1. PIII Treatment of SS Samples Using a Current-Controlled High-Voltage Pulser
- Author
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Michel Felipe Lima de Araujo, Luc Pichon, Mario Ueda, Carlos Maurício Lepienski, Fernanda S. Yamasaki, Jose O. Rossi, Ataide Ribeiro Silva, and H. Reuther
- Subjects
Nuclear and High Energy Physics ,Glow discharge ,Materials science ,High voltage ,Hot filament ,Plasma ,Tribology ,Condensed Matter Physics ,01 natural sciences ,Plasma-immersion ion implantation ,010305 fluids & plasmas ,law.invention ,law ,0103 physical sciences ,Voltage pulse ,Composite material ,Transformer - Abstract
Plasma immersion ion implantation (PIII) was conducted in a large volume chamber with a current-controlled high-voltage pulser, to test the vacuum, plasma, and PIII conditions, in a preparation for the treatments of large workpieces or the batch-processing mode. For that purpose, a rugged high-power pulser (10 kW average) based on solid-state moderate voltage pulse system (1 kV) was coupled to a high-voltage transformer (1:22) to feed different loaded sample supports placed in different positions inside the chamber. It was found that the plasma, when produced by a hot filament enhanced glow discharge source, is not uniformly distributed in the chamber but despite that, implantation doses are locally uniform within 10% for 10–15-cm distances, along with the supports. Stainless steel 304 (SS304) -type samples were successfully treated with nitrogen PIII and different tests showed improvements on their mechanical and tribological properties.
- Published
- 2020