45 results on '"Bodermann, Bernd"'
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2. Mueller matrix ellipsometry for enhanced optical form metrology of sub-lambda structures.
3. An efficient approach to global sensitivity analysis and parameter estimation for line gratings.
4. Systematic approach on illustrating the challenges represented by optical bidirectional measurements using rigorous simulations.
5. Rigorous modeling of a confocal microscope.
6. Quantifying parameter uncertainties in optical scatterometry using Bayesian inversion.
7. First steps towards traceability in scatterometry.
8. EUV and DUV scatterometry for CD and edge profile metrology on EUV masks.
9. Reconstructing phase aberrations for high-precision dimensional microscopy.
10. Comparative scatterometric CD measurements on a MoSi photo mask using different metrology tools.
11. Optical metrology of micro- and nanostructures at PTB: status and future developments.
12. Versatile DUV scatterometer of the PTB and FEM based analysis for mask metrology.
13. Aspects and new developments on edge angle and edge profile metrology at PTB.
14. Metrology capabilities and performance of the new DUV scatterometer of the PTB.
15. Comparison of rigorous modelling of different structure profiles on photomasks for quantitative linewidth measurements by means of UV- or DUV-optical microscopy.
16. Numerical analysis of DUV scatterometry on EUV masks.
17. Theoretical modelling and experimental verification of the influence of Cr edge profiles on microscopic-optical edge signals for COG masks.
18. Comparison of different approaches for modelling microscope images on the basis of rigorous diffraction calculation.
19. Investigation and evaluation of scatterometric CD metrology methods.
20. Improved optical linewidth measurement by means of alternating dark field illumination and model-based evaluation.
21. Gated heterodyne coherent anti-Stokes Raman scattering for high-contrast vibrational imaging.
22. Characterization of new CD photomask standards.
23. UV and DUV microscopy for dimensional metrology on micro- and nano-structures.
24. Metrological characterization of new CD photomask standards.
25. New methods for CD measurements on photomasks using dark field optical microscopy.
26. Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods.
27. Improved second-harmonic two-wavelength interferometer with refractive index correction without effect modulation.
28. Alternating grazing incidence dark-field scanning optical microscopy for dimensional measurements.
29. Advantages of optoelectronic frequency control of laser diodes.
30. Ellipsometric characterizations of individual nanoform structures.
31. Introduction.
32. Vectorial 3D modeling of coherence scanning interferometry.
33. Structural changes in niobium oxide during electron beam evaporation.
34. Modelling of transmission for a stack of two Fizeau wedges with matched parameters.
35. Speed enhancement of interferometric snapshot ellipsometry using a direct filtering phase method.
36. Machine learning aided profile measurement in high-aspect-ratio nanostructures.
37. Heat dynamics in optical ring resonators.
38. Modelling of the photometric balance for two-wavelength spatially multiplexed digital holography.
39. Identifying the type of line edge roughness using grazing-incidence x-ray fluorescence.
40. Modeling of optical absorption and scattering of laser radiation in silicone polymers used in fiber optics.
41. Simulation of the BSDF measurements for scattering materials with GP-200 goniophotometer for light guiding plates.
42. Semi-analytic modeling of diffraction grating BRDF using scalar Fourier optics.
43. Front Matter: Volume 11783.
44. Introduction.
45. Efficient Bayesian inversion for shape reconstruction of lithography masks.
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