Effect of oxygen gas and annealing treatment for magnetically enhanced reactive ion etched ([Ba.sub.0.65], [Sr.sub.0.35])Ti[O.sub.3] thin films

Sol-gel-derived ([Ba.sub.0.65], [Sr.sub.0.35])Ti[O.sub.3] (BST) films are etched in C[F.sub.4]/Ar and C[F.sub.4]/Ar/[O.sub.2] plasmas by using magnetically enhanced reaction ion etching technology (MERIE) technology. The results have indicated that there are no significant differences between the unetched BST film and the postannealed after etched film with respect to the fitted formulas and average valences of Ti cations.