4 results on '"Hoffmann, T."'
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2. CMOS Integration of Dual Work Function Phase-Controlled Ni Fully Silicided Gates (NMOS:NiSi, PMOS:Ni2Si, and Ni31Si12) on HfSiON.
3. New carbon-based thermal stability improvement technique for NiPtSi used in CMOS technology
4. Phase effects and short gate length device implementation of Ni fully silicided (FUSI) gates
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