7 results on '"Chang-Jin Kang"'
Search Results
2. Suppression of topography dependent charging using a phase-controlled pulsed inductively coupled plasma.
3. Charge-up damage of dual gate transistor during RF pre-cleaning of metal contact before barrier metal deposition.
4. Evaluation of plasma-induced charging damage on metal contact process.
5. Systematic method to optimize conditioning process through real time plasma monitoring.
6. Hot-spot detection and correction using full-chip based process window analysis.
7. Investigation of ultra thin polycrystalline silicon channel for vertical NAND flash.
Catalog
Books, media, physical & digital resources
Discovery Service for Jio Institute Digital Library
For full access to our library's resources, please sign in.