sensitivity modulation pixels suitable for high-speed scanning are also discussed.

Multi-beam confocal microscopy without any physical pinhole was demonstrated. As a key device, a custom CMOS image sensor realizing a focal-plane pinhole array effect by special pixel addressing and discarding of the unwanted photocarriers was developed. The axial resolution in the confocal mode measured by FWHM for a planar mirror was 8.9 μm, which showed that the confocality has been achieved with the proposed CMOS image sensor.

An extremely low temporal noise and wide dynamic range CMOS image sensor is developed using low-noise transistors and high gray-scale resolution (17b) folding-integration/cyclic ADC. Two types of pixel are designed. One is a high conversion gain (HCG) pixel with removing the coupling capacitance between the transfer gate and the floating diffusion, and the other is a pixel for wide dynamic range (WDR) CMOS imager with the native transistor as a source follower amplifier. The CMOS image sensor which is in combination with the proposed pixels and the high performance column ADC has achieved a low pixel temporal noise of 1.1e− rms and a wide dynamic range of 87.5dB with the video rate operation (30Hz). In addition, the WDR pixel has a very small occurrence of the RTS noise because of the effect of the native transistor in the pixel. The implemented HCG CMOS imager and WDR CMOS imager using 0.18μm technology have the pixel conversion gain of 73.2-μV/e− and 22.8-μV/e−, respectively.

This paper presents the design and implementation of a time-resolved CMOS image sensor with a high-speed lateral electric field modulation (LEFM) gating structure for time domain fluorescence lifetime measurement. Time-windowed signal charge can be transferred from a pinned photodiode (PPD) to a pinned storage diode (PSD) by turning on a pair of transfer gates, which are situated beside the channel. Unwanted signal charge can be drained from the PPD to the drain by turning on another pair of gates. The pixel array contains 512 (V) × 310 (H) pixels with 5.6 × 5.6 µm2 pixel size. The imager chip was fabricated using 0.11 µm CMOS image sensor process technology. The prototype sensor has a time response of 150 ps at 374 nm. The fill factor of the pixels is 5.6%. The usefulness of the prototype sensor is demonstrated for fluorescence lifetime imaging through simulation and measurement results.

A CMOS imager for confocal multi-beam scanning microscopy, where the pixel itself works as a pinhole, is proposed. This CMOS imager is suitable for building compact, low-power, and confocal microscopes because the complex Nipkow disk with a precisely aligned pinhole array can be omitted. The CMOS imager is composed of an array of sub-imagers, and can detect multiple beams at the same time. To achieve a focal-plane pinhole effect, only one pixel in each subimager, which is at the conjugate position of a light spot, accumulates the photocurrent, and the other pixels are unread. This operation is achieved by 2-dimensional vertical and horizontal shift registers. The proposed CMOS imager for the confocal multi-beam scanning microscope system was fabricated in 0.18-μm standard CMOS technology with a pinned photodiode option. The total area of the chip is 5.0mm × 5.0mm. The number of effective pixels is 256(Horizontal) × 256(Vertical). The pixel array consists of 32(H) × 32(V) sub-imagers each of which has 8(H) × 8(V) pixels. The pixel is an ordinary 4-transistor active pixel sensor using a pinned photodiode and the pixel size is 7.5μm × 7.5μm with a fillfactor of 45%. The basic operations such as normal image acquisition and selective pixel readout were experimentally confirmed. The sensitivity and the pixel conversion gain were 25.9 ke-/lx•sec and 70 μV/e- respectively.

In this paper, we present a wide dynamic range active pixel sensor (APS) using an external charge pump circuit. The proposed pixel exhibits improved dynamic range through the compensated threshold voltage of a reset MOSFET. We confirmed that the light level which is the saturated output voltage in the proposed APS is about 170,000 lux, which is 36% higher than that of a conventional APS. The proposed APS is fabricated by using 2-poly 4-metal 0.35 m standard CMOS process. The unit pixel consists of an np diffusion / p-substrate photodiode, three NMOSFETs and the charge pump circuit which consists of two NMOSFETs and two capacitors.

Ultrasensitive, rapid and selective diagnostic probes are urgently needed to overcome the limitations of traditional probes for norovirus (NV). Here, we report the detection of NV genogroup II via nucleic acid hybridization technology using a quantum dot (QD)-conjugated molecular beacon (MB) probe. To boost the sensitivity of the MB assay system, an ultrasensitive QD fluorophore with unique optical properties was synthesized, characterized and exploited as a fluorescence signal generator. Alloyed thioglycolic (TGA)-capped CdZnSeS QDs with a high photoluminescence (PL) quantum yield (QY) value of 92% were synthesized, and a modified silanization method was employed to encapsulate the thiol-capped QDs in a silica layer. The resulting highly luminescent alloyed SiO2-coated CdZnSeS QDs had a remarkable PL QY value of 98%. Transmission electron microscopy and dynamic light scattering confirmed the monodispersity of the alloyed nanocrystals, and zeta potential analysis confirmed their colloidal stability. Powder X-ray diffraction and PL lifetime measurements confirmed the surface modification of the QDs. The alloyed TGA-capped and SiO2-coated CdZnSeS QD-conjugated MB bioprobes detected extremely low concentrations of NV RNA. Ultrasensitive detection of low concentrations of NV RNA with a limit of detection (LOD) of 8.2copies/mL in human serum and a LOD of 9.3 copies/mL in buffer was achieved using the SiO2-coated CdZnSeS QD-MB probes, an increase in sensitivity of 3-fold compared with the detection limit for NV RNA using TGA-capped CdZnSeS QD-MBs. The additional merits of our detection system are rapidity, specificity and improved sensitivity over conventional molecular test probes.