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Mask compensation for process flare in 193nm very low k1 lithography
- Source :
- Proceedings of SPIE; April 2013, Vol. 8683 Issue: 1 p86830F-86830F-11, 8596182p
- Publication Year :
- 2013
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 8683
- Issue :
- 1
- Database :
- Supplemental Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Periodical
- Accession number :
- ejs31091795
- Full Text :
- https://doi.org/10.1117/12.2012463