Effect of oxygen gas and annealing treatment for magnetically enhanced reactive ion etched ([Ba.sub.0.65], [Sr.sub.0.35])Ti[O.sub.3] thin films

MLA

Baishun Zhang, et al. “Effect of Oxygen Gas and Annealing Treatment for Magnetically Enhanced Reactive Ion Etched ([Ba.Sub.0.65], [Sr.Sub.0.35])Ti[O.Sub.3] Thin Films.” Journal of Applied Physics, vol. 101, no. 1, Jan. 2007, p. 014107. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.161044980&authtype=sso&custid=ns315887.

APA

Baishun Zhang, Zuci Quan, Tianjin Zhang, Tao Guo, & Shaobo Mo. (2007). Effect of oxygen gas and annealing treatment for magnetically enhanced reactive ion etched ([Ba.sub.0.65], [Sr.sub.0.35])Ti[O.sub.3] thin films. Journal of Applied Physics, 101(1), 014107.

Chicago

Baishun Zhang, Zuci Quan, Tianjin Zhang, Tao Guo, and Shaobo Mo. 2007. “Effect of Oxygen Gas and Annealing Treatment for Magnetically Enhanced Reactive Ion Etched ([Ba.Sub.0.65], [Sr.Sub.0.35])Ti[O.Sub.3] Thin Films.” Journal of Applied Physics 101 (1): 014107. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.161044980&authtype=sso&custid=ns315887.