12 results on '"Nakaoka H"'
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2. Fabrication of large-area and very uniform two-dimensional sub-micron periodic patterns on 1500 nm range multi-quantum well structures using two-time laser holography.
3. New Methods for ultra-Shallow Boron Doping by Using Plasma, Plasma-Less and Sputtering
4. A 0.05 /spl mu/m-CMOS with ultra shallow source/drain junctions fabricated by 5 keV ion implantation and rapid thermal annealing.
5. High speed 0.1 /spl mu/m dual gate CMOS with low energy phosphorus/boron implantation and cobalt salicide.
6. A 0.1 /spl mu/m CMOS with a step channel profile formed by ultra high vacuum CVD and in-situ doped ions.
7. Impact of the reduction of the gate to drain capacitance on low voltage operated CMOS devices
8. Implementation of wireless MPEG2 transmission system using IEEE 802.11b PHY
9. Impact of boron penetration from S/D-extension on gate-oxide reliability for 65-nm node CMOS and beyond.
10. Impact of boron penetration from S/D-extension on gate leakage current and gate-oxide reliability for 65-nm node CMOS and beyond.
11. Impact of the reduction of the gate to drain capacitance on low voltage operated CMOS devices.
12. Implementation of wireless MPEG2 transmission system using IEEE 802.11b PHY.
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