Noise and resistance as indicators of HVP stressing impact on performances of conventional TFRs

In order to determine possible causes of resistance and noise index changes in thick-film resistors during high- voltage pulse stressing, deterministic model was used. Irreversible micro- and macro-structural changes observed during high- voltage pulse stressing of thick film resistors based on 1, 10 and 100 kOmega/sq compositions were analyzed and performed analysis resulted in determination of primary technological, geometrical and physical parameters responsible for observed changes.