1. Performance Enhancement of Ag/HfO2 Metal Ion Threshold Switch Cross-Point Selectors
- Author
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Suman Datta, Benjamin Grisafe, Matthew Jerry, and Jeffrey Smith
- Subjects
010302 applied physics ,Materials science ,Diffusion barrier ,business.industry ,chemistry.chemical_element ,01 natural sciences ,Electronic, Optical and Magnetic Materials ,Ion ,Threshold voltage ,Switching time ,Atomic layer deposition ,chemistry ,0103 physical sciences ,Electrode ,Electroforming ,Optoelectronics ,Electrical and Electronic Engineering ,Tin ,business - Abstract
A metal ion threshold switch (MITS) based on an Ag/TiN/HfO2/Pt stack is experimentally demonstrated with improved endurance. The incorporation of a low-temperature atomic layer deposition (ALD) TiN layer as an efficient diffusion barrier enables optimum Ag infiltration during the electroforming step. Further, the tunability of the threshold voltage (VTS) from 0.25 to 1.1V via bottom electrode (BE) work function engineering is demonstrated. The Ag/TiN/HfO2/Al MITS selector exhibits a 4.4x increase in VTS, $100~\mu \text{A}$ ON-current handling capability, low leakage (~10 pA), $10^{{7}}$ half-bias non-linearity and fast (
- Published
- 2019
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