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Your search keyword '"Kryliouk, Olga"' showing total 5 results
Start Over Author "Kryliouk, Olga" Publication Type Electronic Resources
5 results on '"Kryliouk, Olga"'

1. Measurement of strain in the InGaN/GaN heterogeneous nanostructures

Author

Stankevic, Tomas, Mickevicius, S., Nielsen, Mikkel Schou, Feidenhans'l, Robert Krarup, Kryliouk, Olga, Ciechonski, Rafal, Vescovi, Giuliano, Bi, Z., Mikkelsen, Anders, Samuelsen, Lars, Gundlach, Carsten, Stankevic, Tomas, Mickevicius, S., Nielsen, Mikkel Schou, Feidenhans'l, Robert Krarup, Kryliouk, Olga, Ciechonski, Rafal, Vescovi, Giuliano, Bi, Z., Mikkelsen, Anders, Samuelsen, Lars, and Gundlach, Carsten

Published
2015

2. Fast Strain Mapping of Nanowire Light-Emitting Diodes Using Nanofocused X-ray Beams.

Author

Stankevic, Tomas, Hilner, Emelie Kristin Margareta, Seiboth, F., Ciechonski, Rafal, Vescovi, Giuliano, Kryliouk, Olga, Johansson, Ulf, Samuelsen, Lars, Wellenreuther, Gred, Falkenberg, Gerald, Feidenhans'l, Robert Krarup, Mikkelsen, Anders, Stankevic, Tomas, Hilner, Emelie Kristin Margareta, Seiboth, F., Ciechonski, Rafal, Vescovi, Giuliano, Kryliouk, Olga, Johansson, Ulf, Samuelsen, Lars, Wellenreuther, Gred, Falkenberg, Gerald, Feidenhans'l, Robert Krarup, and Mikkelsen, Anders

Published
2015

3. Transmission Electron Microscopy Study of InN Nanorods

Author

Liliental-Weber, Z., Liliental-Weber, Z., Li, X., Kryliouk, Olga, Park, H.J., Mangum, J., Anderson, T., Liliental-Weber, Z., Liliental-Weber, Z., Li, X., Kryliouk, Olga, Park, H.J., Mangum, J., and Anderson, T.

Published
2008

4. Transmission Electron Microscopy Study of InN Nanorods

Author

Liliental-Weber, Z., Liliental-Weber, Z., Li, X., Kryliouk, Olga, Park, H.J., Mangum, J., Anderson, T., Liliental-Weber, Z., Liliental-Weber, Z., Li, X., Kryliouk, Olga, Park, H.J., Mangum, J., and Anderson, T.

Published
2008

5. Equilibrium analysis of zirconium carbide CVD growth

Author

Won, Yong Sun, Varanasi, Venu G., Kryliouk, Olga, Anderson, Timothy J., McElwee-White, Lisa, Perez, Rosa J., Won, Yong Sun, Varanasi, Venu G., Kryliouk, Olga, Anderson, Timothy J., McElwee-White, Lisa, and Perez, Rosa J.

Abstract

A chemical equilibrium study was performed to investigate the effect of growth parameters on the constitution in ZrC films grown by chemical vapor deposition (CVD). The equilibrium analysis of the Zr-C-H system demonstrated that ZrC (fec) deposition is favorable and that a certain minimum amount of hydrogen should prevent co-deposition of elemental carbon over a wide range of temperature, pressure, and inlet C/Zr atom ratio. The results of the equilibrium analysis were compared to the phase constitution of films grown by low-pressure metalorganic CVD (< 10(-4) Torr). Only carbon-rich ZrC films were grown and demonstrated the possibility of an aerosolassisted CVD approach to stoichiometric ZrC film growth.

Published
2007
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