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Patent Issued for Methods For Forming A Metal Silicate Film On A Substrate In A Reaction Chamber And Related Semiconductor Device Structures (USPTO 10,818,758)
- Source :
- Electronics Newsweekly. November 10, 2020, 8487
- Publication Year :
- 2020
-
Abstract
- 2020 NOV 10 (VerticalNews) -- By a News Reporter-Staff News Editor at Electronics Newsweekly -- From Alexandria, Virginia, VerticalNews journalists report that a patent by the inventors Tang, Fu (Phoenix, [...]
- Subjects :
- Silicates -- Reports -- Methods -- Intellectual property
Electronics
Subjects
Details
- Language :
- English
- ISSN :
- 19441630
- Database :
- Gale General OneFile
- Journal :
- Electronics Newsweekly
- Publication Type :
- News
- Accession number :
- edsgcl.640904727