9 results on '"Brink, Martin"'
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2. Step-and-scan and step-and-repeat: a technology comparison.
3. Matching of multiple-wafer steppers for 0.35-m lithography using advanced optimization schemes.
4. Wide-field deep-UV wafer stepper for 0.35-m production.
5. Overlay and field-by-field leveling in wafer steppers using an advanced metrology system.
6. Evaluation of high-numerical-aperture wide-field steppers for 0.35-micron design rules.
7. Automatic on-line wafer stepper calibration system.
8. Deep-UV wafer stepper with through-the-lens wafer to reticle alignment.
9. Holistic lithography and metrology's importance in driving patterning fidelity
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