16 results on '"Lee, Sung Woo"'
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2. Model-based assist feature insertion for sub-40nm memory device.
3. Revisit to aberration: a simulation study of lens aberration induced overlay misalignment and its experimental validation.
4. Development and evaluation of new MRC parameter for aggressive mask optimization.
5. Fast and accurate 3D mask model for full-chip OPC and verification.
6. Robust approach to determine the optimized illumination condition using process window analysis.
7. Analysis method to determine and characterize the mask mean-to-target and uniformity specification.
8. Assessments on process parameters' influences to the proximity correction.
9. Fulfillment of model-based OPC for contact patterns in 60-nm level logic device.
10. Challenge for effective OCV control in 90-nm logic gate using ArF lithography.
11. Analysis of dry etch loading effect in mask fabrication.
12. Comprehensive Approach to Determining the Specification for Mask Mean to Target.
13. Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks.
14. Doubly exposed patterning characteristics using two alternating phase-shift masks.
15. Model-driven target optimization to resolve design hotspots through image quality enhancement
16. Mask compensation for process flare in 193nm very low k1 lithography
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