In-situ monitoring of epitaxial film thickness by IEMI

Subjects

Subjects :

Chemical vapor deposition -- Research
Integrated circuit fabrication -- Research
Semiconductor preparation -- Research
Thickness measurement -- Methods
Business
Computers
Electronics
Electronics and electrical industries

Details

ISSN :

08946507

Volume :

5

Issue :

1

Database :

Gale General OneFile

Journal :

IEEE Transactions on Semiconductor Manufacturing

Publication Type :

Academic Journal

Accession number :

edsgcl.12962727